Patents by Inventor Dirk Klaassen

Dirk Klaassen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10043894
    Abstract: Disclosed is a transistor having a first region of a first conductivity type for injecting charge carriers into the transistor and a laterally extended second region of the first conductivity type having a portion including a contact terminal for draining said charge carriers from the transistor, wherein the first region is separated from the second region by an intermediate region of a second conductivity type defining a first p-n junction with the first region and a second p-n junction with the second region, wherein the laterally extended region separates the portion from the second p-n junction, and wherein the transistor further comprises a substrate having a doped region of the second conductivity type, said doped region being in contact with and extending along the laterally extended second region and a further contact terminal connected to the doped region for draining minority charge carriers from the laterally extended second region.
    Type: Grant
    Filed: November 17, 2014
    Date of Patent: August 7, 2018
    Assignee: NXP B.V.
    Inventors: Viet Thanh Dinh, Tony Vanhoucke, Evelyne Gridelet, Anco Heringa, Jan Willem Slotboom, Dirk Klaassen
  • Patent number: 10014398
    Abstract: The disclosure relates to bipolar transistor devices and a method of fabricating the same. The device comprises a field plate, in an isolation region adjacent to a base-collector junction of said active region. The isolation region comprises a gate terminal arranged to be biased independently of a collector, base or emitter terminal of said transistor.
    Type: Grant
    Filed: April 24, 2017
    Date of Patent: July 3, 2018
    Assignee: NXP B.V.
    Inventors: Johannes Donkers, Viet Thanh Dinh, Tony Vanhoucke, Evelyne Gridelet, Anco Heringa, Dirk Klaassen
  • Publication number: 20170229564
    Abstract: The disclosure relates to bipolar transistor devices and a method of fabricating the same. The device comprises a field plate, in an isolation region adjacent to a base-collector junction of said active region. The isolation region comprises a gate terminal arranged to be biased independently of a collector, base or emitter terminal of said transistor.
    Type: Application
    Filed: April 24, 2017
    Publication date: August 10, 2017
    Inventors: Johannes Donkers, Viet Thanh Dinh, Tony Vanhoucke, Evelyne Gridelet, Anco Heringa, Dirk Klaassen
  • Patent number: 9570546
    Abstract: A semiconductor device comprising a bipolar transistor and a method of making the same. A power amplifier including a bipolar transistor. The bipolar transistor includes a collector including a laterally extending drift region. The also includes a base located above the collector. The bipolar transistor further includes an emitter located above the base. The bipolar transistor also includes a doped region having a conductivity type that is different to that of the collector. The doped region extends laterally beneath the collector to form a junction at a region of contact between the doped region and the collector. The doped region has a non-uniform lateral doping profile. A doping level of the doped region is highest in a part of the doped region closest to a collector-base junction of the bipolar transistor.
    Type: Grant
    Filed: September 11, 2015
    Date of Patent: February 14, 2017
    Assignee: NXP B.V.
    Inventors: Tony Vanhoucke, Viet Thanh Dinh, Petrus Hubertus Cornelis Magnee, Ponky Ivo, Dirk Klaassen, Mahmoud Shehab Mohammad Al-Sa'di
  • Publication number: 20160079345
    Abstract: A semiconductor device comprising a bipolar transistor and a method of making the same. A power amplifier including a bipolar transistor. The bipolar transistor includes a collector including a laterally extending drift region. The bipolar transistor also includes a base located above the collector. The bipolar transistor further includes an emitter located above the base. The bipolar transistor also includes a doped region having a conductivity type that is different to that of the collector. The doped region extends laterally beneath the collector to form a junction at a region of contact between the doped region and the collector. The doped region has a non-uniform lateral doping profile. A doping level of the doped region is highest in a part of the doped region closest to a collector-base junction of the bipolar transistor.
    Type: Application
    Filed: September 11, 2015
    Publication date: March 17, 2016
    Inventors: Tony Vanhoucke, Viet Thanh Dinh, Petrus Hubertus Cornelis Magnee, Ponky Ivo, Dirk Klaassen, Mahmoud Shehab Mohammad Al-Sa'di
  • Patent number: 9240468
    Abstract: A semiconductor device and a method of making the same. The device includes a semiconductor substrate. The device also includes a bipolar transistor on the semiconductor substrate. The bipolar transistor includes an emitter. The bipolar transistor also includes a base located above the emitter. The bipolar transistor further includes a laterally extending collector located above the base. The collector includes a portion that extends past an edge of the base.
    Type: Grant
    Filed: March 24, 2014
    Date of Patent: January 19, 2016
    Assignee: NXP, B.V.
    Inventors: Tony Vanhoucke, Viet Thanh Dinh, Anco Heringa, Dirk Klaassen, Evelyne Gridelet, Jan Willem Slotboom
  • Publication number: 20150263108
    Abstract: The disclosure relates to bipolar transistor devices and a method of fabricating the same. The device comprises a field plate, in an isolation region adjacent to a base-collector junction of said active region. The isolation region comprises a gate terminal arranged to be biased independently of a collector, base or emitter terminal of said transistor.
    Type: Application
    Filed: March 12, 2015
    Publication date: September 17, 2015
    Inventors: Johannes Donkers, Viet Thanh Dinh, Tony Vanhoucke, Evelyne Gridelet, Anco Heringa, Dirk Klaassen
  • Publication number: 20150145005
    Abstract: Disclosed is a transistor having a first region of a first conductivity type for injecting charge carriers into the transistor and a laterally extended second region) of the first conductivity type having a portion including a contact terminal for draining said charge carriers from the transistor, wherein the first region is separated from the second region by an intermediate region of a second conductivity type defining a first p-n junction with the first region and a second p-n junction with the second region, wherein the laterally extended region separates the portion from the second p-n junction, and wherein the transistor further comprises a substrate having a doped region of the second conductivity type, said doped region being in contact with and extending along the laterally extended second region and a further contact terminal connected to the doped region for draining minority charge carriers from the laterally extended second region.
    Type: Application
    Filed: November 17, 2014
    Publication date: May 28, 2015
    Inventors: Viet Thanh Dinh, Tony Vanhoucke, Evelyne Gridelet, Anco Heringa, Jan Willem Slotboom, Dirk Klaassen
  • Patent number: 4098974
    Abstract: A two-stage cyclical process for producing alkene polymers of wide molecular weight distribution, in which high molecular weight polyalkenes are produced in one stage and lower molecular weight polyalkenes are produced in the other stage and in which polyalkene from one of said stages is introduced into the other of said stages.
    Type: Grant
    Filed: July 27, 1976
    Date of Patent: July 4, 1978
    Assignee: Stamicarbon, B.V.
    Inventor: Dirk Klaassen