Patents by Inventor Donis Flagello
Donis Flagello has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20140211186Abstract: A way of predicting distribution of light in an illumination pupil, comprising: (a) identifying one or more component(s) of an illumination system having an illumination pupil, where the component(s) affect the distribution of light in the illumination pupil; (b) generating a point spread function that depends on the identified component(s) and has a functional relationship with the configurable settings of the illumination system; and (c) predicting the distribution of light in the illumination pupil using the point spread function.Type: ApplicationFiled: April 1, 2014Publication date: July 31, 2014Inventors: Daniel G. Smith, Donis Flagello
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Patent number: 8395757Abstract: Disclosed concepts include a method of optimizing polarization of an illumination of a pattern to be formed in a surface of a substrate. Polarized illumination is optimized by determining an illumination intensity for at least one point on an illuminator for at least two polarization states, determining image log slope for the at least one point on the illuminator for the at least two polarization states, determining a maximum image log slope (ILS) where the ILS is near zero for the at least one point on the illuminator, and selecting an optimal polarization state corresponding to the at least two polarization states that minimizes an ILS for the at least one point on the illuminator. This may be repeated for a plurality of points on the illuminator.Type: GrantFiled: May 4, 2010Date of Patent: March 12, 2013Assignee: ASML Masktools B.V.Inventors: Robert Socha, Donis Flagello, Steve Hansen
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Publication number: 20110051114Abstract: Disclosed concepts include a method of optimizing polarization of an illumination of a pattern to be formed in a surface of a substrate. Polarized illumination is optimized by determining an illumination intensity for at least one point on an illuminator for at least two polarization states, determining image log slope for the at least one point on the illuminator for the at least two polarization states, determining a maximum image log slope (ILS) where the ILS is near zero for the at least one point on the illuminator, and selecting an optimal polarization state corresponding to the at least two polarization states that minimizes an ILS for the at least one point on the illuminator. This may be repeated for a plurality of points on the illuminator.Type: ApplicationFiled: May 4, 2010Publication date: March 3, 2011Inventors: Robert SOCHA, Donis Flagello, Steve Hansen
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Patent number: 7710544Abstract: Disclosed concepts include a method of optimizing polarization of an illumination of a pattern to be formed in a surface of a substrate. Polarized illumination is optimized by determining an illumination intensity for at least one point on an illuminator for at least two polarization states, determining image log slope for the at least one point on the illuminator for the at least two polarization states, determining a maximum image log slope (ILS) where the ILS is near zero for the at least one point on the illuminator, and selecting an optimal polarization state corresponding to the at least two polarization states that minimizes an ILS for the at least one point on the illuminator. This may be repeated for a plurality of points on the illuminator.Type: GrantFiled: October 16, 2007Date of Patent: May 4, 2010Assignee: ASML Masktools B.V.Inventors: Robert Socha, Donis Flagello, Steve Hansen
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Patent number: 7511884Abstract: A radial transverse electric polarizer device is provided. The device includes a first layer of material having a first refractive index, a second layer of material having a second refractive index, and a plurality of elongated elements azimuthally and periodically spaced apart, and disposed between the first layer and the second layer. The plurality of elongated elements interact with electromagnetic waves of radiation to transmit transverse electric polarization of electromagnetic waves of radiation. One aspect of the invention is, for example, to use such polarizer device in a lithographic projection apparatus to increase imaging resolution. Another aspect is to provide a device manufacturing method including polarizing a beam of radiation in a transverse electric polarization.Type: GrantFiled: July 25, 2005Date of Patent: March 31, 2009Assignee: ASML Netherlands B.V.Inventors: Donis Flagello, Kevin Cummings, Alexander Straaijer
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Publication number: 20080284998Abstract: A system and method for controlling exposure in a lithographic apparatus are disclosed. The system can have adjustable optical elements capable of being decentered to adjust an illumination distribution. Embodiments include a lithographic apparatus structure configured to allow for spatial dose control, for example as a function of X and Y in response to spatial variation in polarization state and birefringence of optical components of the lithographic system.Type: ApplicationFiled: April 2, 2008Publication date: November 20, 2008Applicants: CARL ZEISS SMT AG, ASML NETHERLANDS B.V.Inventors: Bernd Geh, Erik Roelof Loopstra, Donis Flagello
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Publication number: 20080043215Abstract: Disclosed concepts include a method of optimizing polarization of an illumination of a pattern to be formed in a surface of a substrate. Polarized illumination is optimized by determining an illumination intensity for at least one point on an illuminator for at least two polarization states, determining image log slope for the at least one point on the illuminator for the at least two polarization states, determining a maximum image log slope (ILS) where the ILS is near zero for the at least one point on the illuminator, and selecting an optimal polarization state corresponding to the at least two polarization states that minimizes an ILS for the at least one point on the illuminator. This may be repeated for a plurality of points on the illuminator.Type: ApplicationFiled: October 16, 2007Publication date: February 21, 2008Applicant: ASML Masktools B.V.Inventors: Robert Socha, Donis Flagello, Steve Hansen
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Publication number: 20080030708Abstract: A rectangular or bar-shaped, on-axis illumination mask with radiation polarized parallel to the length of the bar provides improved DOF and exposure latitude with less lens heating as compared to a circular monopole with equivalent ?.Type: ApplicationFiled: October 4, 2007Publication date: February 7, 2008Applicant: ASML Netherlands B.V.Inventors: Steven Hansen, Donis Flagello, Michel Klaassen, Laurentius De Winter, Edwin Knols
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Publication number: 20070273853Abstract: A method of transferring an image of a pattern layout onto a surface of a substrate including selecting a first illumination profile for a first area of the pattern layout and a second illumination profile for a second area of the pattern layout; switching illumination profile during transfer of the image of the pattern layout such that the first area of the pattern layout is illuminated with the first illumination profile and the second area is illuminated with the second illumination profile; and projecting an image of the illuminated first and second areas onto the surface of the substrate.Type: ApplicationFiled: January 22, 2007Publication date: November 29, 2007Applicant: ASML Netherlands B.V.Inventors: Arno Bleeker, Donis Flagello, Robert Socha, James Greeneich, Kars Troost
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Publication number: 20070263269Abstract: A lithographic apparatus includes a first diffraction grating configured to create a first plurality of spatially coherent radiation beams and a second diffraction grating configured to receive at least a portion of the first plurality of spatially coherent radiation beams and to create, based on the first plurality of spatially coherent radiation beams, a second plurality of spatially coherent radiation beams. The apparatus also includes a beam combiner adapted to redirect and combine at least a portion of the second plurality of spatially coherent radiation beams onto a surface of a substrate to form an interference pattern.Type: ApplicationFiled: May 15, 2006Publication date: November 15, 2007Applicant: ASML Netherlands B.V.Inventor: Donis Flagello
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Publication number: 20070258073Abstract: A system and method for enhancing the image resolution in a lithographic system, is presented herein. The invention comprises decomposing a reticle pattern into at least two constituent sub-patterns that are capable of being optically resolved by the lithographic system, coating a substrate with a pre-specified photoresist layer, and exposing a first of the at least two constituent sub-patterns by directing a projection beam through the first sub-pattern such that the lithographic system produces a first sub-pattern image onto the pre-specified photoresist layer of the substrate. The invention further comprises processing the exposed substrate, exposing a second of the at least two constituent sub-patterns by directing the projection beam through the second sub-pattern such that the lithographic system produces a second sub-pattern image onto the pre-specified photoresist layer of the substrate, and then combining the first and second sub-pattern images to produce a desired pattern on the substrate.Type: ApplicationFiled: July 11, 2007Publication date: November 8, 2007Applicant: ASML Netherlands B.V.Inventors: Jozef Finders, Donis Flagello, Steven Hansen
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Patent number: 7292315Abstract: Disclosed concepts include a method of optimizing polarization of an illumination of a pattern to be formed in a surface of a substrate. Polarized illumination is optimized by determining an illumination intensity for at least one point on an illuminator for at least two polarization states, determining image log slope for the at least one point on the illuminator for the at least two polarization states, determining a maximum image log slope (ILS) where the ILS is near zero for the at least one point on the illuminator, and selecting an optimal polarization state corresponding to the at least two polarization states that minimizes an ILS for the at least one point on the illuminator. This may be repeated for a plurality of points on the illuminator.Type: GrantFiled: August 20, 2004Date of Patent: November 6, 2007Assignee: ASML Masktools B.V.Inventors: Robert Socha, Donis Flagello, Steve Hansen
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Patent number: 7221501Abstract: A radial transverse electric polarizer device is provided. The device includes a first layer of material having a first refractive index, a second layer of material having a second refractive index, and a plurality of elongated elements azimuthally and periodically spaced apart, and disposed between the first layer and the second layer. The plurality of elongated elements interact with electromagnetic waves of radiation to transmit transverse electric polarization of electromagnetic waves of radiation. One aspect of the invention is, for example, to use such polarizer device in a lithographic projection apparatus to increase imaging resolution. Another aspect is to provide a device manufacturing method including polarizing a beam of radiation in a transverse electric polarization.Type: GrantFiled: April 15, 2005Date of Patent: May 22, 2007Assignee: ASML Netherlands B.V.Inventors: Donis Flagello, Kevin Cummings, Alexander Straaijer
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Publication number: 20070013888Abstract: An apparatus and method for providing a variable illumination field for use in lithographic imaging for semiconductor manufacturing includes providing a an illumination system including a variable optical element having an array of addressable elements, each addressable element constructed and arranged to have a variable transmittance.Type: ApplicationFiled: March 29, 2005Publication date: January 18, 2007Applicant: ASML Netherlands B.V.Inventors: Donis Flagello, Robert Socha, James Greeneich
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Publication number: 20070002300Abstract: A lithographic apparatus includes an illumination unit including a radiation source configured to generate a radiation bundle, an illumination optics with a numerical aperture NA0 and an aperture system; a projection lens having a first numerical aperture NAOB1; a support arranged between the illumination unit and the projection lens and configured to support a patterning device; a substrate support configured to support a substrate on which structures on the patterning device are imaged, wherein the first numerical aperture NAOB1 of the projection lens is smaller than the numerical aperture NA0 of the illumination unit.Type: ApplicationFiled: May 18, 2006Publication date: January 4, 2007Applicant: ASML Netherlands B.V.Inventors: Steven Hansen, Donis Flagello, Wolfgang Singer, Bernd Geh, Vladan Blahnik
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Publication number: 20060256311Abstract: A method of transferring an image of a mask pattern onto a substrate with a lithographic apparatus is presented. The lithographic apparatus includes an illumination system configured to provide an illumination configuration and a projection system. In an embodiment of the invention, the method includes illuminating a mask pattern with an illumination configuration that includes a dark field component; and projecting an image of the illuminated pattern onto a photoresist layer coated on the substrate.Type: ApplicationFiled: May 16, 2005Publication date: November 16, 2006Applicant: ASML Netherlands B.V.Inventors: Steven Hansen, Bernd Geh, Donis Flagello
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Patent number: 7113259Abstract: In a lithographic projection apparatus, a space between an optical element is filled with a first fluid and a second fluid separated by a transparent plate. The first and second fluids have different first and second indices of refraction, respectively. The first fluid is provided between a substrate and the transparent plate and has an index of refraction similar to the index of refraction of the substrate. The second fluid is provided between the transparent plate and the optical element and has an index of refraction similar to the index of refraction of the optical element. The transparent plate has a third index of refraction between the first and second indices of refraction and may be equal to the first index of refraction or the second index of refraction.Type: GrantFiled: September 6, 2005Date of Patent: September 26, 2006Assignee: ASML Netherlands B.V.Inventors: Donis Flagello, John Doering
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Publication number: 20060007421Abstract: In a lithographic projection apparatus, a space between an optical element of a projection system is filled with a first fluid and a second fluid separated by a transparent plate. The first and second fluids have first and second indices of refraction, respectively, that are different from one another. The first fluid is provided in a space between a substrate and the transparent plate and preferably has an index of refraction similar to the index of refraction of the substrate. The second fluid is provided in a space between the transparent plate and the optical element and preferably has an index of refraction similar to the index of refraction of the optical element. The transparent plate has a third index of refraction between the first and second indices of refraction. The third index of refraction may be equal to the first index of refraction or the second index of refraction.Type: ApplicationFiled: September 6, 2005Publication date: January 12, 2006Applicant: ASML Netherlands B.V.Inventors: Donis Flagello, John Doering
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Publication number: 20050259324Abstract: A radial transverse electric polarizer device is provided. The device includes a first layer of material having a first refractive index, a second layer of material having a second refractive index, and a plurality of elongated elements azimuthally and periodically spaced apart, and disposed between the first layer and the second layer. The plurality of elongated elements interact with electromagnetic waves of radiation to transmit transverse electric polarization of electromagnetic waves of radiation. One aspect of the invention is, for example, to use such polarizer device in a lithographic projection apparatus to increase imaging resolution. Another aspect is to provide a device manufacturing method including polarizing a beam of radiation in a transverse electric polarization.Type: ApplicationFiled: July 25, 2005Publication date: November 24, 2005Applicant: ASML Netherlands B.V.Inventors: Donis Flagello, Kevin Cummings, Alexander Straaijer
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Patent number: 6954256Abstract: In a lithographic projection apparatus, a space between an optical element is filled with a first fluid and a second fluid separated by a transparent plate. The first and second fluids have first and second indices of refraction, respectively, that are different from one another. The first fluid is provided between a substrate and the transparent plate and has an index of refraction similar to the index of refraction of the substrate. The second fluid is provided between the transparent plate and the optical element and has an index of refraction similar to the index of refraction of the optical element. The transparent plate has a third index of refraction between the first and second indices of refraction and may be equal to the first index of refraction or the second index of refraction. A device manufacturing method includes filling a space between the optical element and the substrate with at least two fluids having different indices of refraction.Type: GrantFiled: October 31, 2003Date of Patent: October 11, 2005Assignee: ASML Netherlands B.V.Inventors: Donis Flagello, John Doering