Patents by Inventor Doo-Young Jang
Doo-Young Jang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240177972Abstract: Provided is a method for etching an atomic layer. The method for etching the atomic layer includes providing a substrate to a process chamber, wherein the process chamber comprises a first chamber part and a second chamber part, and the substrate is provided in the second chamber part, generating adsorption gas plasma in the first chamber part, adsorbing radicals of the adsorption gas plasma to the substrate so as to form a treatment layer, generating etching gas plasma in the first chamber part, and allowing electrons and ions of the etching gas plasma to be alternately incident into the treatment layer so as to perform desorption of the treatment layer.Type: ApplicationFiled: November 1, 2023Publication date: May 30, 2024Applicants: RESEARCH & BUSINESS FOUNDATION SUNGKYUNKWAN UNIVERSITY, IUCF-HYU (Industry-University Cooperation Foundation Hanyang University)Inventors: Geun Young YEOM, Chin Wook CHUNG, Yun Jong JANG, Doo San KIM, Ye Eun KIM, Hong Seong GIL, Hae In KWON, Jun Young PARK, Ji Won JUNG
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Publication number: 20240136187Abstract: One embodiment of the present invention provides a method of manufacturing an electronic device using a cyclic doping process including i) an operation of forming a unit transfer thin film including a two-dimensional material on a transfer substrate, ii) an operation of doping the unit transfer thin film in a low-damage doping process, iii) an operation of transferring the unit transfer thin film doped according to the operation ii) on a transfer target substrate, and iv) an operation of repeatedly performing the operations i) to iii) several times to reach a target thickness.Type: ApplicationFiled: October 19, 2023Publication date: April 25, 2024Applicant: Research & Business Foundation SUNGKYUNKWAN UNIVERSITYInventors: Geun Young YEOM, Ki Hyun KIM, Ji Eun KANG, Seong Jae YU, You Jin JI, Doo San KIM, Hyun Woo TAK, Yun Jong JANG, Hee Ju KIM, Ki Seok KIM
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Patent number: 8163095Abstract: The present invention provides a stripping composition and a stripping method capable of easily stripping a color resist or an organic insulating film formed on a substrate to reuse the substrate when defects are found during a process of forming the color filter or organic insulating film on the substrate. In one embodiment, the stripping composition includes about 0.5 to about 45 wt % of hydroxide compound, about 10 to about 89 wt % of alkyleneglycolalkylether compound, about 5 to about 45 wt % of alkanolamine compound, and about 0.01 to about 5 wt % of inorganic salt compound. Advantageously, the stripping process can be performed without damaging a thin film transistor of a bottom substrate while removing the color resist or organic insulating film.Type: GrantFiled: May 5, 2011Date of Patent: April 24, 2012Assignee: Samsung Electronics Co., Ltd.Inventors: Ji Sun Lee, Hong Sick Park, Jong Hyun Choung, Sun Young Hong, Bong Kyun Kim, Byeong Jin Lee, Byung Uk Kim, Jong Hyun Jeong, Suk II Yoon, Seong Bae Kim, Sung Gun Shin, Soon Beom Huh, Se Hwan Jung, Doo Young Jang
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Patent number: 8084184Abstract: A composition for removing a photoresist includes a) an amine compound having a cyclic amine and/or a diamine, b) a glycol ether compound, c) a corrosion inhibitor and d) a polar solvent. The composition further includes a stripping promoter. Further disclosed is a method of manufacturing an array substrate using the composition for removing a photoresist.Type: GrantFiled: November 26, 2008Date of Patent: December 27, 2011Assignee: Samsung Electronics Co., Ltd.Inventors: Jong-Hyun Choung, Hong-Sick Park, Sun-Young Hong, Bong-Kyun Kim, Byeoung-Jin Lee, Byung-Uk Kim, Jong-Hyun Jeong, Suk-Il Yoon, Sung-Gun Shin, Soon-Beom Huh, Se-Hwan Jung, Doo-Young Jang
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Publication number: 20110206829Abstract: The present invention provides a stripping composition and a stripping method capable of easily stripping a color resist or an organic insulating film formed on a substrate to reuse the substrate when defects are found during a process of forming the color filter or organic insulating film on the substrate. In one embodiment, the stripping composition includes about 0.5 to about 45 wt % of hydroxide compound, about 10 to about 89 wt % of alkyleneglycolalkylether compound, about 5 to about 45 wt % of alkanolamine compound, and about 0.01 to about 5 wt % of inorganic salt compound. Advantageously, the stripping process can be performed without damaging a thin film transistor of a bottom substrate while removing the color resist or organic insulating film.Type: ApplicationFiled: May 5, 2011Publication date: August 25, 2011Inventors: Ji Sun LEE, Hong Sick PARK, Jong Hyun CHOUNG, Sun Young HONG, Bong Kyun KIM, Byeong Jin LEE, Byung Uk KIM, Jong Hyun JEONG, Suk Il YOON, Seong Bae KIM, Sung Gun SHIN, Soon Beom HUH, Se Hwan JUNG, Doo Young JANG
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Patent number: 7968507Abstract: The present invention provides a stripping composition and a stripping method capable of easily stripping a color resist or an organic insulating film formed on a substrate to reuse the substrate when defects are found during a process of forming the color filter or organic insulating film on the substrate. In one embodiment, the stripping composition includes about 0.5 to about 45 wt % of hydroxide compound, about 10 to about 89 wt % of alkyleneglycolalkylether compound, about 5 to about 45 wt % of alkanolamine compound, and about 0.01 to about 5 wt % of inorganic salt compound. Advantageously, the stripping process can be performed without damaging a thin film transistor of a bottom substrate while removing the color resist or organic insulating film.Type: GrantFiled: June 20, 2008Date of Patent: June 28, 2011Assignee: Samsung Electronics Co., Ltd.Inventors: Ji Sun Lee, Hong Sick Park, Jong Hyun Choung, Sun Young Hong, Bong Kyun Kim, Byeong Jin Lee, Byung Uk Kim, Jong Hyun Jeong, Suk Il Yoon, Seong Bae Kim, Sung Gun Shin, Soon Beom Huh, Se Hwan Jung, Doo Young Jang
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Patent number: 7956393Abstract: A composition for a photoresist stripper and a method of fabricating a thin film transistor array substrate are provided according to one or more embodiments. In one or more embodiments, the composition includes about 5-30 weight % of a chain amine compound, about 0.5-10 weight % of a cyclic amine compound, about 10-80 weight % of a glycol ether compound, about 5-30 weight % of distilled water, and about 0.1-5 weight % of a corrosion inhibitor.Type: GrantFiled: September 21, 2009Date of Patent: June 7, 2011Assignee: Samsung Electronics Co., Ltd.Inventors: Jong-Hyun Choung, Bong-Kyun Kim, Hong-Sick Park, Sun-Young Hong, Young-Joo Choi, Byeong-Jin Lee, Nam-Seok Suh, Byung-Uk Kim, Suk-Il Yoon, Jong-Hyun Jeong, Sung-Gun Shin, Soon-Beom Huh, Se-Hwan Jung, Doo-Young Jang, Sun-Joo Park, Oh-Hwan Kweon
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Publication number: 20110093887Abstract: Disclosed are a display apparatus and a video processing method of the display apparatus, the display apparatus including a user interface (UI) generator which generates and outputs UI information to a display unit; a user selection unit which allows a user to select a view zone; a signal processor which processes a received video signal displayable through the display unit; and a controller which controls the UI generator to display a selection menu including at least one view zone item on the display unit if a control signal for adjusting the view zone is selected from the user selection unit, and controls the signal processor to change at least one of an image quality adjusting value and a grayscale value of the received video signal if the view zone item is selected through the selection menu.Type: ApplicationFiled: October 4, 2010Publication date: April 21, 2011Applicant: SAMSUNG ELECTRONICS CO., LTD.Inventors: Doo-young JANG, Chang-sun KIM
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Publication number: 20100151610Abstract: A composition for a photoresist stripper and a method of fabricating a thin film transistor array substrate are provided according to one or more embodiments. In one or more embodiments, the composition includes about 5-30 weight % of a chain amine compound, about 0.5-10 weight % of a cyclic amine compound, about 10-80 weight % of a glycol ether compound, about 5-30 weight % of distilled water, and about 0.1-5 weight % of a corrosion inhibitor.Type: ApplicationFiled: September 21, 2009Publication date: June 17, 2010Inventors: Jong-Hyun CHOUNG, Bong-Kyun KIM, Hong-Sick PARK, Sun-Young HONG, Young-Joo CHOI, Byeong-Jin LEE, Nam-Seok SUH, Byung-Uk KIM, Suk-Il YOON, Jong-Hyun JEONG, Sung-Gun SHIN, Soon-Beom HUH, Se-Hwan JUNG, Doo-Young JANG, Sun-Joo PARK, Oh-Hwan KWEON
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Publication number: 20090170037Abstract: A composition for removing a photoresist includes a) an amine compound having a cyclic amine and/or a diamine, b) a glycol ether compound, c) a corrosion inhibitor and d) a polar solvent. The composition further includes a stripping promoter. Further disclosed is a method of manufacturing an array substrate using the composition for removing a photoresist.Type: ApplicationFiled: November 26, 2008Publication date: July 2, 2009Applicant: SAMSUNG ELECTRONICS CO., LTD.Inventors: Jong-Hyun CHOUNG, Hong-Sick Park, Sun-Young Hong, Bong-Kyun Kim, Byeoung-Jin Lee, Byung-Uk Kim, Jong-Hyun Jeong, Suk-Il Yoon, Sung-Gun Shin, Soon-Beom Huh, Se-Hwan Jung, Doo-Young Jang
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Publication number: 20090084406Abstract: The present invention provides a stripping composition and a stripping method capable of easily stripping a color resist or an organic insulating film formed on a substrate to reuse the substrate when defects are found during a process of forming the color filter or organic insulating film on the substrate. In one embodiment, the stripping composition includes about 0.5 to about 45 wt % of hydroxide compound, about 10 to about 89 wt % of alkyleneglycolalkylether compound, about 5 to about 45 wt % of alkanolamine compound, and about 0.01 to about 5 wt % of inorganic salt compound. Advantageously, the stripping process can be performed without damaging a thin film transistor of a bottom substrate while removing the color resist or organic insulating film.Type: ApplicationFiled: June 20, 2008Publication date: April 2, 2009Inventors: Ji Sun Lee, Hong Sick Park, Jong Hyun Choung, Sun Young Hong, Bong Kyun Kim, Byeong Jin Lee, Byung Uk Kim, Jong Hyun Jeong, Suk Il Yoon, Seong Bae Kim, Sung Gun Shin, Soon Beom Huh, Se Hwan Jung, Doo Young Jang