Patents by Inventor Douglas A. Buchberger, II

Douglas A. Buchberger, II has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5574410
    Abstract: The disclosure discusses impedance matching circuits based on parallel-resonant L-C tank circuits, and describes a low-loss design for an adjustable inductance element suitable for use in these parallel tank circuits. The application of an impedance matching circuit to a plasma process is also disclosed; in this context, a local impedance transformation circuit is used to improve power transfer to the plasma source antenna.
    Type: Grant
    Filed: November 9, 1994
    Date of Patent: November 12, 1996
    Assignee: Applied Materials, Inc.
    Inventors: Kenneth S. Collins, John Trow, Craig A. Roderick, Jay D. Pinson, II, Douglas A. Buchberger, II, Robert P. Hartlage, Viktor Shel
  • Patent number: 5572170
    Abstract: A plasma processing system including a plasma processing chamber; an antenna circuit including a source antenna positioned relative to the processing chamber so as to couple energy into a plasma within the chamber during processing, the antenna circuit having a first terminal and a second terminal with the source antenna electrically coupled between the first and second terminals; and a local impedance transforming network connected to the antenna circuit, the local impedance transforming network including a first capacitor connected between the first terminal and a grounded node, and a second capacitor connected between the second terminal and the grounded node.
    Type: Grant
    Filed: August 22, 1995
    Date of Patent: November 5, 1996
    Assignee: Applied Materials, Inc.
    Inventors: Kenneth S. Collins, John Trow, Craig A. Roderick, Jay D. Pinson, II, Douglas A. Buchberger, II, Robert P. Hartlage, Viktor Shel
  • Patent number: 5392018
    Abstract: The disclosure discusses impedance matching circuits based on parallel-resonant L-C tank circuits, and describes a low-loss design for an adjustable inductance element suitable for use in these parallel tank circuits. The application of an impedance matching circuit to a plasma process is also disclosed; in this context, a local impedance transformation circuit is used to improve power transfer to the plasma source antenna.
    Type: Grant
    Filed: November 12, 1992
    Date of Patent: February 21, 1995
    Assignee: Applied Materials, Inc.
    Inventors: Kenneth S. Collins, John Trow, Craig A. Roderick, Jay D. Pinson, II, Douglas A. Buchberger, II, Robert P. Hartlage, Viktor Shel
  • Patent number: 5187454
    Abstract: A method, and corresponding apparatus, for matching a generator impedance with an unknown and possibly changing load impedance, to maximize power transferred to the load. The apparatus includes an impedance matching network, and a network model, to estimate the load impedance from known present network values and a measurement of network input impedance, and to estimate optimum network values from the input impedance and the estimated load impedance. A controller computes new network values based on the present and optimum values, and outputs the new values to the network. The process is repeated using the new network values to estimate the load impedance and generate a new set of optimum values. The controller uses a control equation with parameters selected to ensure rapid convergence on the maximum-power condition, without overshoot or instability.
    Type: Grant
    Filed: January 23, 1992
    Date of Patent: February 16, 1993
    Assignee: Applied Materials, Inc.
    Inventors: Kenneth S. Collins, John R. Trow, Craig A. Roderick, Jay D. Pinson, II, Douglas A. Buchberger, II