Abstract: A polymerizable composition comprises a mixture of(A) a substance having at least one allyl- or methallyl-substituted bicyclo[2.2.1]-hept-5-ene-2,3-dicarboxylic acid imide residue, and(B) a substance having at least one polymerizable residue of formulaCH.sub.2 =C(R.sup.1)COO-- Iwhere R.sup.1 denotes a hydrogen atom or a methyl group.Typically, (A) is bis[4-(allylbicyclo[2.2.1]hept-5-ene-2,3-dicarboximidophenyl)]methane and (B) is an acrylate or methacrylate of a polyhydric alcohol. The compositions can be photopolymerized or heat-cured. They are suitable for use in prepreg manufacture and in image formation.

Abstract: A polymer having a molecular weight of at least 500 and containing at least one residue of formula I(--L.sup.1 --).sub.m Ar.sup.1 [X]--OSO.sub.2 --Ar.sup.2 (--L.sup.2 --).sub.n (I)whereone of m and n denotes 1 and the other denotes 0 or 1,X denotes either a group of formula II ##STR1## linked through the carbonyl group to an aromatic carbon atom in Ar.sup.1, ora group of formula III ##STR2## linked through the carbonyl groups to aromatic carbon atoms in Ar.sup.1, p denotes zero or 1,when p denotes zero, R.sup.1 denotes a hydrogen atom or a monovalent aliphatic, araliphatic or aromatic group,when p denotes 1, R.sup.1 denotes a hydrogen atom, a hydroxyl group, an etherified hydroxyl group, an acyloxy group, an alkyl group or a phenyl-substituted alkyl group,r.sup.2 denotes a hydrogen atom or a monovalent aliphatic, cycloaliphatic, heterocyclic, aromatic or araliphatic group,Ar.sup.1 denotes a monovalent, divalent or trivalent aromatic group,Ar.sup.2 denotes a monovalent or divalent aromatic group, andAr.sup.

Abstract: A method of making a metallic pattern on a substrate having a surface comprising bare metal in predetermined areas and metal coated by a resist in remaining areas comprises(i) protecting the bare metal by electrodepositing thereon a heat-curable polymeric film having (a) a group which is reactive with an isocyanate group and (b) a blocked isocyanate group,(ii) heating the electrodeposited polymeric film to render it resistant to a solvent with which the resist is removable,(iii) removing the resist from said remaining areas using a solvent which does not remove the electrodeposited polymeric film, thereby exposing metal in said remaining areas, and(iv) etching the metal exposed in step (iii) using an etchant which does not remove the electrodeposited polymeric film, thereby leaving a metallic pattern protected by the electrodeposited polymeric film, which can be removed subsequently using a solvent therefor.The method is useful in the production of printed circuits.

Abstract: A process for the formation of an image comprises(i) applying to a substrate a layer of a liquid composition comprising(A) a residue which is cationically polymerizable or polymerizable by means of free radicals,(B) a radiation-activated polymerization initiator for (A) and(C) a radiation-solubilizable residue,(ii) subjecting the composition to radiation having a wavelength at which (B) is activated but at which (C) is not substantially activated, optionally followed by heating, thereby polymerizing (A) such that the layer of liquid composition is solidified,(iii) subjecting the solidified layer in a predetermined pattern to radiation having a wavelength which is different from that of the radiation used in stage (ii) and at which the residue (C) is activated, such that the solidified layer is rendered more soluble in a developer in exposed areas than in unexposed areas, and(iv) removing the exposed areas by treatment with a developer.

Abstract: The invention provides a process for the production of an image which comprises(i) applying to a substrate a layer of a liquid composition comprising(A) a cationically polymerizable residue(B) a radiation-activated polymerization initator for (A)(C) a radiation-curable residue that is different from (A) and optionally(D) a radiation activated initiator for the cure of (C),(ii) subjecting the composition to actinic radiation having a wavelength at which initiator (B) is activated but at which the residue (C) and/or initiator (D) is not substantially activated, followed by heating, if necessary, so that (A) is polymerized and the layer of liquid composition is solidified, but remains curable,(iii) subjecting the solidified layer in a predetermined pattern to actinic radiation having a wavelength that is different from that of the radiation used in stage (ii) and at which the radiation-curable residue (C) and/or the initiator (D) is activated, such that in the exposed areas (C) is substantially cured, and(iv) re

Abstract: An electrodepositable photosensitive resin which is a phenolic novolak resin having(i) at least part of the phenolic hydroxyl groups thereof replaced by a quinone diazide sulphonyloxy group, and(ii) at least part of the aromatic rings thereof substituted in a position ortho and/or para to a phenolic hydroxyl group or quinone diazide sulphonyloxy group by a group of formula --CH(R.sup.1)R.sup.2 whereR.sup.1 represents a hydrogen atom, or an alkyl, aryl or carboxylic acid group, andR.sup.2 represents a sulphonic acid group --SO.sub.3 H or a group of formula --A--R.sup.3 --X,R.sup.3 represents an aliphatic, aromatic or araliphatic divalent group which may be substituted by a carboxlic, sulphonic or phosphonic acid group,A represents a sulphur atom or a group of formula --N(R.sup.4)--, where R.sup.4 represents a hydrogen atom or an alkyl group which may be substituted by a carboxylic acid group or by an optionally etherified hydroxyl group, or R.sup.3 and R.sup.

Abstract: Curable compositions, especially suitable for use as adhesives, contain(A) an anaerobically polymerizable mixture which is stable in oxygen but polymerizes when oxygen is excluded, comprising(i) a free radical polymerizable compound, such as an acrylate or methacrylate ester,(ii) an organic free radical initiator, such as a peroxide or hydroperoxide, and(iii) an organic accelerator of free radical polymerization(B) an epoxide resin, and(C) a curing agent for epoxide resins that is a basic curing agent, a polymercaptan, or a polyhydric phenol.These compositions cure rapidly by an araerobic curing mechanism and then develop high strength by cure of the epoxide resin.

Abstract: Coated, reinforced composites are prepared by a process in which(i) a liquid composition comprising a photocurable residue and a residue having at least one epoxide group or phenolic hydroxyl group is applied to the surface of a mould,(ii) the composition is exposed to actinic radiation until it solidifies,(iii) reinforcement and a thermosettable composition are applied to the solidified layer, this composition containing an epoxide resin or a phenolic resin,(iv) the assembly is heated to form a cured moulding, and(v) the moulding is removed from the mould.

Abstract: Curable compositions, especially suitable for use as adhesives, contain(A) an anaerobically polymerisable mixture which is stable in oxygen but polymerises when oxygen is excluded, comprising(i) a free radical polymerisable compound, such as an acrylate or methacrylate ester,(ii) an organic free radical initiator, such as a peroxide or hydroperoxide, and(iii) an organic accelerator of free radical polymerisation(B) an epoxide resin, and(C) a curing agent for epoxide resins that is a basic curing agent, a polymercaptan, or a polyhydric phenol.These compositions cure rapidly by an anaerobic curing mechanism and then develop high strength by cure of the epoxide resin.

Abstract: The present invention provides a method for making a metallic pattern on a substrate having a surface comprising bare metal in predetermined areas and metal coated by a resist in remaining areas which comprises (i) protecting the bare metal by electrodepositing a resin thereon, (ii) while leaving the electrodeposited resin substantially uncured, removing the resist from said remaining areas using a solvent which will not remove the electrodeposited resin, thereby exposing metal in said remaining areas, (iii) etching the metal exposed in (ii) using an etchant which does not remove the electrodeposited resin, and (iv) removing the electrodeposited resin with a suitable solvent.

Abstract: An electrodepositable photosensitive modified phenolic novolak resin of general formula ##STR1## where Ar.sup.1 represents a divalent aromatic group linked through aromatic carbon atoms to the indicated groups --OR.sup.2 and --CH(R.sup.1)--,Ar.sup.2 represents a trivalent aromatic group linked through aromatic carbon atoms to the indicated groups --OR.sup.2 and --CH(R.sup.1)--,R.sup.1 represents a hydrogen atom or an alkyl, aryl or carboxyl group,R.sup.2 represents a hydrogen atom, an alkyl group which may be substituted by a hydroxyl or alkoxy group, or a group of formula --CO--R.sup.3 --COOH, --SO.sub.2 R.sup.4, --COR.sup.5 or --SO.sub.2 R.sup.5, at least 1% of the groups R.sup.2 representing a group --CO--R.sup.3 --COOH and at least 4% of the groups R.sup.2 representing a group --SO.sub.2 R.sup.4,R.sup.3 denotes a divalent aliphatic, cycloaliphatic, aromatic or araliphatic group,R.sup.4 denotes a 1,2-benzoquinone diazide group or 1,2-naphthoquinone diazide groupR.sup.

Abstract: Metallic surfaces, especially of ferrous metals, are coated by passing an electric current at a voltage of at least 15 V between the metallic surface as anode and a cathode in contact with a composition comprising(A) an epoxide resin, and(B) a salt of formula ##STR1## where A.sup.y+ denotes a cation which is a metal, a metal complex an organometallic, a heterocycle, a sulphoxonium, ammonium, a substituted ammonium or a phosphonium ion,y denotes 1, 2, or 3,Z.sup.- denotes an anion selected from perchlorate, trifluoromethane sulphonate pentafluorohydroxoantimonate, and the complex anions of formula MQ.sub.d.sup.-,M represents a boron, phosphorus, antimony or arsenic atomQ represents a halogen atom, andd is 4 or 6 and is one more than the valency of M, whereby polymerized epoxide resin is deposited on the metallic surface.

Abstract: A layer of a liquid composition containing a residue that is polymerizable on contact with a gaseous polymerizing agent and a photocurable residue, which residues may be on the same or different molecules, is contained with a gaseous polymerizing agent so that the layer solidifies but remains photocurable. Subsequently the solidified layer is exposed to actinic radiation in a predetermined pattern and those parts of the layer that are not photocured are removed by treatment with a suitable solvent.Typical polymerizable residues include cyanoacrylates that polymerize on exposure to water vapor, ammonia, or an amine. Typical photocurable residues include acrylates, and methacrylates.The process is suitable for the manufacture of printing plates and printed circuits.

Abstract: A process for the production of an image on a substrate comprises(i) inserting the substrate as an electrode into a liquid composition comprising(A) a cationically polymerizable material,(B) a polymerizing agent for (A) which is activated by an electric current, and(C) a photosensitive material,(ii) passing an electric current through the liquid composition between the substrate and another electrode, such that a photosensitive layer of essentially solid, polymerized material is deposited on the surface of the substrate,(iii) removing the substrate from the liquid composition,(iv) exposing the photosensitive layer to actinic radiation in a predetermined pattern so as to effect a difference in solubility between exposed parts and unexposed parts of the layer, and(v) removing more soluble parts of the layer by treatment with a solvent, leaving less soluble parts of the layer on the substrate.

Abstract: A positive photoresist is electrodeposited onto a substrate, exposed to actinic radiation in a predetermined pattern, and then exposed areas are removed by contact with a developer.When the substrate is a metal-faced laminate, the exposed metal surface may be etched and the residual electrodeposited layer removed by contact with a suitable solvent, optionally after a second, general, exposure to actinic radiation.Suitable electrodepositable positive photoresists include o-nitrocarbinol esters and o-nitrophenyl acetals, their polyesters and end-capped derivatives and quinone diazide sulphonyl esters of phenolic novolaks, having salt-forming groups in the molecule, especially carboxylic acid and amine groups.The process is suitable for the production of printing plates and printed circuits, especially circuits on both sides of a liminate sheet linked conductively through metal-lined holes in the sheet.

Abstract: Positive images are produced by (i) exposing to actinic radiation in a predetermined pattern a composition supported on a substrate, which composition comprises a film-forming organic material and a substance which releases a sulphonic acid on exposure to actinic radiation, thereby rendering the composition more soluble in the developer in the exposed areas than the unexposed areas, and (ii) treating the composition with the aqueous base developer to remove the unexposed areas. The image-forming process may be used in the production of printing plates and electrical circuits.

Abstract: A polymerizing agent is applied to a substrate followed by a layer of a liquid composition containing both a polymerizable residue and a photocurable residue. The polymerizable residue is polymerized by the polymerizing agent first applied so that the layer solidifies but remains photocurable. Subsequently this solidified layer is exposed to actinic radiation in a predetermined pattern and those parts of the layer that are not photocured are removed by treatment with a suitable solvent.Typical polymerizable residues include cyanoacrylates, the polymerizing agents for which may be water, ammonium hydroxide solution, an alkali metal hydroxide solution, or an amine. Typical photocurable residues include acrylates and methacrylates.The process is suitable for the manufacture of printing plates and printed circuits.

Abstract: Cationically polymerizable materials, such as epoxide resins, phenoplasts, and aminoplasts, are polymerized by passing an electric current through a composition comprising(A) the cationically polymerizable material, and(B) a boron trifluoride complex,between an anode and a cathode in contact with the composition, whereby polymerized material is deposited on the anode.Typical complexes (B) are those of boron trifluoride with primary, secondary, or tertiary amines or with trialkyl or triaryl phosphines.The method is a particularly suitable means for coating conductive substrates, giving a rapid cure without the need for special formulations to render the polymers electrodepositable.

Abstract: Polymerizable compositions contain (A) a cationically polymerizable material, such as an epoxide resin, a phenoplast or a cyclic vinyl ether, (B) a hydroxy compound such as styreneallyl alcohol copolymer, and (c) an aromatic iodosyl salt of formula ##STR1## where R.sup.3 and R.sup.4, which may be the same or different, each represent a monovalent aromatic radical having from 4 to 25 carbon atoms, x denotes 1, 2 or 3, and Z.sup.x- denotes an x-valent anion of a protic acid.Suitable salts of formula II include diphenyliodosyl hexafluorophosphate and tetrafluoroborate. The compositions may be photopolymerized or they may be thermally polymerized in the presence, as catalyst for the iodosyl salt, of a salt or complex of a d-block transition metal, a stannous salt, an organic peroxide or an activated .alpha.-hydroxy compound.The compositions may be used as surface coatings and adhesives, and in the preparation of printing plates, printed circuits and reinforced composites.

Abstract: Compositions that may be irradiated to form positive images useful in the manufacture of printing plates and printed circuits comprise(i) an organic solvent-soluble, radiation sensitive prepolymer which is a polyaddition or polycondensation product of a polyfunctional carbocyclic or heterocyclic compound containing at least 2 groups R capable of undergoing an addition or condensation reaction, and at least one polyfunctional carbocyclic or heterocyclic compound having at least 2 groups capable of adding to, or condensing with the groups R, this prepolymer having at least one group --COOR.sup.1 in the ortho- or peri- position to a group formed by reaction of a group R, where R.sup.1 is an organic radical with one or more double or triple bonds capable of being dimerized or polymerized by radiation-induction, and(ii) 1-25% by weight of an unsaturated mono- or di- carboxylic acid of formula ##STR1## where R.sup.2 is --H or --CH.sub.3 andR.sup.