Patents by Inventor Didier Marneffe
Didier Marneffe has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11434560Abstract: The invention relates to a vapour generator for the deposition of a metal coating onto a substrate (7), preferably a steel strip, that comprises a vacuum chamber (6) in the form of a housing including a vapour deposition head or ejector (3) in tight communication via a supply duct (4) with at least one crucible (1) containing the coating metal in a liquid form and located outside the vacuum chamber (6), characterised in that the ejector (3) includes a longitudinal slot for the vapour outlet acting as a sonic throat and extending on the entire width of the substrate (7), a filtration medium or a charge loss member (3A) made of a sintered material being provided in the ejector immediately before said slot on the vapour path in order to equalise the flow speed of the vapour exiting the ejector (3) through the sonic throat.Type: GrantFiled: October 10, 2008Date of Patent: September 6, 2022Assignee: Arcelormittal FranceInventors: Pierre Banaszak, Didier Marneffe, Eric Silberberg, Luc Vanhee
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Publication number: 20210238734Abstract: A vacuum deposition facility 1 for continuously depositing, on a running substrate S, coatings formed from metal or metal alloy, the facility including an evaporation crucible 4 suited to supply metal or metal alloy vapor and including an evaporation pipe 7, a deposition chamber 2 suited to have the substrate S run through along a given path P and a vapor jet coater 3 linking the evaporation pipe to the deposition chamber, wherein the vapor jet coater further includes a repartition chamber 31 including at least one reheater 33 positioned within the repartition chamber and a vapor outlet orifice 32 including a base opening linking the vapor outlet orifice to the repartition chamber, a top opening through which the vapor can exit in the deposition chamber and two sides converging toward each other in the direction of the top opening.Type: ApplicationFiled: June 11, 2019Publication date: August 5, 2021Inventors: Sergio PACE, Bruno SCHMITZ, Didier MARNEFFE, Eric SILBERBERG
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Publication number: 20210164088Abstract: A vacuum deposition facility for continuously depositing, on a running substrate, coatings formed from metal or metal alloy, the facility including—a vacuum chamber and a device for running the substrate through the vacuum chamber along a given path, wherein the vacuum chamber further includes: a central casing including a substrate entry and a substrate exit located on two opposite sides of the central casing and a vapor jet coater, the inner walls of the central casing being suited to be heated at a temperature above the condensation temperature of the metal or metal alloy vapors, a vapor trap in the form of an external casing located at the substrate exit of the central casing, the inner walls of the vapor trap being suited to be maintained at a temperature below the condensation temperature of the metal or metal alloy vapors.Type: ApplicationFiled: December 11, 2018Publication date: June 3, 2021Inventors: Eric SILBERBERG, Bruno SCHMITZ, Sergio PACE, Remy BONNEMANN, Didier MARNEFFE
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Publication number: 20200362450Abstract: A vacuum deposition facility for continuously depositing, on a running substrate, coatings formed from metal or metal alloy, and including: a central casing including a vapor jet coater, the inner walls of the central casing being suited to be heated at a temperature above the condensation temperature of the metal or metal alloy vapors, a vapor trap located at the substrate exit of the central casing, the inner walls of the vapor trap being suited to be maintained at a temperature below the condensation temperature of the metal or metal alloy vapors, the passage linking the central casing to the vapor trap including at least one thermal connector extending at least from the inner walls of the central casing to the inner walls of the vapor trap.Type: ApplicationFiled: December 11, 2018Publication date: November 19, 2020Inventors: Eric SILBERBERG, Bruno SCHMITZ, Sergio PACE, Remy BONNEMANN, Didier MARNEFFE
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Patent number: 10011905Abstract: The present invention relates to a facility for the continuous vacuum deposition of a metal coating on a substrate in motion, comprising a vacuum deposition enclosure (24), at least one vapor jet deposition head (25,26) connected to an evaporator pot (9) designed to contain the coating metal in liquid form (11), through a vapor supply pipe (20) provided with a distribution valve (19), and a melting furnace (1) for said metal, said furnace being at atmospheric pressure, located below the lowest portion of the evaporator pot (9) and connected to the evaporator pot (9) by at least one automatic supply pipe (8) of the evaporator pot (9) provided with a supply pump (6) and by at least one liquid metal return pipe (8A,18) optionally provided with a valve (16,17), regulating means for the supply pump (6) further being present to regulate a determined liquid metal level in the evaporator pot (9), characterized in that it comprises, in each said supply and return pipes (8; 8A,18), a so-called heat valve area (7,13,15)Type: GrantFiled: January 12, 2012Date of Patent: July 3, 2018Assignee: Arcelormittal Investigacion Y Desarrollo SLInventors: Pierre Banaszak, Didier Marneffe, Bruno Schmitz, Eric Silberberg, Luc Vanhee
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Publication number: 20140127406Abstract: The present invention relates to a facility for the continuous vacuum deposition of a metal coating on a substrate in motion, comprising a vacuum deposition enclosure (24), at least one vapor jet deposition head (25,26) connected to an evaporator pot (9) designed to contain the coating metal in liquid form (11), through a vapor supply pipe (20) provided with a distribution valve (19), and a melting furnace (1) for said metal, said furnace being at atmospheric pressure, located below the lowest portion of the evaporator pot (9) and connected to the evaporator pot (9) by at least one automatic supply pipe (8) of the evaporator pot (9) provided with a supply pump (6) and by at least one liquid metal return pipe (8A,18) optionally provided with a valve (16,17), regulating means for the supply pump (6) further being present to regulate a determined liquid metal level in the evaporator pot (9), characterized in that it comprises, in each said supply and return pipes (8; 8A,18), a so-called heat valve area (7,13,15)Type: ApplicationFiled: January 12, 2012Publication date: May 8, 2014Applicant: Arcelormittal Investigacion Y Desarrollo SLInventors: Pierre Banaszak, Didier Marneffe, Bruno Schmitz, Eric Silberberg, Luc Vanhee
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Patent number: 7931750Abstract: The invention relates to a sealing lock, for an in vacuo chamber for deposition on a, preferably metallic, endless strip, characterized in that: the metal rollers are mounted on brackets, fixed to the covers and are immovable like the latter, the rollers of the same pair have the axes thereof arranged in the same vertical plane and are of different diameter, the position of the roller with the smaller diameter being alternated up and down on passing from a given pair to the next pair, the support cradles for the two rollers of the same pair have a lateral projection towards the center, the spacing of which with regard to the base for said rollers defines a second gap.Type: GrantFiled: April 19, 2004Date of Patent: April 26, 2011Assignee: Arcelor FranceInventors: Stéphane Coolen, Eric Silberberg, Didier Marneffe, Bernard D'Hondt, Claudio De Felice
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Publication number: 20110000431Abstract: The invention relates to a vapour generator for the deposition of a metal coating onto a substrate (7), preferably a steel strip, that comprises a vacuum chamber (6) in the form of a housing including a vapour deposition head or ejector (3) in tight communication via a supply duct (4) with at least one crucible (1) containing the coating metal in a liquid form and located outside the vacuum chamber (6), characterised in that the ejector (3) includes a longitudinal slot for the vapour outlet acting as a sonic throat and extending on the entire width of the substrate (7), a filtration medium or a charge loss member (3A) made of a sintered material being provided in the ejector immediately before said slot on the vapour path in order to equalise the flow speed of the vapour exiting the ejector (3) through the sonic throat.Type: ApplicationFiled: October 10, 2008Publication date: January 6, 2011Applicant: ARCELORMITTAL FRANCEInventors: Pierre Banaszak, Didier Marneffe, Eric Silberberg, Luc Vanhee
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Publication number: 20060236942Abstract: The invention relates to a sealing lock, for an in vacuo chamber for deposition on a, preferably metallic, endless strip, characterised in that: the metal rollers are mounted on brackets, fixed to the covers and are immovable like the latter, the rollers of the same pair have the axes thereof arranged in the same vertical plane and are of different diameter, the position of the roller with the smaller diameter being alternated up and down on passing from a given pair to the next pair, the support cradles for the two rollers of the same pair have a lateral projection towards the centre, the spacing of which with regard to the base for said rollers defines a second gap.Type: ApplicationFiled: April 19, 2004Publication date: October 26, 2006Applicant: Usinor S.A.Inventors: Stephane Coolen, Eric Silberberg, Didier Marneffe, Bernard D'Hondt