Patents by Inventor Dubi Shachal

Dubi Shachal has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7161158
    Abstract: An apparatus and method for fast changing a focal length of a charged particle beam the method comprising the step of changing a control signal in response to a relationship between the control signal voltage value and the focal length of the charged particle beam.
    Type: Grant
    Filed: October 9, 2002
    Date of Patent: January 9, 2007
    Assignee: Applied Materials, Inc.
    Inventors: Dror Shemesh, Dubi Shachal
  • Publication number: 20050017192
    Abstract: An apparatus and method for fast changing a focal length of a charged particle beam the method comprising the step of changing a control signal in response to a relationship between the control signal voltage value and the focal length of the charged particle beam.
    Type: Application
    Filed: October 9, 2002
    Publication date: January 27, 2005
    Inventors: Dror Shemesh, Dubi Shachal
  • Patent number: 6670610
    Abstract: A system and method for directing the object, such as a semiconductor die. The system includes a first images such as a scanning electron microscope, a stage for moving the object and a second imager and miller such as a focused ion beam generator. The object is images to locate a desired location in which the object is to be milled and a landmark that is utilized for directing the miller. The system can include additional steps of milling, analyzing and movement of the object.
    Type: Grant
    Filed: November 26, 2001
    Date of Patent: December 30, 2003
    Assignee: Applied Materials, Inc.
    Inventors: Dror Shemesh, Ariel Ben-Porath, Dubi Shachal, Alexey Stepanov
  • Publication number: 20030098416
    Abstract: A system and method for directing the object, such as a semiconductor die. The system includes a first images such as a scanning electron microscope, a stage for moving the object and a second imager and miller such as a focused ion beam generator. The object is images to locate a desired location in which the object is to be milled and a landmark that is utilized for directing the miller. The system can include additional steps of milling, analyzing and movement of the object.
    Type: Application
    Filed: November 26, 2001
    Publication date: May 29, 2003
    Inventors: Dror Shemesh, Ariel Ben-Porath, Dubi Shachal, Alexey Stepanov
  • Patent number: 6201240
    Abstract: Disclosed is a system and method for enhancing edge, topography, and materials in SEM images. The enhancements are achieved by collecting secondary electrons at narrow energy bands. This allows construction of various “primary” images having specific features enhanced. Further enhancement is achieved by various manipulations and combinations of the “primary” images to obtain a final enhanced image. Yet further enhancements are achieved by assigning color to various “primary” images before constructing the final image.
    Type: Grant
    Filed: November 4, 1998
    Date of Patent: March 13, 2001
    Assignee: Applied Materials, Inc.
    Inventors: Noam Dotan, Sergio Serulnik, Dubi Shachal