Patents by Inventor Edwin A. Pell, III

Edwin A. Pell, III has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method and apparatus for improving resolution of objects in a semiconductor wafer
    Patent number: 6835991
    Abstract: A method and apparatus for creating objects on a semiconductor wafer includes a mask/reticle having a substantially uniform pattern of features. The wafer is illuminated through the mask/reticle to create a corresponding uniform pattern of objects on the wafer. Selected objects created by the uniform pattern of features are then utilized to provide desired electrical functions on the integrated circuit. In one embodiment of the invention, the objects are interconnect wires formed by a mask or reticle having a substantially uniform pattern of strips that extends over an area of the integrated circuit. Interconnect wires of different lengths are created by defining endpoints on the strips or by exposing areas on the wafer corresponding to the endpoints of the wires.
    Type: Grant
    Filed: November 7, 2002
    Date of Patent: December 28, 2004
    Inventor: Edwin A. Pell, III
  • Method and apparatus for improving resolution of objects in a semiconductor wafer
    Patent number: 6524870
    Abstract: A method and apparatus for creating objects on a semiconductor wafer includes a mask/reticle having a substantially uniform pattern of features. The wafer is illuminated through the mask/reticle to create a corresponding uniform pattern of objects on the wafer. Selected objects created by the uniform pattern of features are then utilized to provide desired electrical functions on the integrated circuit. In one embodiment of the invention, the objects are interconnect wires formed by a mask or reticle having a substantially uniform pattern of strips that extends over an area of the integrated circuit. Interconnect wires of different lengths are created by defining endpoints on the strips or by exposing areas on the wafer corresponding to the endpoints of the wires.
    Type: Grant
    Filed: April 24, 2001
    Date of Patent: February 25, 2003
    Inventor: Edwin A. Pell, III
  • METHOD AND APPARATUS FOR IMPROVING RESOLUTION OF OBJECTS IN A SEMICONDUCTOR WAFER
    Publication number: 20020155387
    Abstract: A method and apparatus for creating objects on a semiconductor wafer includes a mask/reticle having a substantially uniform pattern of features. The wafer is illuminated through the mask/reticle to create a corresponding uniform pattern of objects on the wafer. Selected objects created by the uniform pattern of features are then utilized to provide desired electrical functions on the integrated circuit. In one embodiment of the invention, the objects are interconnect wires formed by a mask or reticle having a substantially uniform pattern of strips that extends over an area of the integrated circuit. Interconnect wires of different lengths are created by defining endpoints on the strips or by exposing areas on the wafer corresponding to the endpoints of the wires.
    Type: Application
    Filed: April 24, 2001
    Publication date: October 24, 2002
    Applicant: Mentor Graphics Corporation
    Inventor: Edwin A. Pell III