Patents by Inventor Dirk Burdinski
Dirk Burdinski has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20100254913Abstract: In magnetic resonance imaging (MRI) based on chemical exchange-dependent saturation transfer (CEST), a novel carrier for CEST contrast agents is provided. The carrier is non-spherical and comprises a semipermeable shell, wherein the shell comprises a paramagnetic compound. The shell encloses a cavitycomprising an MR analyte, wherein the semipermeable shell allows diffusion of the MR analyte. The CEST effect is based on the 5 bulk magnetic susceptibility effect caused by the anisotropy of the carrier. This leads to a versatile carrier that does not require interaction of the analyte with a paramgnetic chemical shift reagent.Type: ApplicationFiled: November 21, 2008Publication date: October 7, 2010Applicant: KONINKLIJKE PHILIPS ELECTRONICS N.V.Inventors: Dirk Burdinski, Sander Langereis, Jeroen Alphons Pikkemaat
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Publication number: 20100247445Abstract: Described are Chemical Exchange-dependent Saturation Transfer (CEST) contrast agents for Magnetic Resonance Imaging (MRI) comprising a polymersome provided with a paramagnetic agent. The polymersome preferably comprises a polymeric shell enclosing a cavity, wherein the cavity comprises a pool of proton analytes, and wherein the shell allows diffusion of the proton analytes. The polymersome-based CEST MRI contrast agents are suitable as drug carriers useful in MRI-guided drug release.Type: ApplicationFiled: December 4, 2008Publication date: September 30, 2010Applicant: KONINKLIJKE PHILIPS ELECTRONICS N.V.Inventors: Sander Langereis, Holger Gruell, Lea Louise Pauline Messager, Jeroen Alphons Pikkemaat, Dirk Burdinski
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Patent number: 7687275Abstract: The present invention relates to a method for amplifying the detected signal in a gas sensor. More specifically, the present invention relates to a method for increasing the concentration of the gas which is being detected in a sample or increasing the concentration of a gas which is directly obtained from the gas in the sample by chemical reaction. The gas which is to be detected is nitric oxide (NO). In particular, the method concerns the selective conversion of NO to NO2 which allows a threefold amplification of the number of analyte molecules in NO trace gas analysis in a single amplification cycle. Subsequent reduction or thermal decomposition of the obtained NO2 can provide NO again, which can again be introduced in a new amplification cycle. Multiple (n) amplification cycles can provide a sensitivity amplification by a factor 3n. The method can be combined with a multitude of detection methods and tolerates a high humidity.Type: GrantFiled: September 4, 2006Date of Patent: March 30, 2010Assignee: Koninklijke Philips Electronics N.V.Inventor: Dirk Burdinski
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Publication number: 20090298296Abstract: The present invention is concerned with a process of surface patterning and via manufacturing employing controlled precipitative growth, and patterned substrates prepared by such a process according to the present invention. A process according to the present invention comprises providing a substrate including at least one surface on which it is required to pattern a material, the surface including at least first and second surface regions having distinct surface properties and wherein the first surface region is further provided with protective precipitative growth thereon, and applying at least one material to at least the second surface region, such that the applied material is either substantially not provided to the first surface region, or if provided to the first surface region can be selectively removed therefrom.Type: ApplicationFiled: December 12, 2005Publication date: December 3, 2009Applicant: KONINKLIJKE PHILIPS ELECTRONICS, N.V.Inventor: Dirk Burdinski
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Publication number: 20090272715Abstract: The present invention relates to a process of nano fabrication based on nucleated SAM growth, to patterned substrates prepared thereby, to a nano wire or grid of nanowires prepared thereby and to electronic devices including the same. In particular, there is provided a process which comprises applying a first SAM-forming molecular species to a first surface region of the substrate surface, so as to provide a first SAM defining a scaffold pattern on the first surface region; and applying a second SAM-forming molecular species to at least a second surface region of said substrate surface which is not covered by the first SAM, whereby a second replica SAM comprising the second SAM-forming molecular species selectively forms on substrate surface adjacent to at least one edge of said first SAM.Type: ApplicationFiled: December 14, 2005Publication date: November 5, 2009Applicant: KONINKLIJKE PHILIPS ELECTRONICS, N.V.Inventors: Dirk Burdinski, Ruben Bernardus Alfred Sharpe
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Publication number: 20090015930Abstract: A collimator panel comprises: a solid panel having a first face for receiving uncollimated radiation and a second opposite face for providing collimated radiation; and a plurality of elongate particles disposed in the panel and orientated to provide the collimating function. A method of manufacturing a collimator panel comprises the steps of: suspending a plurality of elongate particles in a liquid; applying an electric or magnetic field to the suspension to orientate the particles; and solidifying the liquid to fix the orientation of the particles, thereby forming a collimator panel. A method of manufacturing the elongate particles is also provided.Type: ApplicationFiled: December 8, 2004Publication date: January 15, 2009Applicant: KONINKLIJKE PHILIPS ELECTRONIC, N.V.Inventors: Rifat A.M. Hikmet, Ties Van Bommel, Peter Van De Witte, Reinhold Wimberger-Friedl, Dirk Burdinski
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Publication number: 20080311300Abstract: The composition is suitable for the provision of monolayers on selected surfaces. Thereto, it comprises a first compound able to form a monolayer on a first surface, and a second compound able to form a monolayer on a second surface that is different from the first surface, which first and second compounds are chosen such as to be mutually at least substantially inert. The selected surfaces may be present on a single substrate, which allows homogenization, and the provision of masking surfaces covering part of the underlying surfaces. The selected surfaces may alternatively present on different substrates, allowing the use of a printer with a standardized printing pattern.Type: ApplicationFiled: July 21, 2006Publication date: December 18, 2008Applicant: KONINKLIJKE PHILIPS ELECTRONICS, N.V.Inventors: Dirk Burdinski, Milan Saalmink
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Publication number: 20080283489Abstract: A gold layer (20) is patterned with a gold oxide mask (30), which mask is patterned with an acid, preferably with microcontactprinting. The gold oxide mask (30) is stable in alkalic etch solutions for the gold layer (20). The gold oxide mask (30) may be maintained to create a reexposable gold pad (20).Type: ApplicationFiled: October 24, 2006Publication date: November 20, 2008Applicant: KONINKLIJKE PHILIPS ELECTRONICS, N.V.Inventors: Dirk Burdinski, Ruben Bernardus Alfred Sharpe, Martin Hillebrand Blees, Jurriaan Huskens
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Publication number: 20080261322Abstract: The present invention relates to a method for amplifying the detected signal in a gas sensor. More specifically, the present invention relates to a method for increasing the concentration of the gas which is being detected in a sample or increasing the concentration of a gas which is directly obtained from the gas in the sample by chemical reaction. The gas which is to be detected is nitric oxide (NO). In particular, the method concerns the selective conversion of NO to NO2 which allows a threefold amplification of the number of analyte molecules in NO trace gas analysis in a single amplification cycle. Subsequent reduction or thermal decomposition of the obtained NO2 can provide NO again, which can again be introduced in a new amplification cycle. Multiple (n) amplification cycles can provide a sensitivity amplification by a factor 3n. The method can be combined with a multitude of detection methods and tolerates a high humidity.Type: ApplicationFiled: September 4, 2006Publication date: October 23, 2008Applicant: KONINKLIJKE PHILIPS ELECTRONICS, N.V.Inventor: Dirk Burdinski
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Publication number: 20070227383Abstract: The present invention provides a soft lithographic stamp (30) and a method for the manufacturing of such a stamp (30). A stamp (30) according to the present invention comprises blocking regions (37) and printing regions (38). The blocking regions (37) are formed of a material which is different from the material the printing regions (38) are formed of and which exhibits a reduced permeability, diffusivity or absorbing or adsorbing capability to the printing compound, such that it prevents or significantly reduces chemical or physical transport or transfer of the printing compound from the blocking regions to a substrate that has to be patterned or printed.Type: ApplicationFiled: June 27, 2005Publication date: October 4, 2007Applicant: KONINKLIJKE PHILIPS ELECTRONICS, N.V.Inventors: Michel Decre, Martin Blees, Patrick Van Eerd, Richard Schroeders, Dirk Burdinski, Ruben Sharpe, Jurriaan Huskens
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Publication number: 20070145632Abstract: An elastomeric stamp (10) for printing a pattern on a substrate (500) with an ink (520) is at least partially formed from a first material such as PDMS. The stamp comprises a first surface (12) in a first plane, a second surface (14) in a second plane and a third surface (16) extending from the first surface (12) to the second surface (14). The first surface (12) typically forms to the contact surface of a protruding feature of the stamp (10), whereas the third surface (16) typically forms the edge of such a feature. The first surface (12) comprises a barrier layer (22) being substantially impermeable to the ink (520). Optionally, the second surface (14) may carry a further barrier layer (24) to suppress gas phase diffusion of the ink (520). In contrast, the third surface (16) is permeable to the ink (520). Consequently, a stamp (10) is obtained that is highly suitable for edge transfer lithography type patterning.Type: ApplicationFiled: October 7, 2004Publication date: June 28, 2007Inventors: Emiel Peeters, Dirk Broer, Fredericus Van Den Heuvel, Dirk Burdinski
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Publication number: 20070138131Abstract: A method of forming a patterned self-assembled monolayer (20) on a substrate (24) by means of a soft lithographic patterning process, the method comprising: a) providing patterning means (10) for defining the required pattern of said patterned self-assembled monolayer (20); b) forming a self-assembled monolayer (20) on a surface (22) of said substrate (24); c) applying said patterning means (10) to said surface of said substrate (24), said patterning means (10) being arranged to deliver a modifier to selected areas of said substrate surface, said selected areas corresponding to said required pattern or a negative thereof, said modifier comprising a chemical and being arranged to alter at said selected areas the strength of interaction between the molecules of said selfassembled monolayer (10) and said surface of said substrate (24); and d) selectively removing or replacing areas of said self-a monolayer (20) that, after step c), exhibit a lower strength of interaction between the molecules thereof and said suType: ApplicationFiled: November 1, 2004Publication date: June 21, 2007Inventor: Dirk Burdinski
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Publication number: 20070125255Abstract: An elastomeric stamp (10) is provided, which has a bulk surface (12) from which protruding features (14, 14?) extend. A barrier layer (20) covers the bulk surface (12) and the protruding features (14, 14?). After applying an ink solution to the elastomeric stamp (10) and drying the elastomeric stamp (10), the elastomeric stamp (10) is brought into contact with a surface (42) of a first substrate (40). The surface (42) of the first substrate (40) has a high affinity with the ink molecules (32), which is utilized to effectively remove the ink molecules (32) from the contact surfaces (16, 16?) of the protruding features (14, 14?). Subsequently, the elastomeric stamp (10) is brought into contact with the surface (52) of a second substrate (50). Ink molecules 32 are transferred from the edges (18, 18?) of the protruding features (14, 14?) to the surface (52) of a second substrate (50), thus forming an ink pattern in the form of a selfassembled monolayer on this surface (52).Type: ApplicationFiled: October 7, 2004Publication date: June 7, 2007Inventors: Dirk Burdinski, Ruben Sharpe
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Publication number: 20070095469Abstract: A method of forming a SAM on at least one surface of a substrate by application to said surface of a 2-mono-, or 2,2-disubstituted 1,3-dithiacyclopentane so as to form a SAM prepared therefrom on said surface.Type: ApplicationFiled: November 16, 2004Publication date: May 3, 2007Applicant: KONINKLIJKE PHILIPS ELECTRONICS N.V.Inventor: Dirk Burdinski