Patents by Inventor Edward Remsen

Edward Remsen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8460507
    Abstract: Chemical-mechanical polishing (CMP) systems comprising apparatus and methods which allow the physical and chemical characteristics of a CMP slurry to be monitored during the polishing process, both on the pad and in the fresh slurry, are provided. The methods and apparatus of the invention also furnish the CMP operator with real-time information about the polishing process, which can provide insight into various chemical and physical mechanisms involved in chemical-mechanical polishing. The data provided by the sensors also make available valuable information about the stability and reproducibility of the particular CMP process being observed.
    Type: Grant
    Filed: September 3, 2008
    Date of Patent: June 11, 2013
    Assignee: Cabot Microelectronics Corporation
    Inventors: Clifford Spiro, Edward Remsen, Thomas Werts
  • Publication number: 20100187200
    Abstract: Chemical-mechanical polishing (CMP) systems comprising apparatus and methods which allow the physical and chemical characteristics of a CMP slurry to be monitored during the polishing process, both on the pad and in the fresh slurry, are provided. The methods and apparatus of the invention also furnish the CMP operator with real-time information about the polishing process, which can provide insight into various chemical and physical mechanisms involved in chemical-mechanical polishing. The data provided by the sensors also make available valuable information about the stability and reproducibility of the particular CMP process being observed.
    Type: Application
    Filed: September 3, 2008
    Publication date: July 29, 2010
    Inventors: Clifford Spiro, Edward Remsen, Thomas Werts