Patents by Inventor Denis M. Rigaill

Denis M. Rigaill has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Multiple polarity mask exposure method
    Patent number: 6110624
    Abstract: A patterned mask and method of forming a patterned mask over a substrate, comprising forming a first resist layer over the substrate, forming a second resist layer over the first resist layer, patterning the first resist using energy selective to the first resist layer to form a first patterned resist, and patterning the second resist using energy selective to the second resist layer to form a second patterned resist, wherein the first patterned resist and the second patterned resist form the patterned mask.
    Type: Grant
    Filed: January 4, 1999
    Date of Patent: August 29, 2000
    Assignee: International Business Machines Corporation
    Inventors: Michael S. Hibbs, Timothy E. Neary, David S. O'Grady, Denis M. Rigaill
  • Surface coating method to highlight transparent mask defects
    Patent number: 6110623
    Abstract: A method for detection of a photomask defect. The method comprises the steps of applying a contrast-enhancing coating on the photomask and optically inspecting the photomask for defects. The contrast-enhancing coating may be copper, aluminum, molybdenum silicide, or any material capable of altering the reflectivity or transmissivity of defects.
    Type: Grant
    Filed: January 4, 1999
    Date of Patent: August 29, 2000
    Assignee: International Business Machines Corporation
    Inventors: David S. O'Grady, Denis M. Rigaill