Abstract: A projection exposure apparatus is equipped with an illumination system, a reticle, a projection objective and an image plane. Interstitial spaces between the individual elements of the apparatus are open to the ambient space. A gas purge device which carries a stream of noble gas or nitrogen is arranged in at least one of the interstitial spaces. The gas purge device is of a shape and size so that one or more interstitial spaces are at least to a large extent sealed off from the ambient space surrounding the projection apparatus.

Abstract: A projection exposure apparatus is equipped with an illumination system, a reticle, a projection objective and an image plane. Interstitial spaces between the individual elements of the apparatus are open to the ambient space. A gas purge device which carries a stream of noble gas or nitrogen is arranged in at least one of the interstitial spaces. The gas purge device is of a shape and size so that one or more interstitial spaces are at least to a large extent sealed off from the ambient space surrounding the projection apparatus.

Abstract: An apparatus for air guidance in a processing chamber has a housing with an entrance gate and an exit gate. Inside the housing the processing chamber is embodied for filling and sealing small bottles or ampules. The processing chamber is separated from an outside region via an intermediate region. The intermediate region having a movable door by means of which manual interventions in the processing chamber can be made. The apparatus also has a ventilation system with a blower and a clean-air filter which inside the processing chamber generates a laminar air flow. By means of special air pressure ratios in the processing chamber the intermediate region the entrance gate and the exit gate, the occurrence of contamination, or its exceeding a tolerable amount, in the processing chamber (12) and the outside region is avoided.