Abstract: A system for processing substrates is described. In one embodiment, the system comprises a process chamber, at least one electrical resistance heater, and at least one Coanda effect gas injector.

Abstract: A system for processing substrates is described. In one embodiment, the system comprises a process chamber, at least one electrical resistance heater, and at least one Coanda effect gas injector.

Abstract: A system for processing substrates is described. In one embodiment, the system comprises a process chamber, at least one electrical resistance heater, and at least one Coanda effect gas injector.

Abstract: A system for processing substrates is described. In one embodiment, the system comprises a process chamber and at least one Coanda effect gas injector. The at least one Coanda effect gas injector is disposed proximate a location for the peripheral edge of the substrate so as to provide a Coanda effect gas flow over the surface of the substrate. Apparatuses and methods are also described.

Abstract: Electrical resistance heater and heater assemblies are described. According to one embodiment, the heater comprises a sinusoidal heating element that provides substantially constant heating. According to another embodiment, the heater comprises a heating element and one or more press-fit coupled electrical adapters. Methods and systems are also disclosed.

Abstract: A permit driver/young driver warning device comprising a reflective sign mountable on a vehicle roof to warn other drivers that a beginner driver driving the vehicle pursuant to a learner's permit only is driving the vehicle. The trapezoidal warning sign can take several geometric forms, such as having two to four extensive planar sides, and is removably attachable to the roof of the vehicle. Illumination on two or four sides inside the device can be provided by either incandescent lamps, fluorescent lamps, light emitting diodes, and mixtures thereof.

Abstract: An apparatus and method for reducing particles in reactors. The apparatus includes an enclosure with a wafer handling chamber connected by an isolation gate valve to a processing chamber. Pipes deliver purge gas into the wafer handling chamber to eliminate particles from the enclosure. A pilot operated back pressure regulator regulates the delivery and removal of the purge gas. The apparatus actuates the isolation gate valve in a controlled rate to reduce disturbances from the purge gas entering into the enclosure. A Bernoulli wand is provided for lifting and holding a single semiconductor wafer. A dome loaded regulator actuated by a pilot gas is used to control the ramp rates of gas to the Bernoulli wand. The ramping rates of the Bernoulli wand gas can be controlled by restrictions and check valves in the pilot gas line. The apparatus also utilizes ionizers in the purge gas lines entering the wafer handling chamber and load locks.

Abstract: A transport assembly that supports a substrate and controllably moves the substrate within a semiconductor processing system in a manner that reduces the likelihood of the substrate being damaged. The assembly includes a spatula having an uneven upper surface that contacts the substrate. The spatula upper surface includes a plurality of protrusions that form peaks and a plurality of valleys between the peaks. Each of the peaks contacts the lower surface of the substrate so as to distribute the pressure exerted by the spatula on the substrate. A network of channels is created between the lower surface of the substrate and the valleys of the spatula that enables gas to readily flow therethrough. The channels extend to openings along the sides of the spatula to communicate the channels with neighboring space. Entrapped pockets of heated gas are inhibited from forming underneath the substrate, and the substrate can be easily lifted off of the spatula.

Abstract: An apparatus and method for reducing particles in reactors. The apparatus includes an enclosure with a wafer handling chamber connected by an isolation gate valve to a processing chamber. Pipes deliver purge gas into the wafer handling chamber to eliminate particles from the enclosure. A pilot operated back pressure regulator regulates the delivery and removal of the purge gas. The apparatus actuates the isolation gate valve in a controlled rate to reduce disturbances from the purge gas entering into the enclosure. A Bernoulli wand is provided for lifting and holding a single semiconductor wafer. A dome loaded regulator actuated by a pilot gas is used to control the ramp rates of gas to the Bernoulli wand. The ramping rates of the Bernoulli wand gas can be controlled by restrictions and check valves in the pilot gas line. The apparatus also utilizes ionizers in the purge gas lines entering the wafer handling chamber and load locks.

Abstract: An apparatus and method for reducing particles in reactors. The apparatus includes an enclosure for processing the semiconductor wafers. The enclosure has a wafer handling chamber connected by an isolation gate valve to a processing chamber. Additionally, the apparatus includes pipes for delivering a purge gas into the wafer handling chamber. The purge gas is used to eliminates particles from the enclosure. The apparatus also includes a pilot operated back pressure regulator for regulating the delivery and removal of the purge gas from the enclosure. The apparatus actuates the isolation gate valve in a controlled rate to reduce disturbances from the purge gas entering into the enclosure. The apparatus also includes a Bernoulli wand for lifting and holding a single semiconductor wafer. A dome loaded regulator is used to control the ramp rates of the gas to the Bernoulli wand. The dome loaded regulator is actuated by a pilot gas.

Abstract: The spanning device is a tool designed to assist in the working on front wheel drive automobiles. These front wheel drive automobiles are, generally, small automobiles with transverse engines or engines whose crankshaft is, substantially, at a right angle to the longitudinal axis to the automobile. This spanning device is of assistance while the engine and/or transmission must be held aloft or either the engine or the transmission removed from the automobile. The spanning device has a three point resting position which can be positioned on the windshield cowl, the radiator frame and the fender attachment point. A main longitudinal rod and a transverse rod can be held in position by a clamping means or a coupling means. A lifting device may be applied on each rod and at any point on the rod. A draw bolt lift attachment can be used for lifting the engine and/or the transmission and/or the combination of the engine and transmission.