Patents by Inventor Dirk K. G. De Boer

Dirk K. G. De Boer has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • DEVICE FOR MIXING LIGHT
    Publication number: 20110242837
    Abstract: The present invention relates to a device for mixing light. More specifically, the invention relates to a device for mixing light 100 comprising at least two light sources wherein a first light source 101 emit light of a first wavelength and a second light source 102 emit light of a second wavelength, and further comprising at least one light guide 103 which has a diffraction grating 104 for outcoupling of light and a facet for each of the at least two light sources for incoupling of light, whereby a first facet 105 is adapted to couple light of the first wavelength into the at least one light guide 103, and a second facet 106 is adapted to couple light of the second wavelength into the at least one light guide 103.
    Type: Application
    Filed: December 8, 2009
    Publication date: October 6, 2011
    Applicant: KONINKLIJKE PHILIPS ELECTRONICS N.V.
    Inventors: Hugo J. Cornelissen, Dirk K. G. De Boer
  • SUSPENDED PARTICLE DEVICE
    Publication number: 20090153651
    Abstract: The invention relates to a 3 D display. The 3 D display comprises suspended particle devices with a suspension of elongated particles that align at a predetermined angle with incoming light beam. The display will allow information to be separated relevant to the left and right eye. An electronically controllable set of suspended particle devices adjusts the deflection angle of the outcoming light beam.
    Type: Application
    Filed: January 5, 2005
    Publication date: June 18, 2009
    Applicant: KONINKLIJKE PHILIPS ELECTRONIC, N.V.
    Inventors: Nynke A.M. Verhaegh, Dirk K.G. De Boer, Mark T. Johnson, Bas Van Der Heijden
  • EUV illumination system
    Patent number: 6410928
    Abstract: An EUV illumination system comprises an EUV radiation source unit (1) and at least one EUV radiation-reflecting mirror (10), which mirror comprises a multilayer structure of first layers (12) of a first material alternating with second layers (13) of a second material, and which radiation source unit comprises an electron source (2) for supplying an electron beam (EB) and a medium (3) which converts the electron beam into a beam of photons (IB). As the medium (3) comprises at least one material that is equal to one of the materials of the mirror multilayer structure, the photon beam (IB) has a relatively large intensity.
    Type: Grant
    Filed: December 14, 1999
    Date of Patent: June 25, 2002
    Assignee: Koninklijke Philips Electronics N.V.
    Inventors: Jan Verhoeven, Boris Lastdrager, Adriaan Tip, Dirk K. G. De Boer
  • Method of polishing a surface of copper or an alloy comprising mainly copper
    Patent number: 5622525
    Abstract: Method of polishing a surface (5a) of copper or an alloy comprising mainly copper, in which a polishing means is moved across the surface while exerting a polishing pressure of approximately 500 g/cm.sup.2 for obtaining a plane and smooth polished surface without any defects. A composition of a polishing component comprising a colloidal suspension of SiO.sub.2 particles having an average particle size of between 20 and 50 nm in an alkali solution, demineralized water and a chemical activator is used as a polishing means.
    Type: Grant
    Filed: March 16, 1994
    Date of Patent: April 22, 1997
    Assignee: U.S. Philips Corporation
    Inventors: Jan Haisma, Peter W. De Haas, Dirk K. G. De Boer, Waltherus W. Van den Hoogenhof, Lambertus Postma