Abstract: An apparatus for treating a substrate includes a process chamber having an inner space, a support unit supporting a substrate in the inner space, a processing gas supply unit for supplying a processing gas to the inner space, and a plasma source that excites the processing gas in a plasma state in the inner space. The processing gas supply unit includes a heater that heats the processing gas.

Abstract: There is provided a piston of a cartridge for extracting nucleic acids comprising: a cylindrical upper body having a hollow; a lower body having two ports; a control rod module combined to the other end of the upper body to seal the other end and move up and down along the hollow; and a rotation control module that is combined to the shaft of the lower body to transmit a driving force to the lower body.

Abstract: There is provided a cartridge for nucleic acid extraction comprising: a first body having a plurality of chambers in which ports are formed at the bottom; a second body coupled to a lower region of the first body; and a piston disposed rotatably in the centers of the first body and the second body and having a port formed at the bottom thereof; and characterized in that the cartridge comprises a plurality of flow paths formed on the upper region of the second body, one end overlapping the port of the piston and the other end overlapping the port of the first body.

Abstract: A multilayer ceramic capacitor (MLCC) includes a body including first dielectric layers and second dielectric layers, the body including first to sixth surfaces, a second surface, a third surface, a fourth surface, a fifth surface and a sixth surface; first internal electrodes disposed on the first dielectric layers, exposed to the third surface, the fifth surface, and the sixth surface, and spaced apart from the fourth surface by first spaces; second internal electrodes disposed on the second dielectric layers to oppose the first internal electrodes with the first dielectric layers or the second dielectric layers interposed therebetween, exposed to the fourth surface, the fifth surface, and the sixth surface, and spaced apart from the third surface by second spaces; first dielectric patterns disposed in at least a portion of the first spaces, and second dielectric patterns disposed in at least a portion of the second spaces; and lateral insulating layers.

Abstract: A multilayer ceramic capacitor includes a ceramic body including a dielectric layer, a plurality of first and second internal electrodes disposed inside the ceramic body, exposed to the first and second surfaces, and having ends exposed to the third or fourth surface, and a first side margin portion and a second side margin portion disposed on side portions of the plurality of first and second internal electrodes exposed to the first and second surfaces. A ratio Db/Da satisfies 1.00 to 1.07, inclusive, where ‘Db’ is a distance, in a stacking direction of the dielectric layer, between both end points of respective edge regions of the first side margin portion and the second side margin portion, and ‘Da’ is a distance in a central region of the ceramic body in the stacking direction.

Abstract: According to an embodiment of the present invention, an electronic device may comprise a housing and a display received in at least a portion of the housing, wherein the display comprises: a flexible substrate; a first light-emitting unit which is disposed on a first area of the substrate, has a first attribute, and includes a plurality of first pixels; and a second light-emitting unit which is disposed on a second area of the substrate, has a second attribute different from the first attribute, and includes a plurality of second pixels. Various other embodiments are also possible.

Abstract: A method for processing a substrate includes providing the substrate, a film being formed on the substrate, performing pretreatment to surface-treat the film formed on the substrate using a treatment gas in a plasma state, and performing, after the pretreatment, liquid treatment to remove the film from the substrate by supplying a treatment liquid onto the substrate.

Abstract: An electronic device is disclosed herein, including a first face oriented in a first direction, the first face formed having a curvature and disposed as to be visible from an exterior of the electronic device, a body including a second face oriented towards a second direction opposite to the first direction, the second face visible from the exterior, and a display module visible when viewing the first face, the display module including a flexible display disposed under a window, and the window including a central visible area formed in a substantially rectangular shape including first, second, third and fourth visible areas disposed adjacent to four respective edges of the central visible area.

Abstract: Disclosed herein are a structure for shielding electromagnetic waves, a door and a cooking appliance having the same. The structure for shielding electromagnetic waves includes a choke seal structure having a bottom face extended from a side wall portion formed at a periphery of a door in a plane direction defined by the door, an inner side face extended from the bottom face in a thickness direction of the door, and a top face extended from the inner side face toward side wall portion, the choke seal structure having a length extending along the periphery of the door, a plurality of slots arranged in a longitudinal direction of the choke seal structure at a predetermined spacing and partitioning the choke seal structure into a plurality of chokes, and a connecting face connecting between the top faces of some of the plurality of chokes, each of which has a latch hole formed in its inner side face.

Abstract: An apparatus and method for processing a substrate using plasma, which has high plasma stability and process reproducibility, is provided. The method includes providing an apparatus for processing a substrate comprising a plasma generating region and a process region separate from the plasma generating region, placing the substrate including a silicon layer and an oxide layer in the process region, forming a hydrogen atmosphere in the process region by providing a hydrogen-based gas to the process region without passing through the plasma generating region, generating plasma by providing a fluorine-based gas to the plasma generating region, and providing the generated plasma to the process region to selectively remove the silicon layer compared to the oxide layer.

Abstract: A catalyst for synthesizing hydrogen peroxide is provided. The catalyst includes first material capable of dissociating hydrogen molecules; and second material capable of suppressing dissociation of oxygen molecules, where one or more interfaces are formed between the first material and the second material. The catalyst can be used as an alternative to the expensive palladium catalysts. In particular, the catalyst can be used for the direct synthesis of hydrogen peroxide.

Abstract: An electronic device is disclosed herein, including a first face oriented in a first direction, the first face formed having a curvature and disposed as to be visible from an exterior of the electronic device, a body including a second face oriented towards a second direction opposite to the first direction, the second face visible from the exterior, and a display module visible when viewing the first face, the display module including a flexible display disposed under a window, and the window including a central visible area formed in a substantially rectangular shape including first, second, third and fourth visible areas disposed adjacent to four respective edges of the central visible area.