Patents by Inventor Douglas C. Fall

Douglas C. Fall has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Photocurable compositions
    Patent number: 9217920
    Abstract: A photocurable composition comprising a photoresist component, and a perfluoropolyether silane is disclosed. The composition enables easier release of phototool from a photoresist.
    Type: Grant
    Filed: August 6, 2013
    Date of Patent: December 22, 2015
    Assignee: 3M Innovative Properties Company
    Inventors: Douglas C. Fall, Zai-Ming Qiu
  • PHOTOCURABLE COMPOSITIONS
    Publication number: 20150248055
    Abstract: A photocurable composition comprising a photoresist component, and a perfluoropolyether silane is disclosed. The composition enables easier release of phototool from a photoresist.
    Type: Application
    Filed: August 6, 2013
    Publication date: September 3, 2015
    Applicant: 3M INNOVATIVE PROPERTIES COMPANY
    Inventors: Douglas C. Fall, Zai-Ming Qiu
  • Photocurable compositions
    Patent number: 8883402
    Abstract: A photocurable composition comprising a photoresist component, and an ethylenically unsaturated perfluoropolyether is disclosed. The composition enables easier release of phototool from a photoresist.
    Type: Grant
    Filed: June 19, 2013
    Date of Patent: November 11, 2014
    Assignee: 3M Innovative Properties Company
    Inventors: Douglas C. Fall, Zai-Ming Qiu
  • Photocurable composition
    Patent number: 8715904
    Abstract: A low surface energy photoresist composition is described that comprises a silicone-polyether block copolymer, wherein the silicone block comprises 35 wt. % or more of said copolymer. When compounded with a photoresist composition, the composition enables the release of a phototool from the photoresist layer.
    Type: Grant
    Filed: April 27, 2012
    Date of Patent: May 6, 2014
    Assignee: 3M Innovative Properties Company
    Inventors: Zai-Ming Qiu, Douglas C. Fall
  • Photoresist composition
    Patent number: 8703385
    Abstract: A low surface energy photoresist composition is described that comprises a silicone-polyether block copolymer, wherein the silicone block comprises 35 wt. % or more of said copolymer. When compounded with a photoresist composition, the composition enables the release of a phototool from the photoresist layer.
    Type: Grant
    Filed: February 10, 2012
    Date of Patent: April 22, 2014
    Assignee: 3M Innovative Properties Company
    Inventors: Zai-Ming Qiu, Douglas C. Fall
  • Hardcoat composition
    Patent number: 8663874
    Abstract: A hardcoat composition comprises (a) one or more epoxy silane compounds, (b) one or more epoxy-functionalized perfluoropolyether acrylate oligomers, and (c) photoacid generator.
    Type: Grant
    Filed: March 11, 2009
    Date of Patent: March 4, 2014
    Assignee: 3M Innovative Properties Company
    Inventors: Zai-Ming Qiu, John C. Hulteen, Douglas C. Fall
  • PHOTOCURABLE COMPOSITIONS
    Publication number: 20140044932
    Abstract: A photocurable composition comprising a photoresist component, and an ethylenically unsaturated perfluoropolyether is disclosed. The composition enables easier release of phototool from a photoresist.
    Type: Application
    Filed: June 19, 2013
    Publication date: February 13, 2014
    Inventors: Douglas C. Fall, Zai-Ming Qiu
  • PHOTOCURABLE COMPOSITION
    Publication number: 20130288162
    Abstract: A low surface energy photoresist composition is described that comprises a silicone-polyether block copolymer, wherein the silicone block comprises 35 wt. % or more of said copolymer. When compounded with a photoresist composition, the composition enables the release of a phototool from the photoresist layer.
    Type: Application
    Filed: April 27, 2012
    Publication date: October 31, 2013
    Inventors: Zai-Ming Qiu, Douglas C. Fall
  • Phototools having a protective layer
    Patent number: 8563221
    Abstract: A phototool comprises an optically transparent substrate having designed pattern and a protective layer on the substrate. The protective layer comprises a cured hardcoat composition. The hardcoat composition comprises (i) one or more epoxy silane compounds (ii) one or more fluorochemical additives selected from the group consisting of perfluoropolyether-urethane silanes and silane-functionalized perfluoropolyether acrylate oligomers, and (iii) photo-acid generator.
    Type: Grant
    Filed: March 11, 2009
    Date of Patent: October 22, 2013
    Assignee: 3M Innovative Properties Company
    Inventors: Zai-Ming Qiu, John C. Hulteen, Douglas C. Fall
  • PHOTORESIST COMPOSITION
    Publication number: 20130209921
    Abstract: A low surface energy photoresist composition is described that comprises a silicone-polyether block copolymer, wherein the silicone block comprises 35 wt. % or more of said copolymer. When compounded with a photoresist composition, the composition enables the release of a phototool from the photoresist layer.
    Type: Application
    Filed: February 10, 2012
    Publication date: August 15, 2013
    Inventors: Zai-Ming Qiu, Douglas C. Fall
  • HARDCOAT COMPOSITION
    Publication number: 20110027702
    Abstract: A hardcoat composition comprises (a) one or more epoxy silane compounds, (b) one or more epoxy-functionalized perfluoropolyether acrylate oligomers, and (c) photoacid generator.
    Type: Application
    Filed: March 11, 2009
    Publication date: February 3, 2011
    Inventors: Zai-Ming Qiu, John C. Hulteen, Douglas C. Fall
  • PHOTOTOOLS HAVING A PROTECTIVE LAYER
    Publication number: 20110008733
    Abstract: A phototool comprises an optically transparent substrate having designed pattern and a protective layer on the substrate. The protective layer comprises a cured hardcoat composition. The hardcoat composition comprises (i) one or more epoxy silane compounds (ii) one or more fluorochemical additives selected from the group consisting of perfluoropolyether-urethane silanes and silane-functionalized perfluoropolyether acrylate oligomers, and (iii) photo-acid generator.
    Type: Application
    Filed: March 11, 2009
    Publication date: January 13, 2011
    Inventors: Zai-Ming Qiu, John C. Hulteen, Douglas C. Fall