Patents by Inventor Dong-Il Hwang

Dong-Il Hwang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11993846
    Abstract: A method of preparing a positive electrode active material for a secondary battery includes preparing a lithium composite transition metal oxide which includes nickel, cobalt, and manganese and contains 60 mol % or more of the nickel among all metals except lithium, adding a moisture absorbent and the lithium composite transition metal oxide into an atomic layer deposition (ALD) reactor, and adding a coating metal precursor into the atomic layer deposition (ALD) reactor and forming a metal oxide coating layer on surfaces of particles of the lithium composite transition metal oxide by atomic layer deposition (ALD).
    Type: Grant
    Filed: January 12, 2021
    Date of Patent: May 28, 2024
    Assignee: LG Energy Solution, Ltd.
    Inventors: Seul Ki Chae, Dae Jin Lee, Dong Hwi Kim, Jin Tae Hwang, Hyeong Il Kim, Wang Mo Jung, Dong Hun Lee
  • Publication number: 20240145560
    Abstract: A semiconductor device includes an active pattern on a substrate extending in a first horizontal direction, a gate electrode on the active pattern extending in a second horizontal direction, a source/drain region on the active pattern, an upper source/drain region apart from the lower source/drain region, a lower source/drain between upper and lower source/drain regions and connected to the lower source/drain region, an upper source/drain connected to an upper source/drain region, an interlayer insulating layer surrounding the upper source/drain region, a through-via on opposing sidewalls in the second horizontal direction extending through the interlayer insulating layer in the vertical direction, the through-via being spaced from the upper source/drain region and upper source/drain contact in the second horizontal direction, the through-via being connected to the lower source/drain contact, and a dam structure on each of the opposing sidewalls in the horizontal direction of the upper source/drain region.
    Type: Application
    Filed: June 20, 2023
    Publication date: May 2, 2024
    Inventors: Dong Hoon HWANG, Myung Il KANG, Do Young CHOI
  • Publication number: 20240090840
    Abstract: Provided is a bio-adhesive device including an adhesive material layer, an electronic device layer, and a protective film layer to have advantages of being harmless to the human body, being naturally degraded in the body without a separate removal process, and capable of observing the movement of internal organs more closely in real time from outside the body.
    Type: Application
    Filed: June 21, 2023
    Publication date: March 21, 2024
    Inventors: Dong Soo Hwang, Hyung Joon Cha, Tae Il Kim, Jung Ki Jo
  • Publication number: 20240096879
    Abstract: A semiconductor device is provided. The semiconductor device includes an active pattern extending in a first horizontal direction, a plurality of lower nanosheets stacked on the active pattern and spaced apart from one another in a vertical direction, a separation layer on the plurality of lower nanosheets, a plurality of upper nanosheets stacked on the separation layer and spaced apart from one another in the vertical direction, a gate electrode extending on the active pattern in a second horizontal direction, the gate electrode surrounding each of the plurality of lower nanosheets, the separation layer and the plurality of upper nano sheets, and a first conductive layer between the gate electrode and each of a top surface and a bottom surface of the plurality of upper nanosheets. The first conductive layer is not between the gate electrode and sidewalls of the plurality of upper nanosheets.
    Type: Application
    Filed: April 11, 2023
    Publication date: March 21, 2024
    Applicant: Samsung Electronics Co., Ltd.
    Inventors: Kyu Man HWANG, Sung Il PARK, Jin Chan YUN, Dong Kyu LEE
  • Patent number: 6676392
    Abstract: A small-sized, efficient compressor has a compressed air tank, a first housing provided with a shaft bore, a rotating shaft, an orbiter, a second housing, a rotation restrainer and a circular vane. The orbiter is provided at a lower portion thereof with a cam shaft hole to engage with the cam shaft portion of the rotating shaft without friction, and is adapted to form a ring-shaped operating portion above the orbiter to form a circular space. The second housing is attached to the first housing and forms a second circular space offset from the circular space. The circular vane is formed in the second housing to form a ring-shaped compression chamber within the operating portion of the orbiter. Air is compressed and discharged through a discharge hole of the circular vane to generate a large amount of highly compressed air.
    Type: Grant
    Filed: February 21, 2002
    Date of Patent: January 13, 2004
    Assignee: Dovicom Technol Co., Ltd.
    Inventors: Dong-Il Hwang, Bin Hwang