Abstract: An apparatus and method for diffusion annealing impurities onto a plurality of wafers is described. A hollow wafer holder includes a plurality of first and second slots. The first slots are sized and shaped to receive a pair of wafers. The first slots are angled relative to a longitudinal axis of the wafer holder. The wafer holder is positioned at a first location within an ampoule, with a diffusion source being positioned at a second location within the ampoule. The ampoule is sealed and placed within or near a heat source. The heat source alters the physical state of the diffusion source to allow the entrained impurities to diffuse throughout the ampoule. The inclination of the first slots allows a sufficient clearance between the wafers and the ampoule to allow impurities within a gaseous diffusion source to extend throughout the ampoule. The presence of the second slots allows a more uniform diffusion of the impurities to the wafers.

Abstract: An optical connector for device to fiber coupling is disclosed comprising a connector housing having waveguide channels formed therethrough. The connector housing is injection molded from a plastic material. These waveguide channels each include a first end and a second end. Attachment apparatus for an optical fiber is included at each of the first ends of the waveguide channels, and attachment apparatus for an optical device is included at each of the second ends of the waveguide channels. Waveguide core portions, positioned within the waveguide channels, are made from an optical plastic material.