Abstract: A system permits wirelessly controlling the duty cycle of alternating current at a wall electrical outlet (152) remote from a wall electrical outlet (144) which is controlled by a wall switch (142).

Abstract: A system permits wirelessly controlling the duty cycle of alternating current at a wall electrical outlet (152) remote from a wall electrical outlet (144) which is controlled by a wall switch (142).

Abstract: A system permits wirelessly controlling the duty cycle of alternating current at a wall electrical outlet (152) remote from a wall electrical outlet (144) which is controlled by a wall switch (142).

Abstract: A system permits wirelessly controlling the duty cycle of alternating current at a wall electrical outlet (152) remote from a wall electrical outlet (144) which is controlled by a wall switch (142).

Abstract: An ion source is disclosed for use in fabrication of semiconductors. The ion source includes an electron emitter that includes a cathode mounted external to the ionization chamber for use in fabrication of semiconductors. In accordance with an important aspect of the invention, the electron emitter is employed without a corresponding anode or electron optics. As such, the distance between the cathode and the ionization chamber can be shortened to enable the ion source to be operated in an arc discharge mode or generate a plasma. Alternatively, the ion source can be operated in a dual mode with a single electron emitter by selectively varying the distance between the cathode and the ionization chamber.

Abstract: An ion source is disclosed for use in fabrication of semiconductors. The ion source includes an electron emitter that includes a cathode mounted external to the ionization chamber for use in fabrication of semiconductors. In accordance with an important aspect of the invention, the electron emitter is employed without a corresponding anode or electron optics. As such, the distance between the cathode and the ionization chamber can be shortened to enable the ion source to be operated in an arc discharge mode or generate a plasma. Alternatively, the ion source can be operated in a dual mode with a single electron emitter by selectively varying the distance between the cathode and the ionization chamber.

Abstract: A method and system for facilitating the purchase of electricity between static provider (e.g, an Outlet Owner (OO)) and dynamic/mobile customer (e.g., a Plug Holder (PH)). The system can create open-market, real-time rate and cost determinations based on the conditions of a Charging Instance (CI) and other electricity transfers. In an embodiment, the invention can provide a Transaction Center configured to receive Charging Instance information over communications links. The Transaction Center can include computers and storage devices configured to process Charging Instance data and reconcile accounts of Plug Holders and Outlet Owners. The Transaction Center can be configured to determine the cost of electricity for a particular outlet and a particular plug. Promotional and market data can be used to calculate the cost. Clusters of outlets and groups of Plug Holders can be established. The Transaction Center can perform heuristic analysis of the data associated with a collection of Charging Instances.

Abstract: An ion source is disclosed for use in fabrication of semiconductors. The ion source includes an electron emitter that includes a cathode mounted external to the ionization chamber for use in fabrication of semiconductors. In accordance with an important aspect of the invention, the electron emitter is employed without a corresponding anode or electron optics. As such, the distance between the cathode and the ionization chamber can be shortened to enable the ion source to be operated in an arc discharge mode or generate a plasma. Alternatively, the ion source can be operated in a dual mode with a single electron emitter by selectively varying the distance between the cathode and the ionization chamber.

Abstract: An ion source is disclosed which includes a gas reaction chamber. The invention also includes a method of converting a gaseous feed material into a tetramer, dimer, other molecule or atomic species by supplying the feed material to the gas reaction chamber wherein the feed material is converted to the appropriate gas species to be supplied to the ion source and ionized. More particularly, the gas reaction chamber is configured to receive hydride and other feed materials in gaseous form, such as, AsH3 or PH3, and generate various molecular and atomic species for use in ion implantation, heretofore unknown. In one embodiment of the invention, the gas is relatively uniformly heated to provide relatively accurate control of the molecular or atomic species generated. In an alternate embodiment of the invention, the gas reaction chamber uses a catalytic surface to convert the feed gas into the different source gas specie required for implantation, such as, hydrides into tetramer molecules.

Abstract: An ion source is disclosed for use in fabrication of semiconductors. The ion source includes an electron emitter that includes a cathode mounted external to the ionization chamber for use in fabrication of semiconductors. In accordance with an important aspect of the invention, the electron emitter is employed without a corresponding anode or electron optics. As such, the distance between the cathode and the ionization chamber can be shortened to enable the ion source to be operated in an arc discharge mode or generate a plasma. Alternatively, the ion source can be operated in a dual mode with a single electron emitter by selectively varying the distance between the cathode and the ionization chamber.