Abstract: Illustrative systems and methods disclosed herein pertain to calibrating a wafer inspection apparatus. In one exemplary embodiment, a calibration system includes a wafer emulator in the form of a substrate having a first porthole extending from a bottom major surface of the substrate to a top major surface of the substrate. The first porthole accommodates a fixture that holds an optical fiber such that a proximal end of the optical fiber is coplanar to the top major surface of the substrate. The optical fiber has a light emitting profile that emulates a beam profile of a semiconductor laser element. A laser transmitter is coupled to a distal end of the optical fiber and propagates a laser beam through the optical fiber and out of the proximal end of the optical fiber. The wafer inspection apparatus is arranged to receive the laser beam and use the laser beam for calibration purposes.

Abstract: Illustrative systems and methods disclosed herein pertain to calibrating a wafer inspection apparatus. In one exemplary embodiment, a calibration system includes a wafer emulator in the form of a substrate having a first porthole extending from a bottom major surface of the substrate to a top major surface of the substrate. The first porthole accommodates a fixture that holds an optical fiber such that a proximal end of the optical fiber is coplanar to the top major surface of the substrate. The optical fiber has a light emitting profile that emulates a beam profile of a semiconductor laser element. A laser transmitter is coupled to a distal end of the optical fiber and propagates a laser beam through the optical fiber and out of the proximal end of the optical fiber. The wafer inspection apparatus is arranged to receive the laser beam and use the laser beam for calibration purposes.

Abstract: Illustrative embodiments disclosed herein pertain to a thermal imaging system that includes a thermal imaging sheet having an array of thermal unit cells for generating a thermal footprint in response to receiving an RF signal. The thermal footprint is composed of an array of hotspots having a first set of hotspots indicative of a radiation characteristic of a first polarization component of the RF signal, and a second set of hotspots indicative of a radiation characteristic of a second polarization component of the RF signal. Each thermal unit cell includes a first RF antenna and a second RF antenna oriented orthogonal with respect to each other. The first RF antenna includes a terminating resistor that generates a hotspot among the first set of hotspots and the second RF antenna includes another terminating resistor that generates a hotspot in the second set of hotspots.

Abstract: Illustrative embodiments disclosed herein pertain to a thermal imaging system that includes a thermal imaging sheet having an array of thermal unit cells for generating a thermal footprint in response to receiving an RF signal. The thermal footprint is composed of an array of hotspots having a first set of hotspots indicative of a radiation characteristic of a first polarization component of the RF signal, and a second set of hotspots indicative of a radiation characteristic of a second polarization component of the RF signal. Each thermal unit cell includes a first RF antenna and a second RF antenna oriented orthogonal with respect to each other. The first RF antenna includes a terminating resistor that generates a hotspot among the first set of hotspots and the second RF antenna includes another terminating resistor that generates a hotspot in the second set of hotspots.

Abstract: Method and apparatus for determining scattering parameters of a scattering matrix of an optical device. A method according to the present invention comprises applying an optical stimulus to a plurality of ports of the optical device, measuring optical fields emerging from the plurality of ports in amplitude and phase, and calculating the scattering parameters using the measured optical fields. The applying step includes applying the optical stimulus to the plurality of ports simultaneously. The method ensures a consistent phase reference for measurement of all of the scattering parameters so that all measurable characteristics of the device can be calculated directly from the scattering parameters.

Abstract: Method and apparatus for determining scattering parameters of a scattering matrix of an optical device. A method according to the present invention comprises applying an optical stimulus to a plurality of ports of the optical device, measuring optical fields emerging from the plurality of ports in amplitude and phase, and calculating the scattering parameters using the measured optical fields. The applying step includes applying the optical stimulus to the plurality of ports simultaneously. The method ensures a consistent phase reference for measurement of all of the scattering parameters so that all measurable characteristics of the device can be calculated directly from the scattering parameters.