Abstract: A method of manufacturing a polycrystalline silicon layer for a display device includes the steps of forming an amorphous silicon layer on a substrate, cleaning the amorphous silicon layer with hydrofluoric acid, rinsing the amorphous silicon layer with hydrogenated deionized water, and irradiating the amorphous silicon layer with a laser beam to form a polycrystalline silicon layer.

Abstract: A method of manufacturing a window includes preparing a base material layer, forming a first hard coating layer on the base material layer, and forming a second hard coating layer on the first hard coating layer. The forming of the second hard coating layer is performed in an environment having an oxygen concentration of about 0.01% to about 0.1%.

Abstract: A laser irradiation method includes a first scanning wherein a laser beam is scanned in a first region having a width in the X direction and a length in the Y direction by moving a laser irradiation area on the surface of the substrate along the Y direction using a spot laser beam, and a second scanning wherein laser beam is scanned in a second region having a width in the X direction and a length in the Y direction by moving a laser irradiation area on the surface of the substrate along the Y direction using the spot laser beam. A center of the second region is spaced apart from a center of the first region in the X direction.

Abstract: A display device includes a base layer including an upper base layer and a lower base layer on a rear surface of the upper base layer; at least one light emitting element on a surface of the upper base layer; and at least one pad on the rear surface of the upper base layer and including a first pad layer adjacent to the upper base layer and a second pad layer adjacent to the lower base layer. The second pad layer includes indium zinc oxide (IZO).

Abstract: A display device, a method of manufacturing the same and a tiled display device including the same are provided. The display device includes a substrate including a first contact hole, a laser absorption layer on the substrate and containing amorphous silicon, a first barrier insulating layer on the laser absorption layer, a fan-out line on the first barrier insulating layer as a first metal layer and including a pad portion in a second contact hole located in the first barrier insulating layer and the laser absorption layer, a display layer on the fan-out line, and a flexible film under the substrate and in the first contact hole and electrically connected to the pad portion.

Abstract: A display device includes a substrate, a first metal layer on the substrate, a first barrier insulating layer on the first metal layer, an etching control layer on the first barrier insulating layer, a first contact hole passing through the substrate, the first barrier insulating layer, and the etching control layer, a second barrier insulating layer on the etching control layer and including a second contact hole, a fan-out line on the second barrier insulating layer and included in a second metal layer, a pad part inserted into the second contact hole and included in the second metal layer, the pad part integral with the fan-out line, a display layer on the fan-out line, and a flexible film under the substrate and inserted into the first contact hole to be electrically connected to the pad part. The first metal layer includes an etching mark adjacent to the first contact hole.

Abstract: A display device comprises a first substrate including a first contact hole, a first barrier insulating layer disposed on the first substrate and including a second contact hole, a fan-out line disposed in a first metal layer on the first barrier insulating layer, the fan-out line including a protruding part inserted in the second contact hole to protrude from below the first barrier insulating layer, and a recessed part formed by the second contact hole, an etching electrode disposed in the recessed part of the fan-out line, a second substrate disposed on the fan-out line and the etching electrode and including a third contact hole, a display layer disposed on the second substrate, and a flexible film disposed below the first substrate and inserted in the first contact hole to be electrically connected to the protruding part of the fan-out line.

Abstract: A display device, a method of manufacturing the same and a tiled display device including the same are provided. The display device includes a first substrate including a first contact hole, a first barrier insulating layer disposed on the first substrate and including a second contact hole overlapping the first contact hole in a thickness direction, a capping layer disposed on the first barrier insulating layer, at least a portion of the capping layer being disposed in the second contact hole and the first contact hole, a pad electrode disposed on the capping layer, a display layer disposed on the pad electrode, and a flexible film disposed under the first substrate and electrically connected to the pad electrode through the first contact hole and the second contact hole.

Abstract: A display device comprises a first substrate including a first contact hole, a first barrier insulating layer disposed on the first substrate and including second contact holes overlapping the first contact hole, pad electrodes disposed on the first barrier insulating layer, at least a subset of the pad electrodes being disposed in the second contact holes, a display layer disposed on the pad electrodes, and a flexible film disposed below the first substrate and electrically connected to the pad electrodes through the first contact hole and the second contact holes, wherein the first substrate includes a substrate buffer portion overlapping the first contact hole and not-overlapping the second contact holes.

Abstract: A lens assembly applied to a small mobile device is disclosed. The lens assembly comprises: a base; a lens module disposed inside the base; first and second image stabilization driving units for moving the lens module in the direction perpendicular to the optical axis direction; and a plurality of hinge members which movably support the lens module and are disposed to be parallel to each other, wherein the plurality of hinge members have column parts that gradually protrude toward the center thereof and are injection-molded with a synthetic resin material.

Abstract: Disclosed are an optical path changing unit and a lens assembly comprising same. The optical path changing unit comprises: a base; a prism unit a part of which is connected to the base and the other part of which is arranged to be movable within the base; and first to third optical image stabilizing (OIS) drive units which change the prism unit into a tiltable position.

Abstract: The disclosure relates to a micro lens assembly including; a base; a support inserted into the base to be movable in an optical axis direction; a driver for auto focus adjustment configured to move the support in the optical axis direction; a lens unit inserted into the support and including a lens barrel to which a lens part is coupled; a driver for optical image stabilization configured to move the lens unit in the direction perpendicular to the optical axis direction; a plurality of ball bearings arranged between the support and the base for the support to be movable with respect to the base in the optical axis direction; and a plurality of connection members configured to connect the lens unit and the support to each other for the lens unit to be movable with respect to the support and formed of an elastic nonconductor.

Abstract: A laser crystallizing apparatus may include a laser light source, an optical system, and an optical module. The laser light source may generate a laser beam. The optical system may convert the laser beam into a line laser beam. The optical module may disperse energy of the line laser beam in a first direction for generating a dispersed line laser beam. The first direction may be perpendicular to a lengthwise direction of the optical module.

Abstract: A laser apparatus includes a laser generator configured to generate a first laser beam proceeding along a first direction, and an inversion module configured to convert the first laser beam to a second laser beam proceeding along the first direction, the inversion module including a splitter configured to form a reflected laser beam by partially reflecting the first laser beam, and a transmitted laser beam by partially transmitting the first laser beam, and a prism configured to reflect the reflected laser beam.

Abstract: A laser irradiation method includes a first scanning wherein a laser beam is scanned in a first region having a width in the X direction and a length in the Y direction by moving a laser irradiation area on the surface of the substrate along the Y direction using a spot laser beam, and a second scanning wherein laser beam is scanned in a second region having a width in the X direction and a length in the Y direction by moving a laser irradiation area on the surface of the substrate along the Y direction using the spot laser beam. A center of the second region is spaced apart from a center of the first region in the X direction.

Abstract: A method of manufacturing a polycrystalline silicon layer for a display device includes the steps of forming an amorphous silicon layer on a substrate, cleaning the amorphous silicon layer with hydrofluoric acid, rinsing the amorphous silicon layer with hydrogenated deionized water, and irradiating the amorphous silicon layer with a laser beam to form a polycrystalline silicon layer.

Abstract: A laser apparatus includes a laser generator configured to generate a first laser beam proceeding along a first direction, and an inversion module configured to convert the first laser beam to a second laser beam proceeding along the first direction, the inversion module including a splitter configured to form a reflected laser beam by partially reflecting the first laser beam, and a transmitted laser beam by partially transmitting the first laser beam, and a prism configured to reflect the reflected laser beam.

Abstract: A cover window includes a base layer; a first coating layer on the base layer; and a second coating layer on the first coating layer. The first coating layer directly contacts a first part of an upper surface of the base layer and exposes a second part of the upper surface of the base layer, the upper surface of the base layer consists of the first part and the second part, and the second coating layer directly contacts the second part of the upper surface of the base layer exposed by the first coating layer, and an upper surface of the first coating layer.

Abstract: A display device may include a thin film transistor disposed on a substrate, and a display element electrically connected to the thin film transistor. The thin film transistor may include an active pattern including polycrystalline silicon, a gate insulation layer disposed on the active pattern, and a gate electrode disposed on the gate insulation layer. An average value of grain sizes of the active pattern may be in a range of about 400 nm to about 800 nm. An RMS value of a surface roughness of the active pattern may be about 4 nm or less. A method of manufacturing a polycrystalline silicon layer may include cleaning an amorphous silicon layer with hydrofluoric acid, rinsing the amorphous silicon layer with hydrogenated deionized water, and irradiating the amorphous silicon layer with a laser beam having an energy density of about 440 mJ/cm2 to about 490 mJ/cm2.

Abstract: A laser irradiation method includes a first scanning wherein a laser beam is scanned in a first region having a width in the X direction and a length in the Y direction by moving a laser irradiation area on the surface of the substrate along the Y direction using a spot laser beam, and a second scanning wherein laser beam is scanned in a second region having a width in the X direction and a length in the Y direction by moving a laser irradiation area on the surface of the substrate along the Y direction using the spot laser beam. A center of the second region is spaced apart from a center of the first region in the X direction.