Patents by Inventor Dov Shachal

Dov Shachal has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9466458
    Abstract: A scanning electron microscope suitable for imaging samples in a non-vacuum environment, the scanning electron microscope including an electron source located within an enclosure maintained under vacuum, an electron permeable membrane disposed at an opening of the enclosure separating an environment within the enclosure which is maintained under vacuum and an environment outside the enclosure which is not maintained under vacuum, the electron permeable membrane not being electrically grounded and at least one non-grounded electrode operative as an electron detector.
    Type: Grant
    Filed: February 18, 2014
    Date of Patent: October 11, 2016
    Assignee: B-NANO LTD.
    Inventors: Dov Shachal, Rafi De Picciotto
  • Patent number: 9431213
    Abstract: An interface, a scanning electron microscope and a method for observing an object that is positioned in a non-vacuum environment. The method includes: generating an electron beam in the vacuum environment; scanning a region of the object with the electron beam while the object is located below an object holder; wherein the scanning comprises allowing the electron beam to pass through an aperture of an aperture array, pass through an ultra thin membrane that seals the aperture, and pass through the object holder; wherein the ultra thin membrane withstands a pressure difference between the vacuum environment and the non-vacuum environment; and detecting particles generated in response to an interaction between the electron beam and the object.
    Type: Grant
    Filed: February 5, 2015
    Date of Patent: August 30, 2016
    Assignee: B-NANO LTD.
    Inventors: Dov Shachal, Rafi De Picciotto
  • Publication number: 20160155606
    Abstract: An interface, a scanning electron microscope and a method for observing an object that is positioned in a non-vacuum environment. The method includes: passing at least one electron beam that is generated in a vacuum environment through at least one aperture out of an aperture array and through at least one ultra thin membrane that seals the at least one aperture; wherein the at least one electron beam is directed towards the object; wherein the at least one ultra thin membrane withstands a pressure difference between the vacuum environment and the non-vacuum environment; and detecting particles generated in response to an interaction between the at least one electron beam and the object.
    Type: Application
    Filed: February 3, 2016
    Publication date: June 2, 2016
    Applicant: B-NANO LTD.
    Inventor: Dov SHACHAL
  • Patent number: 9287089
    Abstract: An interface, a scanning electron microscope and a method for observing an object that is positioned in a non-vacuum environment. The method includes: passing at least one electron beam that is generated in a vacuum environment through at least one aperture out of an aperture array and through at least one ultra thin membrane that seals the at least one aperture; wherein the at least one electron beam is directed towards the object; wherein the at least one ultra thin membrane withstands a pressure difference between the vacuum environment and the non-vacuum environment; and detecting particles generated in response to an interaction between the at least one electron beam and the object.
    Type: Grant
    Filed: April 15, 2015
    Date of Patent: March 15, 2016
    Assignee: B-NANO LTD.
    Inventor: Dov Shachal
  • Publication number: 20150380207
    Abstract: A scanning electron microscope suitable for imaging samples in a non-vacuum environment, the scanning electron microscope including an electron source located within an enclosure maintained under vacuum, an electron permeable membrane disposed at an opening of the enclosure separating an environment within the enclosure which is maintained under vacuum and an environment outside the enclosure which is not maintained under vacuum, the electron permeable membrane not being electrically grounded and at least one non-grounded electrode operative as an electron detector.
    Type: Application
    Filed: February 18, 2014
    Publication date: December 31, 2015
    Applicant: B-NANO LTD.
    Inventors: Dov SHACHAL, Rafi DE PICCIOTTO
  • Publication number: 20150243475
    Abstract: An interface, a scanning electron microscope and a method for observing an object that is positioned in a non-vacuum environment. The method includes: generating an electron beam in the vacuum environment; scanning a region of the object with the electron beam while the object is located below an object holder; wherein the scanning comprises allowing the electron beam to pass through an aperture of an aperture array, pass through an ultra thin membrane that seals the aperture, and pass through the object holder; wherein the ultra thin membrane withstands a pressure difference between the vacuum environment and the non-vacuum environment; and detecting particles generated in response to an interaction between the electron beam and the object.
    Type: Application
    Filed: February 5, 2015
    Publication date: August 27, 2015
    Applicant: B-NANO LTD.
    Inventors: Dov SHACHAL, Rafi DE PICCIOTTO
  • Publication number: 20150235806
    Abstract: An interface, a scanning electron microscope and a method for observing an object that is positioned in a non-vacuum environment. The method includes: passing at least one electron beam that is generated in a vacuum environment through at least one aperture out of an aperture array and through at least one ultra thin membrane that seals the at least one aperture; wherein the at least one electron beam is directed towards the object; wherein the at least one ultra thin membrane withstands a pressure difference between the vacuum environment and the non-vacuum environment; and detecting particles generated in response to an interaction between the at least one electron beam and the object.
    Type: Application
    Filed: April 15, 2015
    Publication date: August 20, 2015
    Inventor: Dov SHACHAL
  • Patent number: 9076631
    Abstract: An interface, a scanning electron microscope and a method for observing an object that is positioned in a non-vacuum environment. The method includes: passing at least one electron beam that is generated in a vacuum environment through at least one aperture out of an aperture array and through at least one ultra thin membrane that seals the at least one aperture; wherein the at least one electron beam is directed towards the object; wherein the at least one ultra thin membrane withstands a pressure difference between the vacuum environment and the non-vacuum environment; and detecting particles generated in response to an interaction between the at least one electron beam and the object.
    Type: Grant
    Filed: June 11, 2014
    Date of Patent: July 7, 2015
    Inventor: Dov Shachal
  • Patent number: 8981294
    Abstract: An interface, a scanning electron microscope and a method for observing an object that is positioned in a non-vacuum environment. The method includes: generating an electron beam in the vacuum environment; scanning a region of the object with the electron beam while the object is located below an object holder; wherein the scanning comprises allowing the electron beam to pass through an aperture of an aperture array, pass through an ultra thin membrane that seals the aperture, and pass through the object holder; wherein the ultra thin membrane withstands a pressure difference between the vacuum environment and the non-vacuum environment; and detecting particles generated in response to an interaction between the electron beam and the object.
    Type: Grant
    Filed: October 30, 2012
    Date of Patent: March 17, 2015
    Assignee: B-Nano Ltd.
    Inventors: Dov Shachal, Rafi De Picciotto
  • Publication number: 20140361166
    Abstract: An interface, a scanning electron microscope and a method for observing an object that is positioned in a non-vacuum environment. The method includes: passing at least one electron beam that is generated in a vacuum environment through at least one aperture out of an aperture array and through at least one ultra thin membrane that seals the at least one aperture; wherein the at least one electron beam is directed towards the object; wherein the at least one ultra thin membrane withstands a pressure difference between the vacuum environment and the non-vacuum environment; and detecting particles generated in response to an interaction between the at least one electron beam and the object.
    Type: Application
    Filed: June 11, 2014
    Publication date: December 11, 2014
    Inventor: Dov SHACHAL
  • Patent number: 8779358
    Abstract: An interface, a scanning electron microscope and a method for observing an object that is positioned in a non-vacuum environment. The method includes: passing at least one electron beam that is generated in a vacuum environment through at least one aperture out of an aperture array and through at least one ultra thin membrane that seals the at least one aperture; wherein the at least one electron beam is directed towards the object; wherein the at least one ultra thin membrane withstands a pressure difference between the vacuum environment and the non-vacuum environment; and detecting particles generated in response to an interaction between the at least one electron beam and the object.
    Type: Grant
    Filed: April 18, 2012
    Date of Patent: July 15, 2014
    Inventor: Dov Shachal
  • Publication number: 20140117232
    Abstract: An interface, a scanning electron microscope and a method for observing an object that is positioned in a non-vacuum environment. The method includes: generating an electron beam in the vacuum environment; scanning a region of the object with the electron beam while the object is located below an object holder; wherein the scanning comprises allowing the electron beam to pass through an aperture of an aperture array, pass through an ultra thin membrane that seals the aperture, and pass through the object holder; wherein the ultra thin membrane withstands a pressure difference between the vacuum environment and the non-vacuum environment; and detecting particles generated in response to an interaction between the electron beam and the object.
    Type: Application
    Filed: October 30, 2012
    Publication date: May 1, 2014
    Applicant: B-NANO LTD.
    Inventors: Dov SHACHAL, Rafi DE PICCIOTTO
  • Patent number: 8492716
    Abstract: A vacuumed device that includes: a sealed housing, an electron beam source, an electron optic component, a thin membrane, and a detector. The thin membrane seals an aperture of the sealed housing. The sealed housing defines a vacuumed space in which vacuum is maintained. The electron beam source is configured to generate an electron beam that propagates within the vacuumed space, interacts with the electron optic component and passes through the thin membrane. A first portion of the sealed housing is shaped to fit a space defined by non-vacuumed scanning electron microscope components that are maintained in a non-vacuum environment.
    Type: Grant
    Filed: September 24, 2009
    Date of Patent: July 23, 2013
    Assignee: B-Nano Ltd.
    Inventors: Dov Shachal, Rafi De Picciotto
  • Patent number: 8334510
    Abstract: An interface, a scanning electron microscope and a method for observing an object that is positioned in a non-vacuum environment. The method includes: generating an electron beam in the vacuum environment; scanning a region of the object with the electron beam while the object is located below an object holder; wherein the scanning comprises allowing the electron beam to pass through an aperture of an aperture array, pass through an ultra thin membrane that seals the aperture, and pass through the object holder; wherein the ultra thin membrane withstands a pressure difference between the vacuum environment and the non-vacuum environment; and detecting particles generated in response to an interaction between the electron beam and the object.
    Type: Grant
    Filed: July 2, 2009
    Date of Patent: December 18, 2012
    Assignee: B-Nano Ltd.
    Inventors: Dov Shachal, Rafi De Picciotto
  • Publication number: 20120241608
    Abstract: An interface, a scanning electron microscope and a method for observing an object that is positioned in a non-vacuum environment. The method includes: passing at least one electron beam that is generated in a vacuum environment through at least one aperture out of an aperture array and through at least one ultra thin membrane that seals the at least one aperture; wherein the at least one electron beam is directed towards the object; wherein the at least one ultra thin membrane withstands a pressure difference between the vacuum environment and the non-vacuum environment; and detecting particles generated in response to an interaction between the at least one electron beam and the object.
    Type: Application
    Filed: April 18, 2012
    Publication date: September 27, 2012
    Inventor: Dov Shachal
  • Patent number: 8164057
    Abstract: An interface, a scanning electron microscope and a method for observing an object that is positioned in a non-vacuum environment. The method includes: passing at least one electron beam that is generated in a vacuum environment through at least one aperture out of an aperture array and through at least one ultra thin membrane that seals the at least one aperture; wherein the at least one electron beam is directed towards the object; wherein the at least one ultra thin membrane withstands a pressure difference between the vacuum environment and the non-vacuum environment; and detecting particles generated in response to an interaction between the at least one electron beam and the object.
    Type: Grant
    Filed: October 23, 2007
    Date of Patent: April 24, 2012
    Inventor: Dov Shachal
  • Publication number: 20110210247
    Abstract: A vacuumed device that includes: a sealed housing, an electron beam source, an electron optic component, a thin membrane, and a detector. The thin membrane seals an aperture of the sealed housing. The sealed housing defines a vacuumed space in which vacuum is maintained. The electron beam source is configured to generate an electron beam that propagates within the vacuumed space, interacts with the electron optic component and passes through the thin membrane. A first portion of the sealed housing is shaped to fit a space defined by non-vacuumed scanning electron microscope components that are maintained in a non-vacuum environment.
    Type: Application
    Filed: September 24, 2009
    Publication date: September 1, 2011
    Applicant: B-NANO LTD.
    Inventors: Dov Shachal, Rafi De picciotto
  • Publication number: 20110168889
    Abstract: An interface, a scanning electron microscope and a method for observing an object that is positioned in a non-vacuum environment. The method includes: generating an electron beam in the vacuum environment; scanning a region of the object with the electron beam while the object is located below an object holder; wherein the scanning comprises allowing the electron beam to pass through an aperture of an aperture array, pass through an ultra thin membrane that seals the aperture, and pass through the object holder; wherein the ultra thin membrane withstands a pressure difference between the vacuum environment and the non-vacuum environment; and detecting particles generated in response to an interaction between the electron beam and the object.
    Type: Application
    Filed: July 2, 2009
    Publication date: July 14, 2011
    Inventors: Dov Shachal, Rafi De Picciotto
  • Publication number: 20100140470
    Abstract: An interface, a scanning electron microscope and a method for observing an object that is positioned in a non-vacuum environment. The method includes: passing at least one electron beam that is generated in a vacuum environment through at least one aperture out of an aperture array and through at least one ultra thin membrane that seals the at least one aperture; wherein the at least one electron beam is directed towards the object; wherein the at least one ultra thin membrane withstands a pressure difference between the vacuum environment and the non-vacuum environment; and detecting particles generated in response to an interaction between the at least one electron beam and the object.
    Type: Application
    Filed: October 23, 2007
    Publication date: June 10, 2010
    Inventor: Dov Shachal
  • Patent number: 6627886
    Abstract: A system and a method for fast characterization of sample's material composition, which is especially beneficial for semiconductor fabrication. The material composition is characterized by analyzing secondary electrons emission from the sample. According to one feature, electron detector is used to collect secondary electrons emanating from the sample. The detector is controlled to collect a specific narrow band of secondary electrons, and the band is controlled to allow for collection of SE at different energies. Two modes are disclosed: spot mode and secondary electron spectroscopy material imaging (SESMI). In the spot mode, a spectrum of SE is obtained from a single spot on the sample, and its characteristics are investigated to obtain information of the material composition of the spot. In the SESMI mode, an SEM image of an area on the sample is obtained. The SE spectrum at each pixel is investigated and correlated to a particular spectrum group.
    Type: Grant
    Filed: May 14, 1999
    Date of Patent: September 30, 2003
    Assignee: Applied Materials, Inc.
    Inventors: Dov Shachal, Noam Dotan