Patents by Inventor Doo-seok YOON

Doo-seok YOON has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10868524
    Abstract: A semiconductor circuit and a semiconductor circuit layout system are provided. The semiconductor circuit includes a clock inverter which inverts a clock signal and outputs an inverted clock signal where the clock inverter is laid out between a second master latch main circuit configured to latch signals of a first node and a fourth node based on the clock signal and the inverted clock signal, respectively, and a second slave latch main circuit configured to latch signals of a second node and a fifth node based on the clock signal and the inverted clock signal, respectively.
    Type: Grant
    Filed: August 8, 2019
    Date of Patent: December 15, 2020
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Young O Lee, Doo Seok Yoon, Min Su Kim
  • Patent number: 10707321
    Abstract: A power device, which has a Field Stop (FS) layer based on a semiconductor substrate between a collector region and a drift region in an FS-IGBT structure. The FS layer includes multiple implants for improved functionality of the power device.
    Type: Grant
    Filed: September 18, 2018
    Date of Patent: July 7, 2020
    Assignee: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC
    Inventors: Kyu-hyun Lee, Se-kyeong Lee, Doo-seok Yoon, Soo-hyun Kang, Young-chul Choi
  • Publication number: 20200195237
    Abstract: A semiconductor circuit and a semiconductor circuit layout system are provided. The semiconductor circuit includes a clock inverter which inverts a clock signal and outputs an inverted clock signal where the clock inverter is laid out between a second master latch main circuit configured to latch signals of a first node and a fourth node based on the clock signal and the inverted clock signal, respectively, and a second slave latch main circuit configured to latch signals of a second node and a fifth node based on the clock signal and the inverted clock signal, respectively.
    Type: Application
    Filed: August 8, 2019
    Publication date: June 18, 2020
    Applicant: Samsung Electronics Co., Ltd.
    Inventors: Young O LEE, Doo Seok YOON, Min Su KIM
  • Patent number: 10353000
    Abstract: A multi-bit flip-flop includes: a single scan input pin to receive a scan input signal, a plurality of data input pins to receive first and second data input signals, a first scan flip-flop to select one of the scan input signal and the first data input signal as a first selection signal in response to a scan enable signal and to latch the first selection signal to provide a first output signal, a second scan flip-flop to select one of an internal signal corresponding to the first output signal and the second data input signal as a second selection signal in response to the scan enable signal and to latch the second selection signal to provide a second output signal, and a plurality of output pins to output the first and second output signals, wherein scan paths of the first and second scan flip-flops are connected to each other.
    Type: Grant
    Filed: April 5, 2017
    Date of Patent: July 16, 2019
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Doo-Seok Yoon, Min-Su Kim, Chung-Hee Kim, Dae-Seong Lee, Hyun Lee, Matthew Berzins, James Lim
  • Publication number: 20190019879
    Abstract: In one general aspect, a power device can include a first Field Stop (FS) layer of a first conductivity type formed from a first-conductive-type semiconductor substrate. The first FS layer can include a first region having a constant impurity density profile along a depth direction and a second region having an impurity density profile along the depth direction lower than the impurity density profile of the first region. The power device can include a second FS layer of the first conductivity type disposed on a first surface of the first FS layer. The second FS layer can include a first implanted FS layer having an impurity density higher than an impurity density of the first FS layer, and a second implanted FS layer having an impurity density lower than the first implanted FS layer. The second implanted FS layer can be disposed between the first FS layer and the first implanted FS layer. The power device can include a transistor device having components disposed on the second FS layer.
    Type: Application
    Filed: September 18, 2018
    Publication date: January 17, 2019
    Applicant: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC
    Inventors: Kyu-hyun LEE, Se-kyeong LEE, Doo-seok YOON, Soo-hyun KANG, Young-chul CHOI
  • Patent number: 10109719
    Abstract: In one general aspect, a method of fabricating a power device can include preparing a semiconductor substrate of a first conductivity type, and forming a first Field Stop (FS) layer and a second FS layer.
    Type: Grant
    Filed: January 3, 2017
    Date of Patent: October 23, 2018
    Assignee: Semiconductor Components Industries, LLC
    Inventors: Kyu-hyun Lee, Se-kyeong Lee, Doo-seok Yoon, Soo-hyun Kang, Young-chul Choi
  • Publication number: 20170292993
    Abstract: A multi-bit flip-flop includes: a single scan input pin to receive a scan input signal, a plurality of data input pins to receive first and second data input signals, a first scan flip-flop to select one of the scan input signal and the first data input signal as a first selection signal in response to a scan enable signal and to latch the first selection signal to provide a first output signal, a second scan flip-flop to select one of an internal signal corresponding to the first output signal and the second data input signal as a second selection signal in response to the scan enable signal and to latch the second selection signal to provide a second output signal, and a plurality of output pins to output the first and second output signals, wherein scan paths of the first and second scan flip-flops are connected to each other.
    Type: Application
    Filed: April 5, 2017
    Publication date: October 12, 2017
    Inventors: DOO-SEOK YOON, MIN-SU KIM, CHUNG-HEE KIM, DAE-SEONG LEE, HYUN LEE, MATTHEW BERZINS, JAMES LIM
  • Publication number: 20170117384
    Abstract: In one general aspect, a method of fabricating a power device can include preparing a semiconductor substrate of a first conductivity type, and forming a first Field Stop (FS) layer and a second FS layer.
    Type: Application
    Filed: January 3, 2017
    Publication date: April 27, 2017
    Inventors: Kyu-hyun LEE, Se-kyeong LEE, Doo-seok YOON, Soo-hyun KANG, Young-chul CHOI
  • Publication number: 20130277793
    Abstract: A power device, which has a Field Stop (FS) layer based on a semiconductor substrate between a collector region and a drift region in an FS-IGBT structure, wherein the thickness of the FS layer and the impurity density of the collector region are easy to adjust and the FS layer has an improved function, and a fabricating method thereof.
    Type: Application
    Filed: April 23, 2013
    Publication date: October 24, 2013
    Applicant: Fairchild Korea Semiconductor, Ltd.
    Inventors: Kyu-hyun LEE, Se-kyeong LEE, Doo-seok YOON, Soo-hyun KANG, Young-chul CHOI