Patents by Inventor Dino Deligiannis

Dino Deligiannis has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Vacuum deposition system and method thereof
    Patent number: 11916036
    Abstract: A system and method are provided for depositing a substance onto a substrate, the system comprising: a chamber adapted to operate under high vacuum; an apparatus for receiving and cleaning the substrate to produce a clean substrate and for delivering the clean substrate to a coating position in the chamber under high vacuum; a carrier assembly for receiving the clean substrate from the apparatus and for retaining the substrate at the coating position; an evaporator adapted to hold a supply of the substance in the chamber and to evaporate and produce a discharge of the substance; and a collimator disposed within the chamber between the supply of the substance and the carrier assembly, the collimator being configured to define an aperture proximal to the substrate and to capture the discharge but for that which is directed through the aperture.
    Type: Grant
    Filed: July 6, 2021
    Date of Patent: February 27, 2024
    Assignee: INTLVAC INC.
    Inventors: Michael Nagy, Dino Deligiannis
  • VACUUM DEPOSITION SYSTEM AND METHOD THEREOF
    Publication number: 20210335746
    Abstract: A system and method are provided for depositing a substance onto a substrate, the system comprising: a chamber adapted to operate under high vacuum; an apparatus for receiving and cleaning the substrate to produce a clean substrate and for delivering the clean substrate to a coating position in the chamber under high vacuum; a carrier assembly for receiving the clean substrate from the apparatus and for retaining the substrate at the coating position; an evaporator adapted to hold a supply of the substance in the chamber and to evaporate and produce a discharge of the substance; and a collimator disposed within the chamber between the supply of the substance and the carrier assembly, the collimator being configured to define an aperture proximal to the substrate and to capture the discharge but for that which is directed through the aperture.
    Type: Application
    Filed: July 6, 2021
    Publication date: October 28, 2021
    Applicant: INTLVAC INC.
    Inventors: Michael Nagy, Dino Deligiannis
  • Vaccum deposition system and method thereof
    Patent number: 11088107
    Abstract: A system and method are provided for depositing a substance onto a substrate, the system comprising: a chamber adapted to operate under high vacuum; an apparatus for receiving and cleaning the substrate to produce a clean substrate and for delivering the clean substrate to a coating position in the chamber under high vacuum; a carrier assembly for receiving the clean substrate from the apparatus and for retaining the substrate at the coating position; an evaporator adapted to hold a supply of the substance in the chamber and to evaporate and produce a discharge of the substance; and a collimator disposed within the chamber between the supply of the substance and the carrier assembly, the collimator being configured to define an aperture proximal to the substrate and to capture the discharge but for that which is directed through the aperture.
    Type: Grant
    Filed: August 7, 2019
    Date of Patent: August 10, 2021
    Assignee: INTLVAC INC.
    Inventors: Michael Nagy, Dino Deligiannis
  • VACCUM DEPOSITION SYSTEM AND METHOD THEREOF
    Publication number: 20200051946
    Abstract: A system and method are provided for depositing a substance onto a substrate, the system comprising: a chamber adapted to operate under high vacuum; an apparatus for receiving and cleaning the substrate to produce a clean substrate and for delivering the clean substrate to a coating position in the chamber under high vacuum; a carrier assembly for receiving the clean substrate from the apparatus and for retaining the substrate at the coating position; an evaporator adapted to hold a supply of the substance in the chamber and to evaporate and produce a discharge of the substance; and a collimator disposed within the chamber between the supply of the substance and the carrier assembly, the collimator being configured to define an aperture proximal to the substrate and to capture the discharge but for that which is directed through the aperture.
    Type: Application
    Filed: August 7, 2019
    Publication date: February 13, 2020
    Inventors: Michael Nagy, Dino Deligiannis