Patents by Inventor Dong-Guk YU

Dong-Guk YU has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME
    Publication number: 20120064455
    Abstract: A photoresist composition and method of forming a pattern using the same are provided. The photoresist composition includes a 60 to 90 wt % novolac resin, a diazide compound, an organic solvent, and an anticorrosive agent.
    Type: Application
    Filed: July 8, 2011
    Publication date: March 15, 2012
    Applicant: SAMSUNG TECHWIN CO., LTD.
    Inventors: Dong-Guk YU, Ki-Soo KIM, Hyun-Tae LIM