Patents by Inventor Dennis R. McKean

Dennis R. McKean has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Process for imaging of photoresist including treatment of the photoresist with an organometallic compound
    Patent number: 5250395
    Abstract: The present invention relates to a process for negative tone imaging of photoresist to improve resolution of lithographic patterns.
    Type: Grant
    Filed: July 25, 1991
    Date of Patent: October 5, 1993
    Assignee: International Business Machines Corporation
    Inventors: Robert D. Allen, Scott A. MacDonald, Dennis R. McKean, Hubert Schlosser, Robert J. Twieg, Gregory M. Wallraff, Carlton G. Willson
  • Photosensitive polyamic alkyl ester composition and process for its use
    Patent number: 5206117
    Abstract: The present invention relates to photosensitive negative and positive tone compositions for imagewise deposition of polyimide on a substrate.
    Type: Grant
    Filed: March 13, 1992
    Date of Patent: April 27, 1993
    Inventors: Jeffrey W. Labadie, Dennis R. McKean, Willi Volksen, Gregory M. Wallraff
  • Di- and tricationic negative charge control agents for electrophotographic developers
    Patent number: 4990426
    Abstract: A negative charge control agent in which the cation of the negative charge control agent is a diammonium or triammonium cation has been found to provide improved charging capacity, along with increased resin compatibility when used in toner compositions.
    Type: Grant
    Filed: January 11, 1990
    Date of Patent: February 5, 1991
    Assignee: International Business Machines Corporation
    Inventors: Arthur F. Diaz, Adolfo R. Gutierrez, Dennis R. McKean
  • O-quinone diazide sulfonic acid monoesters useful as sensitizers for positive resists
    Patent number: 4853315
    Abstract: Esters of 1-oxo-2-diazo-naphthalene sulfonic acid wherein the sulfonic acid group is at either the 4 or the 5 position of a hydroxymethyl-tricyclo [5.2.1.0.sup.2,6 ] decane wherein the hydroxy group is either at the 3 or 4 position and useful as sensitizers for positive resists, particularly relatively thick resists at 365 nm.
    Type: Grant
    Filed: January 15, 1988
    Date of Patent: August 1, 1989
    Assignee: International Business Machines Corporation
    Inventors: Dennis R. McKean, Robert D. Miller, Joseph G. Walsh, Carlton G. Willson
  • Deep ultra-violet lithographic resists with diazohomotetramic acid compounds
    Patent number: 4522911
    Abstract: A lithographic resist for use with deep ultra-violet radiation comprising an acidic resin and a diazohomotetramic acid sensitizer.
    Type: Grant
    Filed: June 28, 1983
    Date of Patent: June 11, 1985
    Assignee: International Business Machines Corporation
    Inventors: Nicholas J. Clecak, Dennis R. McKean, Robert D. Miller, Terry C. Tompkins, Carlton G. Willson
  • Positive resist compositions
    Patent number: 4397937
    Abstract: Positive resists are formed from a soluble phenolic resin and a sensitizer which is a diester of a 1-oxo-2-diazonaphthalene sulfonic acid and of an unsymmetrical primary or secondary aliphatic diol which is a mixture of geometric and diastereoisomers.
    Type: Grant
    Filed: February 10, 1982
    Date of Patent: August 9, 1983
    Assignee: International Business Machines Corporation
    Inventors: Nicholas J. Clecak, Dennis R. McKean, Robert D. Miller, Terry C. Tompkins, Robert J. Twieg, Carlton G. Willson