Patents by Inventor Dietmar Schwanke

Dietmar Schwanke has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6887448
    Abstract: The invention relates to a method for the production of high purity silicon, characterized by the following steps: a) reaction of metallic silicon with silicon tetrachloride (SiCl4), hydrogen (H2) and hydrochloric acid (HCl) at a temperature of 500 to 800° C. and a pressure of 25 to 40 bar to give a trichlorosilane-containing (SiHCl3) feed gas stream, b) removal of impurities from the resultant trichlorosilane-containing feed gas stream by scrubbing with condensed chlorosilanes at a pressure of 25 to 40 bar and a temperature of 160 to 200° C.
    Type: Grant
    Filed: November 21, 2001
    Date of Patent: May 3, 2005
    Assignee: SolarWorld AG
    Inventors: Hans-Dieter Block, Leslaw Mleczko, Hans-Joachim Leimkühler, Rainer Weber, Knud Werner, Dietmar Schwanke, Johannes-Peter Schäfer, Gebhard Wagner
  • Publication number: 20040047797
    Abstract: The invention relates to a method for the production of high purity silicon, characterized by the following steps: a) reaction of metallic silicon with silicon tetrachloride (SiCl4), hydrogen (H2) and hydrochloric acid (HCl) at a temperature of 500 to 800° C. and a pressure of 25 to 40 bar to give a trichlorosilane-containing (SiHCl3) feed gas stream, b) removal of impurities from the resultant trichlorosilane-containing feed gas stream by scrubbing with condensed chlorosilanes at a pressure of 25 to 40 bar and a temperature of 160 to 200° C.
    Type: Application
    Filed: October 2, 2003
    Publication date: March 11, 2004
    Inventors: Hans-Dieter Block, Leslaw Mleczko, Hans-Joachim Leimkuhler, Rainer Weber, Knud Werner, Dietmar Schwanke, Johannes-Peter Schafer, Gebhard Wagner