Abstract: An aqueous initiator solution and process for rejuvenating such initiator solutions and for prolonging the useful operating life thereof by which copper and copper alloy substrates are treated therein to render them receptive to a subsequent electroless nickel plating step. The detrimental effects of progressive contamination of such aqueous initiator solutions with metal ion complexing agents during commercial use and/or precipitation of the noble metal ions which pregressively impairs the oprativeness of such activator solutions is overcome in accordance with the present invention by the addition of controlled amounts of ferric ions effective to maintain at least a sufficient portion of the noble metal ions in solution in a noncomplexed condition whereby the initiator solution is effective to pretreat the copper substrate prior to electroless nickel plating.

Abstract: A process and composition for use in electroless copper plating where the process includes contacting a substrate with a solution comprising copper, a complexing agent, a reducing agent, and a pH adjuster. A stabilizer may also be used. The improvement of the present invention includes contacting the substrate with a solution further comprising ammonium ions present in an amount effective to function as a plating rate controller. The improved solution is relatively stable, easy to control, and is of versatile use.

Abstract: A process for treating a polymeric plastic substrate to render it receptive to electroless plating including the steps of etching the substate, rinsing and activating the etched substrate with an acidic tin-palladium complex, rinsing and thereafter accelerating the activated substrate employing an improved aqueous accelerating solution containing an aqueous soluble compatible substituted alkyl amine. The improved accelerating solution is stable, easy to control, tolerant to metallic impurities present in the solution, inhibits rack plating and is of versatile use.

Abstract: This invention relates to a method of producing lustrous to brilliant zinc electrodeposits, which comprises passing current from a zinc anode to a metal cathode for a time period sufficient to deposit a lustrous to brilliant zinc electrodeposit upon said cathode; the current passing through an aqueous acidic bath composition containing at least one zinc compound providing zinc cations for electroplating zinc, and containing as cooperating additives at least one bath soluble substituted or unsubstituted polyether, at least one aliphatic unsaturated acid containing an aromatic or heteroaromatic group and at least one aromatic nitrogen heterocyclic compound.

Abstract: This invention relates to a method of producing bright zinc electrodeposits over a wide current density range, which comprises passing current from a zinc anode to a metal cathode for a time period sufficient to deposit a bright zinc electrodeposit upon said cathode; the current passing through an aqueous acidic bath composition containing at least one zinc compound providing zinc cations for electroplating zinc such as zinc chloride, zinc fluoborate, zinc sulfamate and zinc sulfate; chloride, fluoborate, sulfamate and/or sulfate anions may be added as salts of bath compatible cations to provide better electrical conductivity, and containing as cooperating additives at least one bath soluble substituted or unsubstituted polyether, at least one aliphatic unsaturated acid containing an aromatic or heteroaromatic group and at least one aromatic or N-heteroaromatic aldehyde.

Abstract: This invention relates to a method of producing lustrous to brilliant zinc electrodeposits, which comprises passing current from a zinc anode to a metal cathode for a time period sufficient to deposit a lustrous to brilliant zinc electrodeposit upon said cathode; the current passing through an aqueous acidic bath composition containing at least one zinc compound providing zinc cations for electroplating zinc, said zinc compound selected from the group consisting of zinc sulfate, zinc chloride and zinc sulfamate; chloride anions added as salts of bath compatible cations excepting ammonium; in the absence of complexing or chelating agents of organic nature; and containing as cooperating additives at least one alkyl propoxyethoxy polyether, at least one aromatic sulfonate emulsifying agent, and at least one aromatic carbonyl compound.

Abstract: This invention relates to novel compositions and to a process for electrodepositing copper from an aqueous acidic copper plating bath containing at least one member independently selected from each of the following two groups:A. from 0.005 to 1.0 gram per liter of at least one member of the group consisting of basic diaminotriphenylmethane dyes, basic triaminotriphenylmethane dyes, basic triaminodiphenylnaphthylmethane dyes and their reduction products; andB. sulfoalkyl sulfide compounds containing the grouping RS.sub.n --Alk--SO.sub.3 M where n is an integer 1 to 5, where M is one gram-equivalent of a cation, where --Alk-- is a divalent aliphatic hydrocarbon group of 1 to 8 carbon atoms, and where R is selected from a group consisting of hydrogen, a metal cation, a monovalent hydrocarbon radical including one which carries inert substituents, a sulfonic group MO.sub.3 S-- and a sulfolanyl group in an amount of 0.01 milligrams per liter to 1000 milligrams per liter.

Abstract: This invention relates to novel compositions and to a process for electrodepositing copper from an aqueous acidic copper plating bath containing at least one member independently selected from each of the following two groups:A. 0.005 gram per liter to 10.0 grams per liter of quaternized aryl and aralkyl amines selected from those exhibiting the formulae: ##STR1## wherein R', R", R'" and R"" are each independently selected from the group consisting of substituted and unsubstituted monovalent alkyl, aryl, aralkyl and cycloalkyl radicals provided that at least one aryl or aralkyl radical is present on each quaternary nitrogen atom; wherein Z is a bivalent hydrocarbon radical which may be substituted and/or interrupted by heteroatoms; wherein n=3 or 4; and wherein the Anion may be absent if one of the radicals R' to R"" carries an anionic substituent.B. sulfoalkyl sulfide compounds containing the grouping --S--Alk--SO.sub.

Abstract: This invention relates to novel compositions and to a process for electrodepositing copper from an aqueous acidic copper plating bath containing at least one member independently selected from each of the following two groups:A. an aryl amine selected from those exhibiting the formulae: ##STR1## and its reaction product.sup.2 with propane sultone; ##STR2## wherein Z is selected from the group consisting of oxygen and --NCH.sub.2 --C.sub.6 H.sub.5 ;B. sulfoalkyl sulfide compounds containing the grouping --S--Alk--SO.sub.3 M where M is one gram-equivalent of a cation and --Alk-- is a divalent aliphatic hydrocarbon group of 1 to 8 carbon atoms.

Abstract: This invention relates to a process and to novel compositions for electrodepositing copper from an aqueous acidic copper plating bath containing at least one member from each of the following two groups:A. an N-heteroaromatic compound containing 1 or 2 N-heteroaromatic rings, said rings being selected from a group comprising pyridine, quinoline, isoquinoline and the benzoquinolines, which compound does not contain non-quaternary amino groups that are not part of the said N-heteroaromatic rings, nor bivalent sulfur atoms, and is not quaternized on its ring nitrogen atoms by aralkyl, aryl, alkaryl radicals; andB. sulfoalkylsulfide and sulfoarylsulfide compounds containing the grouping --S.sub.n --X--SO.sub.3 M where n = 1 to 5, --X-- is a divalent aliphatic hydrocarbon group of 1 to 8 carbon atoms or a divalent aromatic or aliphatic-aromatic hydrocarbon group of 6 to 12 carbon atoms and M is one gram-equivalent of a cation.

Abstract: This invention relates to novel compositions and to a process for electrodepositing copper from an aqueous acidic copper plating bath containing at least one member independently selected from each of the following two groups:A. an aryl amine exhibiting the formula ##SPC1##B. sulfoalkyl sulfide compounds containing the grouping --S--AlK--SO.sub.3 M where M is one gram-equivalent of a cation and --Alk-- is a divalent aliphatic hydrocarbon group of 1 to 8 carbon atoms.

Abstract: This invention relates to novel compositions and to a process for electrodepositing copper from an aqueous acidic copper plating bath containing at least one member independently selected from each of the following two groups:A. an aryl, aralkyl or cycloaliphatic amine exhibiting the formula: ##EQU1## wherein X, Y, and Z are each independently selected from the group consisting of hydrogen, substituted and unsubstituted benzyl, phenyl, and cyclohexyl rings; --CH.sub.2 R, --CH.sub.2 RSO.sub.3, --CH.sub.2 ROH where R is a substituted or unsubstituted alkyl chain of one or two carbon atoms ##EQU2## Z where n is an integer of one to 7, and ##EQU3## provided that not more than two members of X, Y, and Z are hydrogen, B. sulfoalkyl sulfide compounds containing the grouping --S--Alk--SO.sub.3 M where M is one gram-equivalent of a cation and --Alk-- is a divalent aliphatic hydrocarbon group of 1 to 8 carbon atoms.

Abstract: This invention relates to novel compositions and to a process for electrodepositing copper from an aqueous acidic copper plating bath containing at least one member independently selected from each of the following two groups:A. a bath soluble amine selected from those exhibiting the formula: ##SPC1##wherein Y and Z are independently selected from the group consisting of hydrogen, benzyl, phenyl, R-SO.sub.3 .sup.- wherein R is an alkyl of from one to seven carbon atoms;B. sulfoalkyl sulfide compounds containing the grouping --S--Alk--SO.sub.3 M where M is one gram-equivalent of a cation and --Alk-- is a divalent aliphatic hydrocarbon group of 1 to 8 carbon atoms.

Abstract: This invention relates to novel compositions and to a process for electrodepositing copper from an aqueous acidic copper plating bath containing at least one member independently selected from each of the following two groups:A. an aryl amine selected from those exhibiting the formulae: ##SPC1##B. sulfoalkyl sulfide compounds containing the grouping --S--Alk--SO.sub.3 M where M is one gram - equivalent of a cation and --Alk-- is a divalent aliphatic hydrocarbon group of 1 to 8 carbon atoms.

Abstract: This invention relates to novel compositions and to a process for electrodepositing copper from an aqueous acidic copper plating bath containing at least one member independently selected from each of the following two groups:A. an aryl amine exhibiting the formula: ##SPC1##B. sulfoalkyl sulfide compounds containing the grouping --S--Alk--SO.sub.3 M where M is one gram-equivalent of a cation and -Alk- is a divalent aliphatic hydrocarbon group of 1 to 8 carbon atoms.

Abstract: This invention relates to novel compositions and to a process for electrodepositing copper from an aqueous acidic copper plating bath containing at least one member independently selected from each of the following two groups:A. an aryl quaternary N-heteroaromatic or N-heteroaliphatic ring compound or salt exhibiting the structure: ##EQU1## WHEREIN R is selected from the group consisting of phenyl, benzyl and p-xylyl and the N-Ring is selected from the group consisting of substituted and unsubstituted N-heteroaliphatic rings and substituted and unsubstituted N-heteroaromatic rings; Y is present or absent; Y, when present, represents an anionic moiety, n is 1 save when R is p-xylyl n is 2;B. sulfoalkyl sulfide compounds containing the grouping --S--Alk--SO.sub.3 M where M is one gram-equivalent of a cation and --Alk-- is a divalent aliphatic hydrocarbon group of 1 to 8 carbon atoms.