Abstract: An improved organization for a MOSFET pair mounts first and second FET dies in an overlying or stacked relationship to reduce the surface area ‘footprint’ of the MOSFET pair. The source and drain of a high side FEThigh and a low side FETlow or the drains of the respective high side FEThigh and low side FETlow are bonded together, either directly or through an intermediate conductive ribbon or clip, to establish a common source/drain or drain/drain node that functions as the switch or phase node of the device. The stacked organization allows for lower-cost packaging that results in a significant reduction in the surface area footprint of the device and reduces parasitic impedance relative to the prior side-by-side organization and allows for improved heat sinking.

Abstract: An improved organization for a MOSFET pair mounts first and second FET dies in an overlying or stacked relationship to reduce the surface area ‘footprint’ of the MOSFET pair. The source and drain of a high side FEThigh and a low side FETlow or the drains of the respective high side FEThigh and low side FETlow are bonded together, either directly or through an intermediate conductive ribbon or clip, to establish a common source/drain or drain/drain node that functions as the switch or phase node of the device. The stacked organization allows for lower-cost packaging that results in a significant reduction in the surface area footprint of the device and reduces parasitic impedance relative to the prior side-by-side organization and allows for improved heat sinking.

Abstract: A power semiconductor device includes a plurality of trenches formed within a semiconductor body, each trench including one or more electrodes formed therein. In particular, according to embodiments of the invention, the plurality of trenches of a semiconductor device may include one or more gate electrodes, may include one or more gate electrodes or one or more source electrodes, or may include a combination of both gate and source electrodes formed therein. The trenches and electrodes may have varying depths within the semiconductor body.