Patents by Inventor Dominique Jourde

Dominique Jourde has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8828244
    Abstract: A method for making a support of at least one substrate, including: making a stack including at least two substrates, each of the two substrates including two opposite main faces, both substrates being secured to each other such that one of the main faces of a first of the two substrates is positioned facing one of the main faces of the second of the two substrates and against an etch-stop material; etching, through the first of the two substrates and with stop on the etch-stop material, at least one location that can receive a substrate that can be supported by the support.
    Type: Grant
    Filed: May 19, 2011
    Date of Patent: September 9, 2014
    Assignee: Commissariat à l'énergie atomique et aux énergies alternatives
    Inventors: Frank Fournel, Laurent Bally, Marc Zussy, Dominique Jourde
  • Publication number: 20130075365
    Abstract: A method for making a support of at least one substrate, including: making a stack including at least two substrates, each of the two substrates including two opposite main faces, both substrates being secured to each other such that one of the main faces of a first of the two substrates is positioned facing one of the main faces of the second of the two substrates and against an etch-stop material; etching, through the first of the two substrates and with stop on the etch-stop material, at least one location that can receive a substrate that can be supported by the support.
    Type: Application
    Filed: May 19, 2011
    Publication date: March 28, 2013
    Applicant: Commissariat a l'energie atomique et aux energies alternatives
    Inventors: Frank Fournel, Laurent Bally, Marc Zussy, Dominique Jourde
  • Patent number: 6343784
    Abstract: A device that allows the treatment of a substrate in a machine provided for the treatment of bigger substrates and a mounting system for a substrate in this device. The device comprises a ring (24) having an external diameter equal to the diameter of these substrates, this ring being capable of setting the substrate (22) of smaller diameter. The system includes means (34) of manipulating this substrate and means (36) of heating the ring or of cooling this substrate. Application in micro-electronics.
    Type: Grant
    Filed: September 21, 1999
    Date of Patent: February 5, 2002
    Assignee: Commissariat a l'Energie Atomique
    Inventors: Dominique Jourde, Gérard Turc