Patents by Inventor Dongsheng Zhang

Dongsheng Zhang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20080131312
    Abstract: The present invention discloses a mobile electron beam radiation sterilizing apparatus, comprising: a movable chassis vehicle (1); a cabinet body (2) installed on the chassis vehicle (1); an electron accelerator (6) which generates electron beam for articles to be radiation-processed; an accelerator control box (31), which controls operation of the accelerator, wherein the electron accelerator (6) is provided in the cabinet body. The invention has advantages as following: since the electron accelerator is provided in the cabinet body of the chassis vehicle, it has a small volume with flexible maneuverability, which can be transferred rapidly in a short time. In addition, the apparatus has no additional requirement of using environment, and does not need any additional construction. The invention can implement electron beam radiation for all kinds of documents and mails and achieve rapid and complete sterilization, reaching safety purpose.
    Type: Application
    Filed: June 8, 2007
    Publication date: June 5, 2008
    Applicants: Tsinghua University, Nuctech Company Limited
    Inventors: Kejun Kang, Huayi Zhang, Zhiqiang Chen, Yuanjing Li, Chuanxiang Tang, Yaohong Liu, Huaibi Chen, Huaping Tang, Nan Jiang, Dongsheng Zhang, Yu He, Feng Gao, Weiqiang Guan, Jian Li, Yanfeng Cao
  • Publication number: 20080067406
    Abstract: An irradiating device and a method for controlling it are provided. The device comprises an electron accelerator and a scanning box connected to the electron accelerator, wherein the scanning box is provided with a target, an electron beam exit window positioned at left or right side of the target and a scanning magnet. The device integrates the functions of both the existing irradiating device outputting electron beams and those outputting X-rays. When the scanning magnet is in operation, the irradiating device outputs electron beams; and when the scanning magnet is not in operation, the irradiating device outputs X-rays. Therefore, the device is capable of outputting two radiation sources so as to meet requirements for radiation-processing articles with different sizes.
    Type: Application
    Filed: July 17, 2007
    Publication date: March 20, 2008
    Inventors: Yaohong Liu, Huaping Tang, Xinshui Yan, Jianjun Gao, Feng Gao, Dongsheng Zhang, Xiaotian Liang, De Wei, Jinsheng Liu, Wei Jia, Wei Yin, Dan Zhang, Chong Gu, Qinghui Zhang
  • Publication number: 20070286329
    Abstract: Disclosed are an energy spectrum modulation apparatus, a material discrimination method and a device thereof, as well as an image processing method are disclosed, which can discriminate the material in large- and medium-sized objects such as cargo containers, air cargo containers, etc. by using X-rays having different energy levels. The energy spectrum modulation apparatus comprises a first energy spectrum modulation part for modulating a first ray having a first energy spectrum, and a second energy spectrum modulation part coupled to the first energy spectrum modulation part and for modulating a second ray having a second energy spectrum different from the first energy spectrum. The present invention can be used in the non-opening inspection for large-sized container cargo at places such as Customs, ports and airports.
    Type: Application
    Filed: April 23, 2007
    Publication date: December 13, 2007
    Inventors: Xuewu Wang, Yinong Liu, Zhiqiang Chen, Yaohong Liu, Huaqiang Zhong, Dongsheng Zhang, Yumei Chen, Feng Gao
  • Publication number: 20070236148
    Abstract: An apparatus, which performs a plasma process on a target substrate by using plasma, includes first and second electrodes in a process chamber to oppose each other. An RF field, which turns a process gas into plasma by excitation, is formed between the first and second electrodes. An RF power supply, which supplies RF power, is connected to the first or second electrode through a matching circuit. The matching circuit automatically performs input impedance matching relative to the RF power. A variable impedance setting section is connected to a predetermined member, which is electrically coupled with the plasma, through an interconnection. The impedance setting section sets a backward-direction impedance against an RF component input to the predetermined member from the plasma. A controller supplies a control signal concerning a preset value of the backward-direction impedance to the impedance setting section.
    Type: Application
    Filed: May 31, 2007
    Publication date: October 11, 2007
    Inventors: Yohei Yamazawa, Manabu Iwata, Chishio Koshimizu, Fumihiko Higuchi, Akitaka Shimizu, Asao Yamashita, Nobuhiro Iwama, Tsutomu Higashiura, DongSheng Zhang, Michiko Nakaya, Norikazu Murakami
  • Patent number: 6992907
    Abstract: The present invention relates a waveform transformation method and apparatus. It uses multilevel transformation module in series, and the output voltages of power modules at all levels are superposed to get the total output voltage, whereas each power transformation module realizes AC-to-AC direct conversion. The deviation between the output? voltage and setting reference voltage at any time point is made as small as possible by selecting different transformation modules as current working circuit and selecting output voltage waveform of the each different transformation modules. The invention includes outputting n groups of electrical insulating AC and n transfonnation modules connected with AC. The wave transformation method and device of present invention eliminates the intermediate DC stage, so that the circuit is greatly simplified, the cost is reduced obviously and improve working efficiency. It makes voltage and current harmonics to be reduced and obtains higher power factor.
    Type: Grant
    Filed: December 5, 2001
    Date of Patent: January 31, 2006
    Inventor: Dongsheng Zhang
  • Publication number: 20040062065
    Abstract: The present invention relates a waveform transformation method and apparatus. It uses multilevel transformation module in series, and the output voltages of power modules at all levels are superposed to get the total output voltage, whereas each power transformation module realizes AC-to-AC direct conversion. The deviation between the output voltage and setting reference voltage at any time point is made as small as possible by selecting different transformation modules as current working circuit and selecting output voltage waveform of the each different transformation modules. The invention includes outputting n groups of electrical insulating AC and n transformation modules connected with AC. The wave transformation method and device of present invention eliminates the intermediate DC stage, so that the circuit is greatly simplified, the cost is reduced obviously. and improve working efficiency. It makes voltage and current harmonics to be reduced and obtains higher power factor.
    Type: Application
    Filed: August 7, 2003
    Publication date: April 1, 2004
    Inventor: Dongsheng Zhang
  • Publication number: 20040035365
    Abstract: An apparatus, which performs a plasma process on a target substrate by using plasma, includes first and second electrodes in a process chamber to oppose each other. An RF field, which turns a process gas into plasma by excitation, is formed between the first and second electrodes. An RF power supply, which supplies RF power, is connected to the first or second electrode through a matching circuit. The matching circuit automatically performs input impedance matching relative to the RF power. A variable impedance setting section is connected to a predetermined member, which is electrically coupled with the plasma, through an interconnection. The impedance setting section sets a backward-direction impedance against an RF component input to the predetermined member from the plasma. A controller supplies a control signal concerning a preset value of the backward-direction impedance to the impedance setting section.
    Type: Application
    Filed: July 10, 2003
    Publication date: February 26, 2004
    Inventors: Yohei Yamazawa, Manabu Iwata, Chishio Koshimizu, Fumihiko Higuchi, Akitaka Shimizu, Asao Yamashita, Nobuhiro Iwama, Tsutomu Higashiura, Dongsheng Zhang, Michiko Nakaya, Norikazu Murakami
  • Patent number: 5489846
    Abstract: A magnetic-field sensor has an array of split-drain transistors connected in parallel, each having a first, a second, and a third drain electrode, and a negative reference current generating transistor. A biasing circuit is utilized to bias the split-drain transistors in the saturated state, and to actuate the negative reference current generating transistor to generate a negative reference current. A first, a second, and a third current mirror are all controlled by a reference voltage. The second current mirror is coupled to the second drain electrode of each of the split-drain transistors to keep the reference voltage at a reference level. The first current mirror is coupled to the first drain electrode of each of the split-drain transistors to generate a first sensed current, and the third current mirror is coupled to the third drain electrode of each of the split-drain transistors to generate a second sensed current.
    Type: Grant
    Filed: August 3, 1994
    Date of Patent: February 6, 1996
    Assignee: United Microelectronics Corp.
    Inventors: Zhijian Li, Xinyu Zheng, Litian Liu, Dongsheng Zhang