Patents by Inventor Donald Franklin Foust

Donald Franklin Foust has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5777434
    Abstract: The formation of leachable mercury upon disposal or during TCLP testing of mercury vapor discharge lamps is substantially prevented by incorporation of an organic or inorganic metal completing agent in the lamp structure or in the test solution.
    Type: Grant
    Filed: December 3, 1996
    Date of Patent: July 7, 1998
    Assignee: General Electric Company
    Inventors: David Key Dietrich, Donald Franklin Foust, Deborah Ann Haitko
  • Patent number: 5770537
    Abstract: Disclosed is a low-temperature process for regenerating carbon adsorbents utilized in flue gas desulfurization where carbon loss is minimized. The carbon adsorbent is soaked or washed in a basic reducing solution having a pH greater than 7.0 at room temperature to remove sulfur-containing compounds from carbon.
    Type: Grant
    Filed: December 4, 1995
    Date of Patent: June 23, 1998
    Assignee: General Electric Company
    Inventors: Youssef El-Shoubary, Bang Mo Kim, Donald Franklin Foust, Norman Zethward Shilling
  • Patent number: 5754002
    Abstract: The formation of leachable mercury upon disposal or during TCLP testing of mercury vapor discharge lamps is substantially prevented by incorporation of an antioxidant in the lamp structure or in the test solution.
    Type: Grant
    Filed: November 5, 1996
    Date of Patent: May 19, 1998
    Assignee: General Electric Company
    Inventors: Deborah Ann Haitko, Donald Franklin Foust, David Key Dietrich
  • Patent number: 5736813
    Abstract: The formation of leachable mercury upon disposal or during TCLP testing of mercury vapor discharge lamps is substantially prevented by incorporation of a pH control agent in the lamp structure or in the test solution to provide a pH of about 5.5 to about 6.5.
    Type: Grant
    Filed: November 29, 1996
    Date of Patent: April 7, 1998
    Assignee: General Electric Company
    Inventors: Donald Franklin Foust, Deborah Ann Haitko, David Key Dietrich
  • Patent number: 5153084
    Abstract: A method for the preparation a photo-mask used for photo-imaging selected areas on the surfaces of a three-dimensional printed circuit board substrate. The photo-mask comprises a membrane transparent and degradation resistant to UV light, having at least one side with a contoured shape conforming, and flexible enough to comply with surface irregularities on the surfaces of the three-dimensional substrate being photo-imaged. A pattern of tracks opaque to UV light is positioned along the contoured shape of the membrane. The pattern of tracks on the photo-mask is in accordance with a desired conductive metal trace pattern on the surfaces of the three-dimensional printed circuit board substrate. The photo-mask is prepared by dispensing a track material in a boustrophedenous manner on the surfaces of the substrate being photo-imaged. A membrane material is then poured upon the surfaces containing the dispensed tracks.
    Type: Grant
    Filed: September 10, 1990
    Date of Patent: October 6, 1992
    Assignee: General Electric Company
    Inventors: Donald Franklin Foust, Bradley R. Karas, Edward J. Lamby, William V. Dumas