Abstract: A system and method of generating a drop pattern. The method may include receiving an initial drop pattern. The method may include receiving a target drop pattern exclusion edge for each of a plurality of locations. The method may include receiving one or more constraints of a dispensing system. The method may include generating a base drop pattern exclusion edge line based on the target drop pattern exclusion edge. The method may include generating a new drop pattern wherein drops deposited at an edge of the new drop pattern are positioned on integer multiples of the pitch constraint from the optimum base drop pattern exclusion edge line.

Abstract: A method can be used to generate a fluid droplet pattern for an imprint lithography process using a fluid dispense system having fluid dispense ports. The method can include determining a fluid droplet pattern for dispensing a formable material onto a substrate, during a first pass, dispensing the formable material along a stitch line to form a first part of the fluid droplet pattern for an imprint field, where the stitch line runs from a first corner to a second corner of the imprint field. The method can also include offsetting the substrate and the fluid dispense ports relative to each other after dispensing the formable material during the first pass, and during a second pass, dispensing the formable material along the stitch line onto the substrate to form a second part of the fluid droplet pattern for the imprint field. An apparatus can be configured to carry out the method.

Abstract: A shaping system and method of shaping with the shaping system. The shaping system may include a spatial light modulator. The shaping system may include a radiation source to illuminate the spatial light modulator with actinic radiation. The shaping system may include a beam splitter configured to receive actinic radiation from the spatial light modulator and emit a first image of the spatial light modulator and a second image of the spatial light modulator. The shaping system may include a beam combiner configured to receive the first image and the second image and emit a combined image. The combined image may include the first image; and the second image offset from the first image. The shaping system may include a projection system configured to receive the combined image and illuminate formable material between a template and a substrate with a projected image at a plane of the formable material.

Abstract: A method of inhibiting evaporation of a formable material on a substrate, the method comprising holding the substrate with a substrate chuck, the substrate chuck being positioned within a central opening of a frame such that the frame surrounds at least a portion of the substrate chuck, supplying the formable material or a volatile material different from the formable material to a portion of the frame surrounding the substrate chuck, and dispensing the formable material on the substrate.

Abstract: A template and method of using the template is disclosed. The template can include a body with a first side and a second side, and an extension. The extension can include a first surface adjacent the body, a second surface, and a third surface between the first surface and the second surface, where the first surface includes a curvature and where a portion of the curvature of the first surface is interior to the third surface. The method can include dispensing a formable material over a substrate, where the substrate includes a non-uniform surface topography. The method can also include curing the formable material contacting the second surface of the extension to form a layer over the substrate while the formable material contacting the third surface of the extension remains in a liquid state, wherein curing is performed while the template is contacting the formable material.

Abstract: Systems and methods for shaping a film. Formable material in an imprint field on the substrate may be contacted with a shaping surface of a template. Outer boundaries of the imprint field correspond to outer boundaries of the shaping surface. Shaping the film includes forming a cured layer within the imprint field while the shaping surface is in contact with the formable material. Shaping the film may include separating the shaping surface from the cured layer. Shaping the film may include moving the template away from the imprint field to a first offset location wherein the outer boundaries of the shaping surface are offset relative to the outer boundaries of the imprint field. Shaping the film may include curing a second portion of the formable material while the template is at the first offset location so as to form the shaped film.

Abstract: A system and method for cleaning mesa sidewalls of a template. Curable material may be deposited in a cleaning drop pattern onto a non-yielding imprint field of one of: a device yielding substrate; and a non-yielding substrate. The template may be brought into contact with the curable material. The template has: a recessed surface; a mesa extending from the recessed surface; and wherein the mesa sidewalls connect the recessed surface to the mesa. A relative position of the template to the cleaning drop pattern may be such that the curable material spreads up the mesa sidewalls and does not contact the recessed surface. Cured material may be formed by exposing the curable material to actinic radiation after the curable material has spread up the mesa sidewalls, and before the curable material contacts the recessed surface. The template may be separated from the cured material.

Abstract: A shaping system and method of shaping with the shaping system. The shaping system may include a spatial light modulator. The shaping system may include a radiation source to illuminate the spatial light modulator with actinic radiation. The shaping system may include a beam splitter configured to receive actinic radiation from the spatial light modulator and emit a first image of the spatial light modulator and a second image of the spatial light modulator. The shaping system may include a beam combiner configured to receive the first image and the second image and emit a combined image. The combined image may include the first image; and the second image offset from the first image. The shaping system may include a projection system configured to receive the combined image and illuminate formable material between a template and a substrate with a projected image at a plane of the formable material.

Abstract: A method can be used to generate a fluid droplet pattern for an imprint lithography process using a fluid dispense system having fluid dispense ports. The method can include determining a fluid droplet pattern for dispensing a formable material onto a substrate, during a first pass, dispensing the formable material along a stitch line to form a first part of the fluid droplet pattern for an imprint field, where the stitch line runs from a first corner to a second corner of the imprint field. The method can also include offsetting the substrate and the fluid dispense ports relative to each other after dispensing the formable material during the first pass, and during a second pass, dispensing the formable material along the stitch line onto the substrate to form a second part of the fluid droplet pattern for the imprint field. An apparatus can be configured to carry out the method.

Abstract: A process, system, and method of manufacturing an article on a substrate having a fluid control feature. The fluid control feature may include at least one depressed region formed along an edge of an imprint field. Formable material is deposited in the imprint field of the substrate. A template is moved such that the template comes into contact with the formable material in the imprint field. While the template comes into contact with the formable material, the formable material may flow into the fluid control feature.

Abstract: A system and method of generating a drop pattern. The method may include receiving an initial drop pattern. The method may include receiving a target drop pattern exclusion edge for each of a plurality of locations. The method may include receiving one or more constraints of a dispensing system. The method may include generating a base drop pattern exclusion edge line based on the target drop pattern exclusion edge. The method may include generating a new drop pattern wherein drops deposited at an edge of the new drop pattern are positioned on integer multiples of the pitch constraint from the optimum base drop pattern exclusion edge line.

Abstract: A method of forming a cured layer on a substrate can include applying on the exterior surface of the substrate a first liquid film and subjecting the first liquid film to actinic radiation in at least one first region of the film. The actinic radiated region can modify the substrate surface such that the drop spreading of a region not subjected to actinic radiation is larger than the drop spreading in a region subjected to actinic radiation.

Abstract: An apparatus for imprint lithography can include a logic element configured to generate a fluid droplet pattern of fluid droplets of a formable material to be dispensed onto a substrate. The fluid droplet pattern includes an imprint field, wherein the imprint field has a side and a drop exclusion zone along the side, and the drop exclusion zone is narrower at a first point farther from the center of a side and wider at a second point closer to the center of the side. In another aspect, a method can be carried out using the apparatus. The apparatus and method can be useful in filling an imprint field with a formable material relatively quickly without extrusion defects or other complications.

Abstract: Systems for shaping a film by: depositing a formable material on a field of a substrate; and positioning a template relative to the field. The template has a mesa with a shaping surface and mesa sidewalls surround the shaping surface. The shaping may further comprise contacting the formable material with the shaping surface. The formable material may spread when the shaping surface is in contact with the formable material. The shaping may comprise exposing the formable material to a curing dose of actinic radiation after the formable material has spread to the edge of the field. A spatial distribution of the curing dose may be such that an interior dose applied at an interior of the field may be greater than a sidewall dose that is incident on the mesa sidewalls.

Abstract: An imprinting template, an imprinting system, and an imprinting method for imprinting a pattern in a formable material on a substrate. The template includes an edge region that surrounds a pattern region. A full height represents an absolute value of a distance between top surface and bottom surface of the pattern region. The edge region extends to an edge of a mesa of the template. A portion of the edge region may be at least a full height below the top surface of the pattern region. An area of the portion of the edge region may be at least large enough to prevent formable material that is between the template and the substrate from extruding out beyond the edge of the mesa.

Abstract: Systems and methods for shaping a film by: depositing a formable material on a field of a substrate; and positioning a template relative to the field. The template has a mesa with a shaping surface and mesa sidewalls surround the shaping surface. The shaping may further comprise contacting the formable material with the shaping surface. The formable material may spread when the shaping surface is in contact with the formable material. The shaping may comprise exposing the formable material to a curing dose of actinic radiation after the formable material has spread to the edge of the field. A spatial distribution of the curing dose may be such that an interior dose applied at an interior of the field may be greater than a sidewall dose that is incident on the mesa sidewalls.

Abstract: Systems and processes for analyzing an image. Analyzing the image may comprise selecting a computer vision parameter for an image feature identification process. The image feature identification process may identify at least one feature in the image when using the computer vision parameter. Analyzing the image may further comprise segmenting the image into a region of interest T and a background region B. Analyzing the image may further comprise calculating a set of statistical values about the region of interest T of the image. Analyzing the image may further comprise classifying the image based on both the computer vision parameter and the set of statistical values as one of either: a defect containing image or a defect free image.

Abstract: A template and method of using the template is disclosed. The template can include a body with a first side and a second side, and an extension. The extension can include a first surface adjacent the body, a second surface, and a third surface between the first surface and the second surface, where the first surface includes a curvature and where a portion of the curvature of the first surface is interior to the third surface. The method can include dispensing a formable material over a substrate, where the substrate includes a non-uniform surface topography. The method can also include curing the formable material contacting the second surface of the extension to form a layer over the substrate while the formable material contacting the third surface of the extension remains in a liquid state, wherein curing is performed while the template is contacting the formable material.

Abstract: Imprinting methods and imprinting systems configured to cure formable material between a substrate and a template. With a first spatial light modulator with a first set of modulation elements configured to expose the formable material between the substrate and the template to a first pattern of actinic radiation; and a second spatial light modulator with a second set of modulation elements configured to expose the formable material between the substrate and the template to a second pattern of actinic radiation. At a plane of the formable material, a first set of centers of the first pattern associated with centers of the first set of modulation elements may be offset from a second set of centers of the second pattern associated with centers of the second set of modulation elements.

Abstract: Control of lateral strain and lateral strain ratio (dt/db) between template and substrate through the selection of template and/or substrate thicknesses (Tt and/or Tb), control of template and/or substrate back pressure (Pt and/or Pb), and/or selection of material stiffness are described.