Patents by Inventor Edward J. Kramer
Edward J. Kramer has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10186661Abstract: A method for enhancing charge carrier mobility of a field-effect transistor device. The method comprises generating uniaxial nanogrooves on a substrate and blade coating a solution comprising a semiconducting polymer onto the substrate. The polymer solution is spread onto the substrate in a direction parallel to the nanogrooves and a main-chain axis of the polymer is parallel to the nanogrooves. The semiconducting polymer can be then annealed, so that a polymer film is formed which is layered on top of the substrate, with polymer chains aligned parallel to a direction of charge carrier movement.Type: GrantFiled: March 2, 2016Date of Patent: January 22, 2019Assignee: The Regents of the University of CaliforniaInventors: Shrayesh N. Patel, Edward J. Kramer, Michael L. Chabinyc, Chan Luo, Alan J. Heeger
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Publication number: 20160260900Abstract: A method for enhancing charge carrier mobility of a field-effect transistor device. The method comprises generating uniaxial nanogrooves on a substrate and blade coating a solution comprising a semiconducting polymer onto the substrate. The polymer solution is spread onto the substrate in a direction parallel to the nanogrooves and a main-chain axis of the polymer is parallel to the nanogrooves. The semiconducting polymer can be then annealed, so that a polymer film is formed which is layered on top of the substrate, with polymer chains aligned parallel to a direction of charge carrier movement.Type: ApplicationFiled: March 2, 2016Publication date: September 8, 2016Applicants: The Regents of the University of California, Mitsubishi Chemical CorporationInventors: Shrayesh N. Patel, Edward J. Kramer, Michael L. Chabinyc, Chan Luo, Alan J. Heeger
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Patent number: 9388326Abstract: The invention provides compositions and methods for inducing and enhancing order and nanostructures in organosilicon block copolymers compositions by including certain organic additives in such compositions that include one or more moieties comprising a hydrogen bond acceptor or a hydrogen bond donor. Such block copolymer compositions may be used, for example, as a mask for lithographic patterning as is used, for example, during various stages of semiconductor device fabrication.Type: GrantFiled: September 9, 2015Date of Patent: July 12, 2016Assignee: The Regents of the University of CaliforniaInventors: Damien Montarnal, Craig J. Hawker, Edward J. Kramer, Glenn H. Fredrickson
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Patent number: 9315637Abstract: Junction-functionalized block copolymers can be used in forming nanostructures. A junction-functionalized block copolymer can include a first polymer block joined to a second polymer block by a junction, where the junction includes one or more electrostatically charged moieties. The block copolymer can include a moiety of formula (I): A-J-B??(I) where A is a first polymer block, B is a second polymer block, where the A block and the B block are chemically dissimilar, and J is a junction linking the A block to the B block, and including one or more electrostatically charged moieties.Type: GrantFiled: December 17, 2014Date of Patent: April 19, 2016Assignee: The Regents of the University of CaliforniaInventors: Damien Montarnal, Yingdong Luo, Craig J. Hawker, Edward J. Kramer, Glenn H. Frederickson
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Publication number: 20150376455Abstract: The invention provides compositions and methods for inducing and enhancing order and nanostructures in organosilicon block copolymers compositions by including certain organic additives in such compositions that include one or more moieties comprising a hydrogen bond acceptor or a hydrogen bond donor. Such block copolymer compositions may be used, for example, as a mask for lithographic patterning as is used, for example, during various stages of semiconductor device fabrication.Type: ApplicationFiled: September 9, 2015Publication date: December 31, 2015Applicant: THE REGENTS OF THE UNIVERSITY OF CALIFORNIAInventors: Damien Montarnal, Craig J. Hawker, Edward J. Kramer, Glenn H. Fredrickson
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Patent number: 9158200Abstract: The invention provides compositions and methods for inducing and enhancing order and nanostructures in organosilicon block copolymers compositions by including certain organic additives in such compositions that include one or more moieties comprising a hydrogen bond acceptor or a hydrogen bond donor. Such block copolymer compositions may be used, for example, as a mask for lithographic patterning as is used, for example, during various stages of semiconductor device fabrication.Type: GrantFiled: January 13, 2014Date of Patent: October 13, 2015Assignee: The Regents of the University of CaliforniaInventors: Damien Montarnal, Craig J. Hawker, Edward J. Kramer, Glenn H. Fredrickson
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Publication number: 20150197607Abstract: Junction-functionalized block copolymers can be used in forming nanostructures. A junction-functionalized block copolymer can include a first polymer block joined to a second polymer block by a junction, where the junction includes one or more electrostatically charged moieties. The block copolymer can include a moiety of formula (I): A-J-B??(I) where A is a first polymer block, B is a second polymer block, where the A block and the B block are chemically dissimilar, and J is a junction linking the A block to the B block, and including one or more electrostatically charged moieties.Type: ApplicationFiled: December 17, 2014Publication date: July 16, 2015Inventors: Damien Montarnal, Yingdong Luo, Craig J. Hawker, Edward J. Kramer, Glenn H. Fredrickson
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Patent number: 8993672Abstract: Polyolefin block and graft copolymers comprised of two or more semicrystalline polyolefin blocks or grafts and one or more amorphous polyolefin blocks can be blended with a low molecular weight fluid diluent that preferentially locates within and swells the amorphous domains of the block or graft copolymer, while preserving the crystallinity of the semicrystalline block domains. After mechanical or thermomechanical processing, such compositions combine softness with high strength and high recoverable elasticity. Compositions are also disclosed whereby the diluent species is removed from the composition, either before or after the mechanical or thermomechanical processing, in order to create a strong elastic material with an ultra-low entanglement density within the amorphous domains.Type: GrantFiled: April 8, 2008Date of Patent: March 31, 2015Assignee: The Regents of the University of CaliforniaInventors: Glenn H. Fredrickson, Edward J. Kramer, Zhigang Wang
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Patent number: 8911639Abstract: A polymer electrolyte composition including a metal salt and at least one polymer comprising a poly(glycidyl ether), where the at least one polymer is amorphous at ambient temperature. The poly(glycidyl ether) polymer can be a blend of poly(glycidyl ether) polymers, can be a poly(glycidyl ether) polymer blended with a mechanically strong solid polymer, and can be a block of a block copolymer that also includes a polymer block forming a mechanically strong solid polymer.Type: GrantFiled: December 16, 2011Date of Patent: December 16, 2014Assignee: The Regents of the University of CaliforniaInventors: Nathaniel A. Lynd, Glenn H. Fredrickson, Craig J. Hawker, Edward J. Kramer, Kate Barteau
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Publication number: 20140197133Abstract: The invention provides compositions and methods for inducing and enhancing order and nanostructures in organosilicon block copolymers compositions by including certain organic additives in such compositions that include one or more moieties comprising a hydrogen bond acceptor or a hydrogen bond donor. Such block copolymer compositions may be used, for example, as a mask for lithographic patterning as is used, for example, during various stages of semiconductor device fabrication.Type: ApplicationFiled: January 13, 2014Publication date: July 17, 2014Inventors: Damien Montarnal, Craig J. Hawker, Edward J. Kramer, Glenn H. Fredrickson
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Publication number: 20120326073Abstract: A polymer electrolyte composition including a metal salt and at least one polymer comprising a poly(glycidyl ether), where the at least one polymer is amorphous at ambient temperature. The poly(glycidyl ether) polymer can be a blend of poly(glycidyl ether) polymers, can be a poly(glycidyl ether) polymer blended with a mechanically strong solid polymer, and can be a block of a block copolymer that also includes a polymer block forming a mechanically strong solid polymer.Type: ApplicationFiled: December 16, 2011Publication date: December 27, 2012Inventors: Nathaniel A. Lynd, Glenn H. Fredrickson, Craig J. Hawker, Edward J. Kramer, Kate Barteau
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Publication number: 20110097559Abstract: A polymeric composition and method of preparation for application in sub-micron lithography, comprising a blend of A-B and B?-C block, random, branched, or graft copolymers, where: (i) the B and B? blocks or grafts have attractive supramolecular interactions characterized by a negative Flory-Huggins parameter; (ii) the composition exhibits a microphase-separated, three-domain morphology with A, C, and B/B? domains comprised largely of A blocks or grafts, C blocks or grafts, and a mixture of B and B? blocks or grafts, respectively. Long-range ordering of nanometer-scale domain features has been achieved in thin films of such supramolecular polymer blends, while avoiding macrophase separation. The strategy offers a diversity of morphologies for sub-micron lithographic applications in tandem with ease of chemical synthesis.Type: ApplicationFiled: May 7, 2009Publication date: April 28, 2011Inventors: Craig J. Hawker, Chuanbing Tang, Edward J. Kramer, Glenn Fredrickson
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Patent number: 7754832Abstract: A method of preparing a polymer having a tapered block copolymer structure. The method comprises polymerizing a first olefin monomer and a different second olefin monomer in the presence of a catalyst supporting living or quasi-living polymerization. In certain embodiments, the catalyst comprises two neutral metal complexes. In preferred embodiments, a tapered block copolymer structure is formed by adding one monomer in a single batch at the start of the polymerization reaction, and adding a second monomer throughout the course of the reaction. The present invention also provides polymers having one or more tapered block copolymer sections, and compositions based on these polymers.Type: GrantFiled: August 19, 2005Date of Patent: July 13, 2010Assignee: The Regents of the University of CaliforniaInventors: Guillermo C. Bazan, Steve Diamanti, Edward J. Kramer, Vikram Khanna, Glenn H. Frederickson, Atsushi Hotta
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Patent number: 7470954Abstract: A method and resultant device, in which metal nanoparticles are self-assembled into two-dimensional lattices. A periodic hole pattern (wells) is fabricated on a photoresist substrate, the wells having an aspect ratio of less than 0.37. The nanoparticles are synthesized within inverse micelles of a polymer, preferably a block copolymer, and are self-assembled onto the photoresist nanopatterns. The nanoparticles are selectively positioned in the holes due to the capillary forces related to the pattern geometry, with a controllable number of particles per lattice point.Type: GrantFiled: November 14, 2005Date of Patent: December 30, 2008Assignee: The Regents of the University of CaliforniaInventors: Seung-Heon Lee, Frédéric S. Diana, Antonio Badolato, Pierre M. Petroff, Edward J. Kramer
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Publication number: 20080319116Abstract: Polyolefin block and graft copolymers comprised of two or more semicrystalline polyolefin blocks or grafts and one or more amorphous polyolefin blocks can be blended with a low molecular weight fluid diluent that preferentially locates within and swells the amorphous domains of the block or graft copolymer, while preserving the crystallinity of the semicrystalline block domains. After mechanical or thermomechanical processing, such compositions combine softness with high strength and high recoverable elasticity. Compositions are also disclosed whereby the diluent species is removed from the composition, either before or after the mechanical or thermomechanical processing, in order to create a strong elastic material with an ultra-low entanglement density within the amorphous domains.Type: ApplicationFiled: April 8, 2008Publication date: December 25, 2008Inventors: Glenn H. Fredrickson, Edward J. Kramer, Zhigang Wang
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Patent number: 7432311Abstract: A “high internal phase polymeric emulsion” (“HIPPE”) composition is described which comprises an emulsion of a discrete phase (component A) and a continuous phase (component B), wherein the volume fraction of the discrete phase is the majority fraction (on a volume basis) of the total volume of the emulsion. A compatibilizer, component C, is used to lower the interfacial tension between the phases containing components A and B. A process is described for creating such HIPPE composition in which the A component is a colloidal polymer particle.Type: GrantFiled: March 18, 2005Date of Patent: October 7, 2008Assignee: The Regents of the University of CaliforniaInventors: Raffaele Mezzenga, Glenn H. Fredrickson, Edward J. Kramer
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Patent number: 6989324Abstract: A method and resultant device, in which metal nanoparticles are self-assembled into two-dimensional lattices. A periodic hole pattern (wells) is fabricated on a photoresist substrate, the wells having an aspect ratio of less than 0.37. The nanoparticles are synthesized within inverse micelles of a polymer, preferably a block copolymer, and are self-assembled onto the photoresist nanopatterns. The nanoparticles are selectively positioned in the holes due to the capillary forces related to the pattern geometry, with a controllable number of particles per lattice point.Type: GrantFiled: January 15, 2004Date of Patent: January 24, 2006Assignee: The Regents of the University of CaliforniaInventors: Seung-Heon Lee, Frédéric S. Diana, Antonio Badolato, Pierre M. Petroff, Edward J. Kramer
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Patent number: 6233838Abstract: A portable cartridge loading apparatus for holding, locating, and individually dispensing electrical junction boxes. The apparatus includes a positioning apparatus for locating the loader on a predetermined building element or stud. The apparatus has devices to locate each junction box in a predetermined depth and height location on each wall, at least two different height locations. The different height installation of each junction box is achieved without setting any other location device, other than repositioning the loading device in a second attitude on the building element or stud.Type: GrantFiled: November 12, 1998Date of Patent: May 22, 2001Inventors: Robert L. Falwell, Edward J. Kramer, George H. Banker, Donald L. Masho, Ira G. Goltz
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Patent number: 6114467Abstract: Compounds having the formula F(CF.sub.2).sub.q --(CH.sub.2).sub.p-1 --COX' wherein q ranges from 6-15, p ranges from 3-15 and X' is halogen are useful as reactants for hydroxylated block copolymers or polyamines to produce fluorinated polymers.Type: GrantFiled: August 11, 1998Date of Patent: September 5, 2000Assignee: Cornell Research Foundation, Inc.Inventors: Christopher K. Ober, Jianguo Wang, Edward J. Kramer
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Patent number: 5907017Abstract: Fluorinated polymers for use per se or in a blend with compatible homopolymer or copolymer which is not fluorinated, for providing a low surface energy (anti-stick, non-wetting, low friction) surface which is stable on immersion in water, has a weight average molecular weight ranging from 10.sup.3 to 10.sup.6 and comprises backbone containing (a) methylene groups and (b) side chain bearing groups with side chain on each side chain bearing group having the formula --Q--(CF.sub.2).sub.q F wherein Q comprises alkylene moiety and wherein the fluoroalkyl group attached to Q is spaced by r atoms from the atom in the backbone to which Q is attached, wherein q ranges from 6 to 15, r ranges from 6 to 18, and the ratio of q to r ranges from 0.6:1 to 1.8:1. Preferred fluorinated polymers include semifluorinated block copolymers of modified isoprene and styrene and semifluorinated ionenes.Type: GrantFiled: January 31, 1997Date of Patent: May 25, 1999Assignee: Cornell Research Foundation, Inc.Inventors: Christopher K. Ober, Jianguo Wang, Edward J. Kramer