Patents by Inventor Douglas Brenton HAYDEN

Douglas Brenton HAYDEN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Seasoning process for establishing a stable process and extending chamber uptime for semiconductor chip processing
    Patent number: 11164724
    Abstract: Embodiments of the present disclosure generally provide improved methods for processing substrates with improved process stability, increased mean wafers between clean, and/or improved within wafer uniformity. One embodiment provides a method for seasoning one or more chamber components in a process chamber. The method includes placing a dummy substrate in the process chamber, flowing a processing gas mixture to the process chamber to react with the dummy substrate and generate a byproduct on the dummy substrate, and annealing the dummy substrate to sublimate the byproduct while at least one purge conduit of the process chamber is closed.
    Type: Grant
    Filed: June 5, 2018
    Date of Patent: November 2, 2021
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Sang Won Kang, Nicholas Celeste, Dmitry Lubomirsky, Peter Hillman, Douglas Brenton Hayden, Dongqing Yang
  • SEASONING PROCESS FOR ESTABLISHING A STABLE PROCESS AND EXTENDING CHAMBER UPTIME FOR SEMICONDUCTOR CHIP PROCESSING
    Publication number: 20180337021
    Abstract: Embodiments of the present disclosure generally provide improved methods for processing substrates with improved process stability, increased mean wafers between clean, and/or improved within wafer uniformity. One embodiment provides a method for seasoning one or more chamber components in a process chamber. The method includes placing a dummy substrate in the process chamber, flowing a processing gas mixture to the process chamber to react with the dummy substrate and generate a byproduct on the dummy substrate, and annealing the dummy substrate to sublimate the byproduct while at least one purge conduit of the process chamber is closed.
    Type: Application
    Filed: June 5, 2018
    Publication date: November 22, 2018
    Inventors: Sang Won Kang, Nicholas Celeste, Dmitry Lubomirsky, Peter Hillman, Douglas Brenton Hayden, Dongqing Yang
  • Seasoning process for establishing a stable process and extending chamber uptime for semiconductor chip processing
    Patent number: 10008366
    Abstract: Embodiments of the present disclosure generally provide improved methods for processing substrates with improved process stability, increased mean wafers between clean, and/or improved within wafer uniformity. One embodiment provides a method for seasoning one or more chamber components in a process chamber. The method includes placing a dummy substrate in the process chamber, flowing a processing gas mixture to the process chamber to react with the dummy substrate and generate a byproduct on the dummy substrate, and annealing the dummy substrate to sublimate the byproduct while at least one purge conduit of the process chamber is closed.
    Type: Grant
    Filed: September 8, 2016
    Date of Patent: June 26, 2018
    Assignee: Applied Materials, Inc.
    Inventors: Sang Won Kang, Nicholas Celeste, Dmitry Lubomirsky, Peter Hillman, Douglas Brenton Hayden, Dongqing Yang
  • SEASONING PROCESS FOR ESTABLISHING A STABLE PROCESS AND EXTENDING CHAMBER UPTIME FOR SEMICONDUCTOR CHIP PROCESSING
    Publication number: 20170069463
    Abstract: Embodiments of the present disclosure generally provide improved methods for processing substrates with improved process stability, increased mean wafers between clean, and/or improved within wafer uniformity. One embodiment provides a method for seasoning one or more chamber components in a process chamber. The method includes placing a dummy substrate in the process chamber, flowing a processing gas mixture to the process chamber to react with the dummy substrate and generate a byproduct on the dummy substrate, and annealing the dummy substrate to sublimate the byproduct while at least one purge conduit of the process chamber is closed.
    Type: Application
    Filed: September 8, 2016
    Publication date: March 9, 2017
    Inventors: Sang Won KANG, Nicholas CELESTE, Dmitry LUBOMIRSKY, Peter HILLMAN, Douglas Brenton HAYDEN, Dongqing YANG