Patents by Inventor Dileep Agnihotri
Dileep Agnihotri has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11938450Abstract: A novel reverse osmosis or nanofiltration system (RO/NF) capable of detecting and responding to onset of fouling within the system utilizing uniquely configured membrane permeate flow path within the system which generates a time-sensitive data. Membrane performance data in real-time operating conditions is then utilized for rapid detection of membrane fouling, fouling rate, and cause of fouling, followed by controller-based system generated actions to stop, and recover from fouling or slow-down fouling, and, if required, to predict, plan, and schedule operator intervention steps to recover optimum system operating conditions. The end-result is a novel energy-efficient and fouling-managed advanced (machine learning) reverse osmosis system for brackish water desalination.Type: GrantFiled: September 6, 2023Date of Patent: March 26, 2024Assignee: Surplus Management, IncInventors: Dileep Agnihotri, Masoud Aghajani, Sriram Sambasivam, Joseph John Barelli, Ian Tonner
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Patent number: 10583401Abstract: An open architecture desalination system having a field of water desalination using porous micro filtration or ultrafiltration (MF or UF) membranes followed by high pressure reverse osmosis (RO) membranes for salt removal. A novel integrated system with a unique process flow allowing use of multiple UF and MF membrane configurations on same platform is also disclosed. Additionally, the systemutilizes a noble process flow to enable high efficiency operation of the MF and UF membranes thus reducing footprint, longer life of the membranes and reduced energy.Type: GrantFiled: February 15, 2014Date of Patent: March 10, 2020Inventor: Dileep Agnihotri
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Patent number: 10518226Abstract: A membrane with rejection properties for mono and divalent-salts, BOD and COD good resistance to cleaning chemicals and maintaining high permeability for water. A polymeric coating prepared from polydopamine or hydroquinone or catechol or mixtures thereof, is deposited. In another embodiment, coating process steps and conditions are taught to achieve thickness control to tune the rejection properties of the membranes.Type: GrantFiled: May 15, 2012Date of Patent: December 31, 2019Inventors: Dileep Agnihotri, Xiaofei Huang, Hua Li
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Publication number: 20150375174Abstract: An open architecture desalination system having a field of water desalination using porous micro filtration or ultrafiltration (MF or UF) membranes followed by high pressure reverse osmosis (RO) membranes for salt removal. A novel integrated system with a unique process flow allowing use of multiple UF and MF membrane configurations on same platform is also disclosed. Additionally, the system utilizes a noble process flow to enable high efficiency operation of the MF and UF membranes thus reducing footprint, longer life of the membranes and reduced energy.Type: ApplicationFiled: February 15, 2014Publication date: December 31, 2015Inventor: Dileep AGNIHOTRI
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Publication number: 20140054221Abstract: A membrane with rejection properties for mono and divalent-salts, BOD and COD good resistance to cleaning chemicals and maintaining high permeability for water. A polymeric coating prepared from polydopamine or hydroquinone or catechol or mixtures thereof, is deposited. In another embodiment, coating process steps and conditions are taught to achieve thickness control to tune the rejection properties of the membranes.Type: ApplicationFiled: May 15, 2012Publication date: February 27, 2014Applicant: ADVANCED HYDRO INCInventors: Dileep Agnihotri, Xiaofei Huang, Hua Li
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Publication number: 20110227000Abstract: Disclosed are methods for preparing electrophoretically deposited graphene based films.Type: ApplicationFiled: March 21, 2011Publication date: September 22, 2011Inventors: Rodney S. Ruoff, Sung Jin An, Meryl Stoller, Tryggvi Emilsson, Dileep Agnihotri
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Patent number: 7804934Abstract: A method for inspection of a sample includes directing an excitation beam to impinge on an area of a planar sample that includes a feature having sidewalls perpendicular to a plane of the sample, the sidewalls having a thin film thereon. An intensity of X-ray fluorescence (XRF) emitted from the sample responsively to the excitation beam is measured, and a thickness of the thin film on the sidewalls is assessed based on the intensity. In another method, the width of recesses in a surface layer of a sample and the thickness of a material deposited in the recesses after polishing are assessed using XRF.Type: GrantFiled: November 17, 2008Date of Patent: September 28, 2010Assignee: Jordan Valley Semiconductors Ltd.Inventors: Dileep Agnihotri, Jeremy O'Dell, Isaac Mazor, Boris Yokhin
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Patent number: 7680243Abstract: A method for analyzing a sample includes directing one or more beams of X-rays to impinge on an area of a surface of the sample on which a layer of nano-particles of a selected element has been formed. Secondary X-ray radiation from the area is detected responsively to the one or more beams. A distribution of the nano-particles on the surface is characterized based on the detected radiation.Type: GrantFiled: September 6, 2007Date of Patent: March 16, 2010Assignee: Jordan Valley Semiconductors Ltd.Inventors: Boris Yokhin, Alexander Tokar, Alexander Krokhmal, Asher Peled, Dileep Agnihotri
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Patent number: 7649978Abstract: The computer-implemented method for inspection of a sample includes defining a plurality of locations on a surface of the sample, irradiating the surface at each of the locations with a beam of X-rays, and measuring an angular distribution of the X-rays that are emitted from the surface responsively to the beam, so as to produce a respective plurality of X-ray spectra. The X-ray spectra are analyzed to produce respective figures-of-merit indicative of a measurement quality of the X-ray spectra at the respective location. One or more locations are selected out of the plurality of locations responsively to the figures-of-merit, and a property of the sample is estimated using the X-ray spectra measured at the selected location.Type: GrantFiled: September 12, 2008Date of Patent: January 19, 2010Assignee: Jordan Valley Semiconductors Ltd.Inventors: Isaac Mazor, Alex Dikopoltsev, Boris Yokhin, Dileep Agnihotri, Tzachi Rafaeli, Alex Tokar, David Berman, Moshe Beylin
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Publication number: 20090074137Abstract: A method for inspection of a sample includes directing an excitation beam to impinge on an area of a planar sample that includes a feature having sidewalls perpendicular to a plane of the sample, the sidewalls having a thin film thereon. An intensity of X-ray fluorescence (XRF) emitted from the sample responsively to the excitation beam is measured, and a thickness of the thin film on the sidewalls is assessed based on the intensity. In another method, the width of recesses in a surface layer of a sample and the thickness of a material deposited in the recesses after polishing are assessed using XRF.Type: ApplicationFiled: November 17, 2008Publication date: March 19, 2009Applicant: JORDAN VALLEY SEMICONDUCTORS LTD.Inventors: Dileep Agnihotri, Jeremy O'Dell, Isaac Mazor, Boris Yokhin
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Publication number: 20090074141Abstract: A computer-implemented method for inspection of a sample includes defining a plurality of locations on a surface of the sample, irradiating the surface at each of the locations with a beam of X-rays, and measuring an angular distribution of the X-rays that are emitted from the surface responsively to the beam, so as to produce a respective plurality of X-ray spectra. The X-ray spectra are analyzed to produce respective figures-of-merit indicative of a measurement quality of the X-ray spectra at the respective locations. One or more locations are selected out of the plurality of locations responsively to the figures-of-merit, and a property of the sample is estimated using the X-ray spectra measured at the selected locations.Type: ApplicationFiled: September 12, 2008Publication date: March 19, 2009Applicant: JORDAN VALLEY SEMICONDUCTORS LTD.Inventors: Isaac Mazor, Alex Dikopoltsev, Boris Yokhin, Dileep Agnihotri, Tzachi Rafaeli, Alex Tokar, David Berman, Moshe Beylin
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Publication number: 20090067573Abstract: A method for analyzing a sample includes directing one or more beams of X-rays to impinge on an area of a surface of the sample on which a layer of nano-particles of a selected element has been formed. Secondary X-ray radiation from the area is detected responsively to the one or more beams. A distribution of the nano-particles on the surface is characterized based on the detected radiation.Type: ApplicationFiled: September 6, 2007Publication date: March 12, 2009Inventors: Boris Yokhin, Alexander Tokar, Alexander Krokhmal, Asher Peled, Dileep Agnihotri
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Patent number: 7474732Abstract: A method for inspection of a sample includes irradiating the sample with a beam of X-rays and measuring a distribution of the X-rays that are emitted from the sample responsively to the beam, thereby generating an X-ray spectrum. An assessment is made of an effect on the spectrum of a non-uniformity of the beam, and the spectrum is corrected responsively to the effect.Type: GrantFiled: December 1, 2004Date of Patent: January 6, 2009Assignee: Jordan Valley Applied Radiation Ltd.Inventors: David Berman, Asher Peled, Dileep Agnihotri, Tachi Rafaeli, Boris Yokhin
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Publication number: 20080049895Abstract: A method for inspection of a sample includes directing an excitation beam to impinge on an area of a planar sample that includes a feature having sidewalls perpendicular to a plane of the sample, the sidewalls having a thin film thereon. An intensity of X-ray fluorescence (XRF) emitted from the sample responsively to the excitation beam is measured, and a thickness of the thin film on the sidewalls is assessed based on the intensity. In another method, the width of recesses in a surface layer of a sample and the thickness of a material deposited in the recesses after polishing are assessed using XRF.Type: ApplicationFiled: August 10, 2007Publication date: February 28, 2008Inventors: Dileep Agnihotri, Jeremy O'Dell
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Patent number: 7130376Abstract: A method for inspection of a sample that includes a first layer having a known reflectance property and a second layer formed over the first layer. The method includes directing radiation toward a surface of the sample and sensing the radiation reflected from the surface so as to generate a reflectance signal as a function of elevation angle relative to the surface. A feature due to reflection of the radiation from the first layer is identified in the reflectance signal. The reflectance signal is calibrated responsively to the identified feature and to the known reflectance property of the first layer. The calibrated reflectance signal is analyzed to determine a characteristic of the second layer. Other enhanced inspection methods are disclosed, as well.Type: GrantFiled: December 7, 2005Date of Patent: October 31, 2006Assignee: Jordan Valley Applied Radiation Ltd.Inventors: David Berman, Alex Dikopoltsev, Dileep Agnihotri
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Patent number: 7103142Abstract: A method for inspection of a sample includes irradiating the sample with a beam of X-rays, measuring a distribution of the X-rays that are emitted from the sample responsively to the beam, thereby generating an X-ray spectrum, and applying a multi-step analysis to the spectrum so as to determine one or more physical properties of a simulated model of the sample. The multi-step analysis includes spectrally analyzing the spectrum so as to determine one or more characteristic frequencies and fitting the simulated model to the spectrum by an iterative optimization process beginning from an initial condition determined by the one or more characteristic frequencies.Type: GrantFiled: February 24, 2005Date of Patent: September 5, 2006Assignee: Jordan Valley Applied Radiation Ltd.Inventors: Dileep Agnihotri, Alex Dikopoltsev, Boris Yokhin
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Publication number: 20060188062Abstract: A method for inspection of a sample includes irradiating the sample with a beam of X-rays, measuring a distribution of the X-rays that are emitted from the sample responsively to the beam, thereby generating an X-ray spectrum, and applying a multi-step analysis to the spectrum so as to determine one or more physical properties of a simulated model of the sample. The multi-step analysis includes spectrally analyzing the spectrum so as to determine one or more characteristic frequencies and fitting the simulated model to the spectrum by an iterative optimization process beginning from an initial condition determined by the one or more characteristic frequencies.Type: ApplicationFiled: February 24, 2005Publication date: August 24, 2006Inventors: Dileep Agnihotri, Alex Dikopoltsev, Boris Yokhin
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Publication number: 20060153333Abstract: A method for inspection of a sample that includes a first layer having a known reflectance property and a second layer formed over the first layer. The method includes directing radiation toward a surface of the sample and sensing the radiation reflected from the surface so as to generate a reflectance signal as a function of elevation angle relative to the surface. A feature due to reflection of the radiation from the first layer is identified in the reflectance signal. The reflectance signal is calibrated responsively to the identified feature and to the known reflectance property of the first layer. The calibrated reflectance signal is analyzed to determine a characteristic of the second layer. Other enhanced inspection methods are disclosed, as well.Type: ApplicationFiled: December 7, 2005Publication date: July 13, 2006Inventors: David Berman, Alex Dikopoltsev, Dileep Agnihotri
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Patent number: 7062013Abstract: A method for inspection of a sample that includes a first layer having a known reflectance property and a second layer formed over the first layer. The method includes directing radiation toward a surface of the sample and sensing the radiation reflected from the surface so as to generate a reflectance signal as a function of elevation angle relative to the surface. A feature due to reflection of the radiation from the first layer is identified in the reflectance signal. The reflectance signal is calibrated responsively to the identified feature and to the known reflectance property of the first layer. The calibrated reflectance signal is analyzed to determine a characteristic of the second layer. Other enhanced inspection methods are disclosed, as well.Type: GrantFiled: October 20, 2003Date of Patent: June 13, 2006Assignee: Jordan Valley Applied Radiation Ltd.Inventors: David Berman, Alex Dikopoltsev, Dileep Agnihotri
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Publication number: 20060115046Abstract: A method for inspection of a sample includes irradiating the sample with a beam of X-rays and measuring a distribution of the X-rays that are emitted from the sample responsively to the beam, thereby generating an X-ray spectrum. An assessment is made of an effect on the spectrum of a non-uniformity of the beam, and the spectrum is corrected responsively to the effect.Type: ApplicationFiled: December 1, 2004Publication date: June 1, 2006Inventors: David Berman, Asher Peled, Dileep Agnihotri, Tachi Rafaeli, Boris Yokhin