Patents by Inventor Edward D. Babich

Edward D. Babich has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Photolithographic etching process using organosilicon polymer composition
    Patent number: 4693960
    Abstract: A composition containing a polysiloxane having a polymerizable ethylenically unsaturated group, and 2,2-dimethoxy-2-phenyl acetophenone as an ultraviolet light sensitizer; and use thereof in lithography.
    Type: Grant
    Filed: November 7, 1986
    Date of Patent: September 15, 1987
    Assignee: International Business Machines Corporation
    Inventors: Edward D. Babich, Michael Hatzakis, John J. Liutkis, Juri R. Parasczak, Jane M. Shaw
  • Organosilicon compound and use thereof in photolithography
    Patent number: 4603195
    Abstract: A composition obtained by interracting a quinone diazo compound and an organosilicon compound; and use thereof in lithography.
    Type: Grant
    Filed: December 30, 1983
    Date of Patent: July 29, 1986
    Assignee: International Business Machines Corporation
    Inventors: Edward D. Babich, Michael Hatzakis, Jurij R. Paraszczak, Jane M. Shaw