Patents by Inventor Douglas M. Richards

Douglas M. Richards has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5211931
    Abstract: The present invention provides a method of removing impurities from a stream of silane, SiH.sub.4. Most notably, the present invention provides a method of removing ethylene from a silane stream by converting the ethylene to ethylsilane in the presence of a molecular sieve and distilling the desired silane from the ethylsilane contaminant.
    Type: Grant
    Filed: March 27, 1992
    Date of Patent: May 18, 1993
    Assignee: Ethyl Corporation
    Inventors: Robert H. Allen, Douglas M. Richards
  • Patent number: 5075092
    Abstract: A process for continuously preparing silane and a coproduct by reacting a metal hydride such as NaAlH.sub.4 with a silicon halide such as SiF.sub.4, utilizing, in conducting the reaction, equipment which includes, in series, a primary reactor, a secondary reactor and a separation zone. The metal hydride is reacted in the first reactor with less than a stoichiometric amount of the silicon halide, and the unreacted metal hydride is then passed to the second reactor wherein the remainder of the hydride is reacted in the secondary reactor, in which a stoichiometric excess of the silicon halide is added. The rate of silicon halide or metal hydride addition is governed by a temperature differential feed back from the reaction in the secondary reactor so that overall a stoichiometric or substantially stoichiometric operation is achieved.
    Type: Grant
    Filed: January 12, 1989
    Date of Patent: December 24, 1991
    Assignee: Ethyl Corporation
    Inventors: James E. Boone, Douglas M. Richards, Joseph A. Bossier, III
  • Patent number: 4847061
    Abstract: A continuous method for preparing silane and a co-product by reacting a metal hydride such as NaAlH.sub.4 with a silicon halide such as SiF.sub.4. The method involves a reactor loop comprising a primary reactor, a secondary reactor and a separation zone. Most of the metal hydride is reacted in the first reactor to which it is added in a substantially constant rate. The remainder of the hydride is reacted in the secondary reactor, in which all or substantially all of the silicon halide is added. The rate of silicon halide addition is governed by feed back from the reaction in the secondary reactor, (.rarw.T so that stoichiometric or substantially stoichiometric operation is achieved. This conserves resources, provides improved co-product and reduces costs.
    Type: Grant
    Filed: July 20, 1987
    Date of Patent: July 11, 1989
    Assignee: Ethyl Corporation
    Inventors: Joseph A. Bossier, III, Douglas M. Richards, Lloyd T. Crasto