Abstract: A substrate processing apparatus includes: a processing room in which a semiconductor substrate may be treated by a process; a cooling unit positioned to cool the processing room, the cooling unit configured to convey cooling fluid; and a temperature-adjusting unit that alters the temperature of the cooling fluid supplied into the cooling unit. The temperature-adjusting unit has a cycling circuit. The cycling circuit has a compressor configured to compress a refrigerant, a condenser configured to condense the compressed refrigerant, an expander configured to expand the condensed refrigerant, the expander including a plurality of expansion valves arranged in parallel, and an evaporator configured to evaporate the expanded refrigerant, the evaporator positioned to cool the cooling fluid.

Abstract: Disclosed herein is a drum type washing machine designed to continuously raise and drop wash water during washing operation to enhance washing efficiency. The drum type washing machine includes a tub to hold wash water, a rotational drum rotatably installed in the tub, and a water raising unit having a plurality of water pockets equipped in a rotating direction of the rotational drum to an inner rear side of the rotational drum to raise and drop the wash water when the rotational drum is rotated.

Abstract: Disclosed is a domain DRM system, a license sharing method for the domain DRM system, and a license server. The domain DRM system includes at least one domain including at least one user module adapted for encryption or decryption using a provided encryption key and a domain manager adapted for decryption using a provided encryption key, and a license server for creating encryption keys corresponding to the domain manager and the one user module, respectively, and providing them with the created contents, respectively, so that, when at least one user module requests contents, a contents encryption key used to encrypt the contents is encrypted by using an encryption key of the user module and an encryption key of the domain manager according to a commutative encryption scheme, and one of the domain manager and the user module is provided with a shared license obtained as a result of encryption.

Abstract: A drum washing machine in which laundry-separated substances, introduced into a gap of a packing member sealing an inlet of the washing machine during a washing process, are easily eliminated. The drum washing machine includes a main body having an entrance hole for placing laundry therein and a door opening and closing the entrance hole, a tub installed in the main body and having an opening corresponding to the entrance hole, a packing member to seal a space between the opening of the tub and the entrance hole. The packing member including a bending portion in which laundry-separate substances accumulate, and a recess adjacent to the bending portion, wherein the recess is formed in a user contactable position on the packing member for assisting in easy elimination of the laundry-separated substances accumulated in the bending portion.

Abstract: A cooling apparatus having an auxiliary chiller is provided. The apparatus can include a wafer chuck on which a wafer is mounted and in which a cooling cavity is formed. A main chiller having a main coolant reservoir can be spaced apart from the wafer chuck. The cooling cavity and the main coolant reservoir can be arranged in communication with each other through coolant passages. The coolant passages can include an auxiliary chiller detachably installed thereon, respectively. A method of cooling a wafer chuck or process chamber during a semiconductor device fabrication process is also provided. Using the method and apparatuses of this invention, fine temperature adjustments of the wafer chuck are possible.

Abstract: A substrate processing apparatus includes: a processing room in which a semiconductor substrate may be treated by a process; a cooling unit positioned to cool the processing room, the cooling unit configured to convey cooling fluid; and a temperature-adjusting unit that alters the temperature of the cooling fluid supplied into the cooling unit. The temperature-adjusting unit has a cycling circuit. The cycling circuit has a compressor configured to compress a refrigerant, a condenser configured to condense the compressed refrigerant, an expander configured to expand the condensed refrigerant, the expander including a plurality of expansion valves arranged in parallel, and an evaporator configured to evaporate the expanded refrigerant, the evaporator positioned to cool the cooling fluid.

Abstract: A diffusion furnace includes a support member, a process chamber, a sealing member for sealing from the process chamber the outside, and a cooling system for cooling the sealing member. The process chamber is installed on the support member, and the sealing member is inserted between the support member and the chamber. The cooling system has a first fluid passage and a second fluid passage. The first and second fluid passages are formed in the support member. A first fluid flows in the first fluid passage to cool the sealing member, and a second fluid flows in the second fluid passage to cool the sealing member when the supply of the first fluid is interrupted. With the present invention, cooling water and a coolant can be prevented from being mixed together. Therefore, it is possible to prevent the contamination of an apparatus and the waste of expensive cooling water.