Patents by Inventor Dov Shachal
Dov Shachal has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9466458Abstract: A scanning electron microscope suitable for imaging samples in a non-vacuum environment, the scanning electron microscope including an electron source located within an enclosure maintained under vacuum, an electron permeable membrane disposed at an opening of the enclosure separating an environment within the enclosure which is maintained under vacuum and an environment outside the enclosure which is not maintained under vacuum, the electron permeable membrane not being electrically grounded and at least one non-grounded electrode operative as an electron detector.Type: GrantFiled: February 18, 2014Date of Patent: October 11, 2016Assignee: B-NANO LTD.Inventors: Dov Shachal, Rafi De Picciotto
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Patent number: 9431213Abstract: An interface, a scanning electron microscope and a method for observing an object that is positioned in a non-vacuum environment. The method includes: generating an electron beam in the vacuum environment; scanning a region of the object with the electron beam while the object is located below an object holder; wherein the scanning comprises allowing the electron beam to pass through an aperture of an aperture array, pass through an ultra thin membrane that seals the aperture, and pass through the object holder; wherein the ultra thin membrane withstands a pressure difference between the vacuum environment and the non-vacuum environment; and detecting particles generated in response to an interaction between the electron beam and the object.Type: GrantFiled: February 5, 2015Date of Patent: August 30, 2016Assignee: B-NANO LTD.Inventors: Dov Shachal, Rafi De Picciotto
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Publication number: 20160155606Abstract: An interface, a scanning electron microscope and a method for observing an object that is positioned in a non-vacuum environment. The method includes: passing at least one electron beam that is generated in a vacuum environment through at least one aperture out of an aperture array and through at least one ultra thin membrane that seals the at least one aperture; wherein the at least one electron beam is directed towards the object; wherein the at least one ultra thin membrane withstands a pressure difference between the vacuum environment and the non-vacuum environment; and detecting particles generated in response to an interaction between the at least one electron beam and the object.Type: ApplicationFiled: February 3, 2016Publication date: June 2, 2016Applicant: B-NANO LTD.Inventor: Dov SHACHAL
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Patent number: 9287089Abstract: An interface, a scanning electron microscope and a method for observing an object that is positioned in a non-vacuum environment. The method includes: passing at least one electron beam that is generated in a vacuum environment through at least one aperture out of an aperture array and through at least one ultra thin membrane that seals the at least one aperture; wherein the at least one electron beam is directed towards the object; wherein the at least one ultra thin membrane withstands a pressure difference between the vacuum environment and the non-vacuum environment; and detecting particles generated in response to an interaction between the at least one electron beam and the object.Type: GrantFiled: April 15, 2015Date of Patent: March 15, 2016Assignee: B-NANO LTD.Inventor: Dov Shachal
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Publication number: 20150380207Abstract: A scanning electron microscope suitable for imaging samples in a non-vacuum environment, the scanning electron microscope including an electron source located within an enclosure maintained under vacuum, an electron permeable membrane disposed at an opening of the enclosure separating an environment within the enclosure which is maintained under vacuum and an environment outside the enclosure which is not maintained under vacuum, the electron permeable membrane not being electrically grounded and at least one non-grounded electrode operative as an electron detector.Type: ApplicationFiled: February 18, 2014Publication date: December 31, 2015Applicant: B-NANO LTD.Inventors: Dov SHACHAL, Rafi DE PICCIOTTO
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Publication number: 20150243475Abstract: An interface, a scanning electron microscope and a method for observing an object that is positioned in a non-vacuum environment. The method includes: generating an electron beam in the vacuum environment; scanning a region of the object with the electron beam while the object is located below an object holder; wherein the scanning comprises allowing the electron beam to pass through an aperture of an aperture array, pass through an ultra thin membrane that seals the aperture, and pass through the object holder; wherein the ultra thin membrane withstands a pressure difference between the vacuum environment and the non-vacuum environment; and detecting particles generated in response to an interaction between the electron beam and the object.Type: ApplicationFiled: February 5, 2015Publication date: August 27, 2015Applicant: B-NANO LTD.Inventors: Dov SHACHAL, Rafi DE PICCIOTTO
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Publication number: 20150235806Abstract: An interface, a scanning electron microscope and a method for observing an object that is positioned in a non-vacuum environment. The method includes: passing at least one electron beam that is generated in a vacuum environment through at least one aperture out of an aperture array and through at least one ultra thin membrane that seals the at least one aperture; wherein the at least one electron beam is directed towards the object; wherein the at least one ultra thin membrane withstands a pressure difference between the vacuum environment and the non-vacuum environment; and detecting particles generated in response to an interaction between the at least one electron beam and the object.Type: ApplicationFiled: April 15, 2015Publication date: August 20, 2015Inventor: Dov SHACHAL
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Patent number: 9076631Abstract: An interface, a scanning electron microscope and a method for observing an object that is positioned in a non-vacuum environment. The method includes: passing at least one electron beam that is generated in a vacuum environment through at least one aperture out of an aperture array and through at least one ultra thin membrane that seals the at least one aperture; wherein the at least one electron beam is directed towards the object; wherein the at least one ultra thin membrane withstands a pressure difference between the vacuum environment and the non-vacuum environment; and detecting particles generated in response to an interaction between the at least one electron beam and the object.Type: GrantFiled: June 11, 2014Date of Patent: July 7, 2015Inventor: Dov Shachal
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Patent number: 8981294Abstract: An interface, a scanning electron microscope and a method for observing an object that is positioned in a non-vacuum environment. The method includes: generating an electron beam in the vacuum environment; scanning a region of the object with the electron beam while the object is located below an object holder; wherein the scanning comprises allowing the electron beam to pass through an aperture of an aperture array, pass through an ultra thin membrane that seals the aperture, and pass through the object holder; wherein the ultra thin membrane withstands a pressure difference between the vacuum environment and the non-vacuum environment; and detecting particles generated in response to an interaction between the electron beam and the object.Type: GrantFiled: October 30, 2012Date of Patent: March 17, 2015Assignee: B-Nano Ltd.Inventors: Dov Shachal, Rafi De Picciotto
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Publication number: 20140361166Abstract: An interface, a scanning electron microscope and a method for observing an object that is positioned in a non-vacuum environment. The method includes: passing at least one electron beam that is generated in a vacuum environment through at least one aperture out of an aperture array and through at least one ultra thin membrane that seals the at least one aperture; wherein the at least one electron beam is directed towards the object; wherein the at least one ultra thin membrane withstands a pressure difference between the vacuum environment and the non-vacuum environment; and detecting particles generated in response to an interaction between the at least one electron beam and the object.Type: ApplicationFiled: June 11, 2014Publication date: December 11, 2014Inventor: Dov SHACHAL
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Patent number: 8779358Abstract: An interface, a scanning electron microscope and a method for observing an object that is positioned in a non-vacuum environment. The method includes: passing at least one electron beam that is generated in a vacuum environment through at least one aperture out of an aperture array and through at least one ultra thin membrane that seals the at least one aperture; wherein the at least one electron beam is directed towards the object; wherein the at least one ultra thin membrane withstands a pressure difference between the vacuum environment and the non-vacuum environment; and detecting particles generated in response to an interaction between the at least one electron beam and the object.Type: GrantFiled: April 18, 2012Date of Patent: July 15, 2014Inventor: Dov Shachal
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Publication number: 20140117232Abstract: An interface, a scanning electron microscope and a method for observing an object that is positioned in a non-vacuum environment. The method includes: generating an electron beam in the vacuum environment; scanning a region of the object with the electron beam while the object is located below an object holder; wherein the scanning comprises allowing the electron beam to pass through an aperture of an aperture array, pass through an ultra thin membrane that seals the aperture, and pass through the object holder; wherein the ultra thin membrane withstands a pressure difference between the vacuum environment and the non-vacuum environment; and detecting particles generated in response to an interaction between the electron beam and the object.Type: ApplicationFiled: October 30, 2012Publication date: May 1, 2014Applicant: B-NANO LTD.Inventors: Dov SHACHAL, Rafi DE PICCIOTTO
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Patent number: 8492716Abstract: A vacuumed device that includes: a sealed housing, an electron beam source, an electron optic component, a thin membrane, and a detector. The thin membrane seals an aperture of the sealed housing. The sealed housing defines a vacuumed space in which vacuum is maintained. The electron beam source is configured to generate an electron beam that propagates within the vacuumed space, interacts with the electron optic component and passes through the thin membrane. A first portion of the sealed housing is shaped to fit a space defined by non-vacuumed scanning electron microscope components that are maintained in a non-vacuum environment.Type: GrantFiled: September 24, 2009Date of Patent: July 23, 2013Assignee: B-Nano Ltd.Inventors: Dov Shachal, Rafi De Picciotto
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Patent number: 8334510Abstract: An interface, a scanning electron microscope and a method for observing an object that is positioned in a non-vacuum environment. The method includes: generating an electron beam in the vacuum environment; scanning a region of the object with the electron beam while the object is located below an object holder; wherein the scanning comprises allowing the electron beam to pass through an aperture of an aperture array, pass through an ultra thin membrane that seals the aperture, and pass through the object holder; wherein the ultra thin membrane withstands a pressure difference between the vacuum environment and the non-vacuum environment; and detecting particles generated in response to an interaction between the electron beam and the object.Type: GrantFiled: July 2, 2009Date of Patent: December 18, 2012Assignee: B-Nano Ltd.Inventors: Dov Shachal, Rafi De Picciotto
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Publication number: 20120241608Abstract: An interface, a scanning electron microscope and a method for observing an object that is positioned in a non-vacuum environment. The method includes: passing at least one electron beam that is generated in a vacuum environment through at least one aperture out of an aperture array and through at least one ultra thin membrane that seals the at least one aperture; wherein the at least one electron beam is directed towards the object; wherein the at least one ultra thin membrane withstands a pressure difference between the vacuum environment and the non-vacuum environment; and detecting particles generated in response to an interaction between the at least one electron beam and the object.Type: ApplicationFiled: April 18, 2012Publication date: September 27, 2012Inventor: Dov Shachal
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Patent number: 8164057Abstract: An interface, a scanning electron microscope and a method for observing an object that is positioned in a non-vacuum environment. The method includes: passing at least one electron beam that is generated in a vacuum environment through at least one aperture out of an aperture array and through at least one ultra thin membrane that seals the at least one aperture; wherein the at least one electron beam is directed towards the object; wherein the at least one ultra thin membrane withstands a pressure difference between the vacuum environment and the non-vacuum environment; and detecting particles generated in response to an interaction between the at least one electron beam and the object.Type: GrantFiled: October 23, 2007Date of Patent: April 24, 2012Inventor: Dov Shachal
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Publication number: 20110210247Abstract: A vacuumed device that includes: a sealed housing, an electron beam source, an electron optic component, a thin membrane, and a detector. The thin membrane seals an aperture of the sealed housing. The sealed housing defines a vacuumed space in which vacuum is maintained. The electron beam source is configured to generate an electron beam that propagates within the vacuumed space, interacts with the electron optic component and passes through the thin membrane. A first portion of the sealed housing is shaped to fit a space defined by non-vacuumed scanning electron microscope components that are maintained in a non-vacuum environment.Type: ApplicationFiled: September 24, 2009Publication date: September 1, 2011Applicant: B-NANO LTD.Inventors: Dov Shachal, Rafi De picciotto
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Publication number: 20110168889Abstract: An interface, a scanning electron microscope and a method for observing an object that is positioned in a non-vacuum environment. The method includes: generating an electron beam in the vacuum environment; scanning a region of the object with the electron beam while the object is located below an object holder; wherein the scanning comprises allowing the electron beam to pass through an aperture of an aperture array, pass through an ultra thin membrane that seals the aperture, and pass through the object holder; wherein the ultra thin membrane withstands a pressure difference between the vacuum environment and the non-vacuum environment; and detecting particles generated in response to an interaction between the electron beam and the object.Type: ApplicationFiled: July 2, 2009Publication date: July 14, 2011Inventors: Dov Shachal, Rafi De Picciotto
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Publication number: 20100140470Abstract: An interface, a scanning electron microscope and a method for observing an object that is positioned in a non-vacuum environment. The method includes: passing at least one electron beam that is generated in a vacuum environment through at least one aperture out of an aperture array and through at least one ultra thin membrane that seals the at least one aperture; wherein the at least one electron beam is directed towards the object; wherein the at least one ultra thin membrane withstands a pressure difference between the vacuum environment and the non-vacuum environment; and detecting particles generated in response to an interaction between the at least one electron beam and the object.Type: ApplicationFiled: October 23, 2007Publication date: June 10, 2010Inventor: Dov Shachal
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Patent number: 6627886Abstract: A system and a method for fast characterization of sample's material composition, which is especially beneficial for semiconductor fabrication. The material composition is characterized by analyzing secondary electrons emission from the sample. According to one feature, electron detector is used to collect secondary electrons emanating from the sample. The detector is controlled to collect a specific narrow band of secondary electrons, and the band is controlled to allow for collection of SE at different energies. Two modes are disclosed: spot mode and secondary electron spectroscopy material imaging (SESMI). In the spot mode, a spectrum of SE is obtained from a single spot on the sample, and its characteristics are investigated to obtain information of the material composition of the spot. In the SESMI mode, an SEM image of an area on the sample is obtained. The SE spectrum at each pixel is investigated and correlated to a particular spectrum group.Type: GrantFiled: May 14, 1999Date of Patent: September 30, 2003Assignee: Applied Materials, Inc.Inventors: Dov Shachal, Noam Dotan