Patents by Inventor Dhirendra Prasad Mathur

Dhirendra Prasad Mathur has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6806006
    Abstract: The current invention provides a method and apparatus that minimizes the destructive effects of non-reflected energy during lithography. More specifically, a cooling system is located within the mask. In one example, a cooling module is integrated into the EUV mask. The cooling module may be thermoelectric. The EUV mask comprises a substrate structure as a base for a reticle, a cooling layer, which is formed on the substrate structure and a planarizing layer deposited on the cooling layer. In another example, a cooling channel is formed within the mask.
    Type: Grant
    Filed: July 15, 2002
    Date of Patent: October 19, 2004
    Assignees: International Business Machines Corporation, Photronics, Inc.
    Inventors: Michael J. Lercel, Dhirendra Prasad Mathur
  • Publication number: 20040009410
    Abstract: The current invention provides a method and apparatus that minimizes the destructive effects of non-reflected energy during lithography. More specifically, a cooling system is located within the mask. In one example, a cooling module is integrated into the EUV mask. The cooling module may be thermoelectric. The EUV mask comprises a substrate structure as a base for a reticle, a cooling layer, which is formed on the substrate structure and a planarizing layer deposited on the cooling layer. In another example, a cooling channel is formed within the mask.
    Type: Application
    Filed: July 15, 2002
    Publication date: January 15, 2004
    Applicant: International Business Machines Corporation
    Inventors: Michael J. Lercel, Dhirendra Prasad Mathur