Patents by Inventor Devdatt S. Nagvekar

Devdatt S. Nagvekar has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20170233595
    Abstract: Polymer dispersions in aqueous media form binders for pretreatments, coatings and images on substrates. The polymer includes polyamide segments and may have a high percentage of tertiary amide linkages, which facilitates film formation at temperature convenient to textiles and nonwovens. The polyamides are linked with reactions with polyisocyanates (which forms urea linkages if the other reactant is an amine or a urethane linkage if the other reactant is a hydroxyl group).
    Type: Application
    Filed: August 7, 2015
    Publication date: August 17, 2017
    Inventors: Gabor Erdodi, Devdatt S. Nagvekar, Kurt Schroeder, Naser Pourahmady, Yun-Long Pan
  • Patent number: 7977402
    Abstract: Radiation curable ink compositions for impulse printheads are described. The compositions include a photoinitiator system, containing both a photocation polymerization initiator and a free-radical photoinitiator, an acrylate ester of a carboxylic acid ester, and at least one radiation curable material.
    Type: Grant
    Filed: October 10, 2007
    Date of Patent: July 12, 2011
    Assignee: Collins Ink Corporation
    Inventors: Sudhakar Madhusoodhanan, Devdatt S. Nagvekar
  • Patent number: 7893127
    Abstract: Radiation curable and jettable ink compositions comprise ethylenically unsaturated oligomer and an ethylenically unsaturated monofunctional monomer. The compositions may optionally include additional ethylenically unsaturated polyfunctional component and/or chain transfer agent. The compositions have a viscosity at 25° C. of not greater than about 70 cPs and are radiation curable to form a cured ink having an elongation of at least 150%.
    Type: Grant
    Filed: October 11, 2007
    Date of Patent: February 22, 2011
    Assignee: Collins Ink Corporation
    Inventors: Devdatt S. Nagvekar, Matthew M. Ellison
  • Publication number: 20090099277
    Abstract: The present invention is directed to radiation curable and jettable ink compositions and particularly to such compositions which exhibit enhanced elongation, when cured at low doses, and are advantageously used, for example, in digital inkjet printing. The compositions include a polyfunctional component and a monofunctional monomer, and may optionally include an additional monofuctional component and/or chain transfer agent. The compositions have a viscosity at 25° C. of not greater than about 70 cP and are radiation curable to form a cured ink having an elongation of between about 40 and about 150%. In addition, the compositions, when cured at low dose, exhibit a tack free surface and a low coefficient of friction.
    Type: Application
    Filed: October 11, 2007
    Publication date: April 16, 2009
    Inventors: Devdatt S. Nagvekar, Matthew M. Ellison, Daniel A. Wilson
  • Publication number: 20090000508
    Abstract: Disclosed herein are non-aqueous, radiation curable inkjet inks exhibiting stability at high shear rate (good rheological stability), stability at high temperatures, and/or stability in inkjet print heads, especially impulse inkjet print heads. The inks have a wide process window at a variety of print speeds using an impulse inkjet print head.
    Type: Application
    Filed: July 14, 2005
    Publication date: January 1, 2009
    Inventors: Sara Edison, Matthew M. Ellison, John Fech, Xin Huo, Sudhaker Madhusoodhanan, Devdatt S. Nagvekar, Paul E. Snowwhite, Stephen Sung, Kim Lynn Webb
  • Publication number: 20080090930
    Abstract: Radiation curable ink compositions for impulse printheads are described. The compositions include a photoinitiator system, containing both a photocation polymerization initiator and a free-radical photoinitiator, an acrylate ester of a carboxylic acid ester, and at least one radiation curable material.
    Type: Application
    Filed: October 10, 2007
    Publication date: April 17, 2008
    Inventors: Sudhakar Madhusoodhanan, Devdatt S. Nagvekar
  • Patent number: 6355765
    Abstract: A wholly aromatic copolyester having repeating units of the formula: wherein Ar1 is wherein Q is selected from the group consisting of —H, —CH3, —CF3, —Cl, —Br, and —C6H5; wherein Ar2 is selected from the group consisting of wherein X is selected from the group consisting of —Br, —Cl, —CH3 and —C6H5; wherein Ar3 is wherein Ar4 is selected from the group consisting of wherein m has a value of 0.05 to 0.95 and n has a value of 100-m, is characterized by accessible nematic-isotropic transition temperatures providing outstanding orientational order and mechanical properties.
    Type: Grant
    Filed: September 25, 2000
    Date of Patent: March 12, 2002
    Assignee: United States of America as represented by the Secretary of the Air Force
    Inventors: Patrick T. Mather, Devdatt S. Nagvekar, Hong G. Jeon, Loon-Seng Tan
  • Patent number: 6197921
    Abstract: Provided are polymers prepared by the polymerization of monomers of the formulae:
    Type: Grant
    Filed: June 1, 1999
    Date of Patent: March 6, 2001
    Assignee: The United States of America as represented by the Secretary of the Air Force
    Inventors: Loon-Seng Tan, Balasubramanian Sankaran, Devdatt S. Nagvekar
  • Patent number: 6130339
    Abstract: Provided are novel, electropolymerizable monomers of the formulae: ##STR1##
    Type: Grant
    Filed: June 1, 1999
    Date of Patent: October 10, 2000
    Assignee: The United States of America as represented by the Secretary of the Air Force
    Inventors: Loon-Seng Tan, Devdatt S. Nagvekar, Balasubramanian Sankaran