Patents by Inventor Donna Diane Miura

Donna Diane Miura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Etching composition and use thereof
    Patent number: 5780363
    Abstract: An aqueous etchant composition containing about 0.01 to about 15 percent by weight of sulfuric acid and about 0.01 to about 20 percent by weight of hydrogen peroxide or about 1 to 30 ppm of ozone is effective in removing polymer residue from a substrate, and especially from an integrated circuit chip having aluminum lines thereon.
    Type: Grant
    Filed: April 4, 1997
    Date of Patent: July 14, 1998
    Assignee: International Business Machines Coporation
    Inventors: Donald John Delehanty, Rangarajan Jagannathan, Kenneth John McCullough, Donna Diane Miura, George F. Ouimet, Jr., David Lee Rath, Bryan Newton Rhoads, Frank John Schmidt, Jr.
  • Process for the elimination of tungsten oxidation with inert gas stabilization in chemical vapor deposition processes
    Patent number: 5753303
    Abstract: An inert gas, such as helium, nitrogen, or argon, is used for pressurization and stabilization in a chemical vapor deposition process that occurs in an ambient temperature in excess of 400.degree. C. Using the inert gas in the pressurization and stabilization stages of the chemical vapor deposition process eliminates the formation of tungsten oxides on tungsten studs, lines and other devices in the substrate, thereby eliminating the variable contact resistance and other problems associated with tungsten oxides.
    Type: Grant
    Filed: April 30, 1996
    Date of Patent: May 19, 1998
    Assignee: International Business Machines Corporation
    Inventors: Donna Rizzone Cote, William Joseph Cote, Donna Diane Miura, Christopher Joseph Waskiewicz