Abstract: A system and method of non-contact measurement of the dopant content of semiconductor material by reflecting infrared (IR) radiation off of the material and splitting the radiation into two beams, passing each beam through pass band filters of differing wavelength ranges, comparing the level of energy passed through each filter and calculating the dopant content by referencing a correlation curve made up of known wafer dopant content for that system.

Abstract: A system and method of non-contact measurement of the dopant content of semiconductor material by reflecting infrared (IR) radiation off of the material and splitting the radiation into two beams, passing each beam through pass band filters of differing wavelength ranges, comparing the level of energy passed through each filter and calculating the dopant content by referencing a correlation curve made up of known wafer dopant content for that system.

Abstract: Methods and apparatuses for manufacturing photovoltaic products include an assessment of each product in a production line for suitability, and assigning a grade based either on assessment of the product at that step, comparison to statistical analysis of assessment results of previous products at that step or comparison of previous assessment results of past steps compared to statistical analysis of cumulative assessment results of past products at those steps. Products can be associated into groups for processing as a group based on the grades and downstream equipment can be adjusted based on the grade of the group to bring the group within determined tolerances.

Abstract: A system of providing fast machine direction (MD) and cross direction (CD) basis weight adjustments using a simultaneous multi-point water weight sensor which provides independent MD and CD measurements is described. The water weight sensor is placed under the wire of the sheetmaking machine and provides fast wet end water weight measurements which are converted into predicted dry end basis weight information and used to control operating variables of machine elements in the sheetmaking machine to compensate for high frequency process variations. MD wet end measurements are used to control operating variables of machine elements that influence the MD dry end basis weight and CD wet end measurements are used to control operating variables of machine elements that influence CD dry end basis weight.

Abstract: A system and method of providing fast machine direction (MD) and cross direction (CD) basis weight adjustments using a simultaneous multi-point water weight sensor which provides independent MD and CD measurements is described. The water weight sensor is placed under the wire of the sheetmaking machine and provides fast wet end water weight measurements which are converted into predicted dry end basis weight information and used to control operating variables of machine elements in the sheetmaking machine to compensate for high frequency process variations. MD wet end measurements are used to control operating variables of machine elements that influence the MD dry end basis weight and CD wet end measurements are used to control operating variables of machine elements that influence CD dry end basis weight.

Abstract: Apparatus and process for controlling the basis weight of paper produced in a papermaking machine are provided. In the papermaking process, a major portion of the paper stock flows through a first line that is controlled by a thick stock valve and a minor portion of the stock flow from the stuff box to the headbox is diverted through a second line that is regulated by a second valve (e.g., vernier valve). The thick stock valve is controlled by the dry end basis weight and the second valve responsive to measurements of the basis weight of the wet stock at the wire. The second line and control valve along with the wet end basis weight measurements form a fine control loop with fast response time whereas the first line and control valve that is responsive to dry end basis weight measurements form a course control loop. The dual control loops enable fast and actual basis weight control.