Patents by Inventor Dongzi Wangli

Dongzi Wangli has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Optimization method and a lithographic cell
    Patent number: 8612045
    Abstract: Variables in each step in a double patterning lithographic process are recorded and characteristics of intermediate features in a double patterning process measured. The final feature is then modeled, and the values of the variables optimized.
    Type: Grant
    Filed: December 8, 2009
    Date of Patent: December 17, 2013
    Assignees: ASML Holding N.V., ASML Netherlands B.V.
    Inventors: Everhardus Cornelis Mos, Mircea Dusa, Jozef Maria Finders, Christianus Gerardus Maria De Mol, Scott Anderson Middlebrooks, Dongzi Wangli
  • Optimization Method and a Lithographic Cell
    Publication number: 20100161099
    Abstract: Variables in each step in a double patterning lithographic process are recorded and characteristics of intermediate features in a double patterning process measured. The final feature is then modeled, and the values of the variables optimized.
    Type: Application
    Filed: December 8, 2009
    Publication date: June 24, 2010
    Applicant: ASML Netherlands B.V.
    Inventors: Everhardus Cornelis Mos, Mircea Dusa, Jozef Maria Finders, Christianus Gerardus Maria De Mol, Scott Anderson Middlebrooks, Dongzi Wangli