Patents by Inventor Duane Outka
Duane Outka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20230138555Abstract: Plasma processing chamber is provided where the plasma processing chamber has a first component. A first plurality of multilayers is disposed over the first component, wherein each multilayer comprises a process layer and a conditioning layer adjacent to the process layer, wherein the process layer is more etch resistant to a processing plasma than the conditioning layer and wherein the conditioning layer is configured to be selectively etched with respect to the process layer; and wherein the process layer is configured to be selectively etched with respect to the conditioning layer.Type: ApplicationFiled: March 17, 2021Publication date: May 4, 2023Inventors: Amir A. YASSERI, Duane OUTKA
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Publication number: 20220252548Abstract: An apparatus for measuring contaminants on a surface of a component is provided. An extraction vessel for holding a measurement fluid has an opening adapted to form a meniscus using the measurement fluid. An actuator moves at least one of the extraction vessel and the component to a position where the meniscus is in contact with the surface of the component. A transducer is positioned to provide acoustic energy to the measurement fluid.Type: ApplicationFiled: May 19, 2020Publication date: August 11, 2022Inventors: Amir A. YASSERI, Duane OUTKA, Armen AVOYAN, Kennet Cresencio BAYLON, John DAUGHERTY, Girish M. HUNDI, Cliff LA CROIX
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Patent number: 11384430Abstract: A method for conditioning ceramic coating on a part for use in a plasma processing chamber is provided. The ceramic coating is wetted with a solution, wherein the solution is formed by mixing a solvent with an electrolyte, wherein from 1% to 10% of the electrolyte dissociates in the solution. The ceramic coating is blasted with particles. The ceramic coating is rinsed.Type: GrantFiled: July 1, 2019Date of Patent: July 12, 2022Assignee: Lam Research CorporationInventors: Hong Shih, Xiaomin Bin, Duane Outka, Eric A. Pape, Gregory A. Pilgrim, Girish M. Hundi, Cliff La Croix
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Publication number: 20210341377Abstract: An apparatus for measuring contamination on a critical surface of a part is provided. A vessel for mounting the part is provided. An inert gas source is in fluid connection with the vessel and adapted to provide an inert gas to the vessel. At least one diffuser receives the inert gas from the vessel, wherein the critical surface of the part is exposed to the inert gas when the part is mounted in the vessel. At least one analyzer is adapted to receive inert gas from the at least one diffuser and measures contaminants in the inert gas.Type: ApplicationFiled: September 5, 2019Publication date: November 4, 2021Inventors: Amir A. YASSERI, Girish M. HUNDI, John Michael KERNS, Duane OUTKA, John DAUGHERTY, Cliff LA CROIX
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Patent number: 11124659Abstract: A method for providing a part with a plasma resistant ceramic coating for use in a plasma processing chamber is provided. A patterned mask is placed on the part. A film is deposited over the part. The patterned mask is removed. A plasma resistant ceramic coating is applied on the part.Type: GrantFiled: January 30, 2018Date of Patent: September 21, 2021Assignee: Lam Research CorporationInventors: Amir A. Yasseri, Duane Outka, Hong Shih, John Daugherty
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Publication number: 20210280393Abstract: A method for conditioning ceramic coating on a part for use in a plasma processing chamber is provided. The ceramic coating is wetted with a solution, wherein the solution is formed by mixing a solvent with an electrolyte, wherein from 1% to 10% of the electrolyte dissociates in the solution. The ceramic coating is blasted with particles. The ceramic coating is rinsed.Type: ApplicationFiled: July 1, 2019Publication date: September 9, 2021Inventors: Hong SHIH, Xiaomin BIN, Duane OUTKA, Eric A. PAPE, Gregory A. PILGRIM, Girish M. HUNDI, Cliff LA CROIX
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Publication number: 20210205858Abstract: A method for conditioning a component of a wafer processing chamber is provided. The component is placed in an ultrasonic conditioning solution in an ultrasonic solution tank. Ultrasonic energy is applied through the ultrasonic conditioning solution to the component to clean the component. The component is submerged in a megasonic conditioning solution in a tank. Megasonic energy is applied through the megasonic conditioning solution to the component to clean the component.Type: ApplicationFiled: March 24, 2021Publication date: July 8, 2021Inventors: Amir A. YASSERI, Hong SHIH, John DAUGHERTY, Duane OUTKA, Lin XU, Armen AVOYAN, Cliff LA CROIX, Girish HUNDI
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Patent number: 10967407Abstract: An apparatus for conditioning a component of a processing chamber is provided. A tank for holding a megasonic conditioning solution is provided. A mount holds the component immersed in a megasonic conditioning solution, when the tank is filled with the megasonic conditioning solution. A megasonic conditioning solution inlet system delivers the megasonic conditioning solution to the tank. A megasonic transducer head comprises at least one megasonic transducer to provide megasonic energy to the megasonic conditioning solution, wherein the megasonic energy is delivered to the component via the megasonic conditioning solution. A megasonic conditioning solution drain system drains the megasonic conditioning solution from the tank at a location above where the component is held in the megasonic conditioning solution. An actuator moves the megasonic transducer head across the tank.Type: GrantFiled: May 2, 2018Date of Patent: April 6, 2021Assignee: Lam Research CorporationInventors: Amir A. Yasseri, Hong Shih, John Daugherty, Duane Outka, Lin Xu, Armen Avoyan, Cliff La Croix, Girish Hundi
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Publication number: 20190233658Abstract: A method for providing a part with a plasma resistant ceramic coating for use in a plasma processing chamber is provided. A patterned mask is placed on the part. A film is deposited over the part. The patterned mask is removed. A plasma resistant ceramic coating is applied on the part.Type: ApplicationFiled: January 30, 2018Publication date: August 1, 2019Inventors: Amir A. YASSERI, Duane OUTKA, Hong SHIH, John DAUGHERTY
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Publication number: 20180318890Abstract: An apparatus for conditioning a component of a processing chamber is provided. A tank for holding a megasonic conditioning solution is provided. A mount holds the component immersed in a megasonic conditioning solution, when the tank is filled with the megasonic conditioning solution. A megasonic conditioning solution inlet system delivers the megasonic conditioning solution to the tank. A megasonic transducer head comprises at least one megasonic transducer to provide megasonic energy to the megasonic conditioning solution, wherein the megasonic energy is delivered to the component via the megasonic conditioning solution. A megasonic conditioning solution drain system drains the megasonic conditioning solution from the tank at a location above where the component is held in the megasonic conditioning solution. An actuator moves the megasonic transducer head across the tank.Type: ApplicationFiled: May 2, 2018Publication date: November 8, 2018Inventors: Amir A. YASSERI, Hong SHIH, John DAUGHERTY, Duane OUTKA, Lin XU, Armen AVOYAN, Cliff LA CROIX, Girish HUNDI
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Patent number: 9766063Abstract: A method for treating a nonhomogeneous material surface of an object is provided. A plurality of test patches of the surface is treated for different amounts of time wherein the plurality of test patches have a total surface area. A property of each test patch is measured. A calibration curve of the property is generated with respect to time. The calibration curve and a target property are used to obtain a target time. A surface of the object with a surface area, which is greater than the total surface area of the plurality of test patches, is treated for the target time.Type: GrantFiled: September 15, 2015Date of Patent: September 19, 2017Assignee: Lam Research CorporationInventors: Amir Yasseri, Duane Outka, Michael Lopez
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Patent number: 9689533Abstract: A gas delivery system for a plasma process system such as a plasma etching system wherein inner surfaces of gas passages are coated with a corrosion-resistant material coating formed by curing a layer of fluidic precursor deposited on the inner surfaces. The coating can be formed by (a) flowing a fluidic precursor of a corrosion-resistant material through the gas passages and depositing a layer of the fluidic precursor to completely coat the inner surfaces of the gas passages; (b) removing excess fluidic precursor from the inner surfaces; (c) curing the deposited layer of the fluidic precursor to form a corrosion-resistant material coating.Type: GrantFiled: August 29, 2014Date of Patent: June 27, 2017Assignee: LAM RESEARCH CORPORATIONInventors: Ian Kenworthy, Duane Outka, Fangli Hao, Leonard Sharpless, Yijun Du
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Publication number: 20170074646Abstract: A method for treating a nonhomogeneous material surface of an object is provided. A plurality of test patches of the surface is treated for different amounts of time wherein the plurality of test patches have a total surface area. A property of each test patch is measured. A calibration curve of the property is generated with respect to time. The calibration curve and a target property are used to obtain a target time. A surface of the object with a surface area, which is greater than the total surface area of the plurality of test patches, is treated for the target time.Type: ApplicationFiled: September 15, 2015Publication date: March 16, 2017Inventors: Amir Yasseri, Duane Outka, Michael Lopez
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Patent number: 9393666Abstract: An adapter plate configured to be attachable to a universal platen of a cleaning unit for cleaning upper electrodes from a plasma processing chamber is disclosed, the adapter plate includes a support surface and a mounting surface configured to be fastened to the universal platen of the cleaning unit. The support surface is configured to support an inner electrode or an outer electrode of a showerhead electrode assembly for cleaning upper or lower surfaces thereof. The support surface having a first set of holes configured to receive pins engaged in an upper surface of the inner electrode, a second set of holes configured to receive pins surrounding an outer periphery of the inner electrode, a third set of holes configured to receive pins engaged in an upper surface of the outer electrode, and a fourth set of holes configured to receive pins surrounding an outer periphery of the outer electrode.Type: GrantFiled: December 20, 2013Date of Patent: July 19, 2016Assignee: LAM RESEARCH CORPORATIONInventors: Catherine Zhou, Duane Outka, Cliff LaCroix, Hong Shih
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Patent number: 9387521Abstract: A method of wet cleaning an aluminum part having bare aluminum surfaces and anodized aluminum surfaces. The method includes CO2 dry ice blasting the surfaces of the aluminum part at approximately 35 to approximately 45 psi, masking the aluminum part to conceal the bare aluminum surfaces, soaking the dry ice blasted and masked aluminum part in deionized water at or above approximately 60° C., scrubbing the aluminum part with an abrasive pad and deionized water after completion of the soaking in deionized water, and repeating the soaking and scrubbing in the recited order at least three additional times.Type: GrantFiled: September 30, 2013Date of Patent: July 12, 2016Assignee: Lam Research CorporationInventors: Hong Shih, Fan-Cheung Sze, Brian McMillin, John Daugherty, Yan Fang, Duane Outka, Tuochuan Huang, Sivakami Ramanathan
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Patent number: 9337002Abstract: Components of semiconductor material processing chambers are disclosed, which may include a substrate and at least one corrosion-resistant coating formed on a surface thereof. The at least one corrosion-resistant coating is a high purity metal coating formed by a cold-spray technique. An anodized layer can be formed on the high purity metal coating. The anodized layer comprises a process-exposed surface of the component. Semiconductor material processing apparatuses including one or more of the components are also disclosed, the components being selected from the group consisting of a chamber liner, an electrostatic chuck, a focus ring, a chamber wall, an edge ring, a plasma confinement ring, a substrate support, a baffle, a gas distribution plate, a gas distribution ring, a gas nozzle, a heating element, a plasma screen, a transport mechanism, a gas supply system, a lift mechanism, a load lock, a door mechanism, a robotic arm and a fastener.Type: GrantFiled: March 12, 2013Date of Patent: May 10, 2016Assignee: LAM RESEARCH CORPORATIONInventors: John Daugherty, Hong Shih, Lin Xu, Anthony Amadio, Robert G. O'Neill, Peter Holland, Sivakami Ramanathan, Tae Won Kim, Duane Outka, John Michael Kerns, Sonia Castillo
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Patent number: 9120201Abstract: A process is provided for polishing a silicon electrode utilizing a polishing turntable and a dual function electrode platen secured to the polishing, which can comprise a plurality of electrode mounts arranged to project from an electrode engaging face of the dual function electrode platen. The electrode mounts and mount receptacles can be configured to permit non-destructive engagement and disengagement of the electrode engaging face of the electrode platen and the platen engaging face of the silicon electrode. The silicon electrode can be polished by (i) engaging the electrode engaging face of the electrode platen and the platen engaging face of the silicon electrode via the electrode mounts and mount receptacles, (ii) utilizing the polishing turntable to impart rotary, and (iii) contacting an exposed face of the silicon electrode with a polishing surface as the silicon electrode. Additional embodiments are contemplated, disclosed and claimed.Type: GrantFiled: September 9, 2013Date of Patent: September 1, 2015Assignee: Lam Research CorporationInventors: Armen Avoyan, Duane Outka, Catherine Zhou, Hong Shih
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Publication number: 20150179416Abstract: An adapter plate configured to be attachable to a universal platen of a cleaning unit for cleaning upper electrodes from a plasma processing chamber is disclosed, the adapter plate includes a support surface and a mounting surface configured to be fastened to the universal platen of the cleaning unit. The support surface is configured to support an inner electrode or an outer electrode of a showerhead electrode assembly for cleaning upper or lower surfaces thereof. The support surface having a first set of holes configured to receive pins engaged in an upper surface of the inner electrode, a second set of holes configured to receive pins surrounding an outer periphery of the inner electrode, a third set of holes configured to receive pins engaged in an upper surface of the outer electrode, and a fourth set of holes configured to receive pins surrounding an outer periphery of the outer electrode.Type: ApplicationFiled: December 20, 2013Publication date: June 25, 2015Applicant: Lam Research CorporationInventors: Catherine Zhou, Duane Outka, Cliff LaCroix, Hong Shih
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Publication number: 20140366968Abstract: A gas delivery system for a plasma process system such as a plasma etching system wherein inner surfaces of gas passages are coated with a corrosion-resistant material coating formed by curing a layer of fluidic precursor deposited on the inner surfaces. The coating can be formed by (a) flowing a fluidic precursor of a corrosion-resistant material through the gas passages and depositing a layer of the fluidic precursor to completely coat the inner surfaces of the gas passages; (b) removing excess fluidic precursor from the inner surfaces; (c) curing the deposited layer of the fluidic precursor to form a corrosion-resistant material coating.Type: ApplicationFiled: August 29, 2014Publication date: December 18, 2014Inventors: Ian Kenworthy, Duane Outka, Fangli Hao, Leonard Sharpless, Yijun Du
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Patent number: 8859432Abstract: Bare aluminum baffles are adapted for resist stripping chambers and include an outer aluminum oxide layer, which can be a native aluminum oxide layer or a layer formed by chemically treating a new or used bare aluminum baffle to form a thin outer aluminum oxide layer.Type: GrantFiled: October 31, 2012Date of Patent: October 14, 2014Assignee: Lam Research CorporationInventors: Fred D. Egley, Michael S. Kang, Anthony L. Chen, Jack Kuo, Hong Shih, Duane Outka, Bruno Morel