Patents by Inventor Donald MacMillen

Donald MacMillen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Cell projection charged particle beam lithography
    Patent number: 8426832
    Abstract: The present invention increases the number of characters available on a stencil for charged particle beam lithography. A stencil for charged particle beam lithography is disclosed, comprising two character projection (CP) characters, wherein the blanking areas for the two CP characters overlap. A stencil is also disclosed comprising two CP characters with one or more optional characters between the two characters, wherein the optional characters can form meaningful patterns on a surface only in combination with one of the two characters. A stencil is also disclosed wherein the blanking area of a CP character extends beyond the boundary of the stencil's available character area. Methods for design of the aforementioned stencils are also disclosed.
    Type: Grant
    Filed: September 2, 2009
    Date of Patent: April 23, 2013
    Assignee: D2S, Inc.
    Inventors: Kenji Yoshida, Takashi Mitsuhashi, Shohei Matsushita, Larry Lam Chau, Tam Dinh Thanh Nguyen, Donald MacMillen, Akira Fujimura
  • STENCIL DESIGN AND METHOD FOR IMPROVING CHARACTER DENSITY FOR CELL PROJECTION CHARGED PARTICLE BEAM LITHOGRAPHY
    Publication number: 20090325085
    Abstract: The present invention increases the number of characters available on a stencil for charged particle beam lithography. A stencil for charged particle beam lithography is disclosed, comprising two character projection (CP) characters, wherein the blanking areas for the two CP characters overlap. A stencil is also disclosed comprising two CP characters with one or more optional characters between the two characters, wherein the optional characters can form meaningful patterns on a surface only in combination with one of the two characters. A stencil is also disclosed wherein the blanking area of a CP character extends beyond the boundary of the stencil's available character area. Methods for design of the aforementioned stencils are also disclosed.
    Type: Application
    Filed: September 2, 2009
    Publication date: December 31, 2009
    Applicant: D2S, INC.
    Inventors: Kenji Yoshida, Takashi Mitsuhashi, Shohei Matsushita, Larry Lam Chau, Tam Dinh Thanh Nguyen, Donald MacMillen, Akira Fujimura