Patents by Inventor Edwin Johannes Maria Janssen
Edwin Johannes Maria Janssen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10613445Abstract: A diagnostic apparatus monitors a lithographic manufacturing system. First measurement data representing local deviations of some characteristic across a substrate is obtained using sensors within a lithographic apparatus, and/or a separate metrology tool. Other inspection tools perform substrate backside inspection to produce second measurement data. A high-resolution backside defect image is processed into a form in which it can be compared with lower resolution information from the first measurement data. Cross-correlation is performed to identify which of the observed defects are correlated spatially with the deviations represented in the first measurement data. A correlation map is used to identify potentially relevant clusters of defects in the more detailed original defect map. The responsible apparatus can be identified by pattern recognition as part of an automated root cause analysis. Alternatively, reticle inspection data may be used as second measurement data.Type: GrantFiled: March 25, 2019Date of Patent: April 7, 2020Assignee: ASML Netherlands B.V.Inventors: Marc Hauptmann, Dylan John David Davies, Paul Janssen, Naoko Tsugama, Richard Joseph Bruls, Kornelis Tijmen Hoekerd, Edwin Johannes Maria Janssen, Petrus Johannes Van Den Oever, Ronald Van Der Wilk, Antonius Hubertus Van Schijndel, Jorge Alberto Vieyra Salas
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Publication number: 20190219929Abstract: A diagnostic apparatus monitors a lithographic manufacturing system. First measurement data representing local deviations of some characteristic across a substrate is obtained using sensors within a lithographic apparatus, and/or a separate metrology tool. Other inspection tools perform substrate backside inspection to produce second measurement data. A high- resolution backside defect image is processed into a form in which it can be compared with lower resolution information from the first measurement data. Cross-correlation is performed to identify which of the observed defects are correlated spatially with the deviations represented in the first measurement data. A correlation map is used to identify potentially relevant clusters of defects in the more detailed original defect map. The responsible apparatus can be identified by pattern recognition as part of an automated root cause analysis. Alternatively, reticle inspection data may be used as second measurement data.Type: ApplicationFiled: March 25, 2019Publication date: July 18, 2019Applicant: ASML NETHERLANDS B.V.Inventors: Marc Hauptmann, Dylan John David Davies, Paul Janssen, Naoko Tsugama, Richard Joseph Bruls, Kornelis Tijmen Hoekerd, Edwin Johannes Maria Janssen, Petrus Johannes Van Den Oever, Ronald Van Der Wilk, Antonius Hubertus Van Schijndel, Jorge Alberto Vieyra Salas
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Patent number: 10241418Abstract: A diagnostic apparatus monitors a lithographic manufacturing system. First measurement data representing local deviations of some characteristic across a substrate is obtained using sensors within a lithographic apparatus, and/or a separate metrology tool. Other inspection tools perform substrate backside inspection to produce second measurement data. A high-resolution backside defect image is processed into a form in which it can be compared with lower resolution information from the first measurement data. Cross-correlation is performed to identify which of the observed defects are correlated spatially with the deviations represented in the first measurement data. A correlation map is used to identify potentially relevant clusters of defects in the more detailed original defect map. The responsible apparatus can be identified by pattern recognition as part of an automated root cause analysis. Alternatively, reticle inspection data may be used as second measurement data.Type: GrantFiled: September 21, 2015Date of Patent: March 26, 2019Assignee: ASML Netherlands B.V.Inventors: Marc Hauptmann, Dylan John David Davies, Paul Janssen, Naoko Tsugama, Richard Joseph Bruls, Kornelis Tijmen Hoekerd, Edwin Johannes Maria Janssen, Petrus Johannes Van Den Oever, Ronald Van Der Wilk, Antonius Hubertus Van Schijndel, Jorge Alberto Vieyra Salas
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Publication number: 20170363969Abstract: A diagnostic apparatus monitors a lithographic manufacturing system. First measurement data representing local deviations of some characteristic across a substrate is obtained using sensors within a lithographic apparatus, and/or a separate metrology tool. Other inspection tools perform substrate backside inspection to produce second measurement data. A high-resolution backside defect image is processed into a form in which it can be compared with lower resolution information from the first measurement data. Cross-correlation is performed to identify which of the observed defects are correlated spatially with the deviations represented in the first measurement data. A correlation map is used to identify potentially relevant clusters of defects in the more detailed original defect map. The responsible apparatus can be identified by pattern recognition as part of an automated root cause analysis. Alternatively, reticle inspection data may be used as second measurement data.Type: ApplicationFiled: September 21, 2015Publication date: December 21, 2017Applicant: ASML NETHERLANDS B.V.Inventors: Marc HAUPTMANN, Dylan John David DAVIES, Paul JANSSEN, Naoko TSUGAMA, Richard Joseph BRULS, Kornelis Tijmen HOEKERD, Edwin Johannes Maria JANSSEN, Petrus Johannes VAN DEN OEVER, Ronald VAN DER WILK, Antonius Hubertus VAN SCHIJNDEL, Jorge Alberto VIEYRA SALAS
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Patent number: 8310912Abstract: A method for monitoring an optical disk drive performance quality by determining a laser diode quality indicator for a laser diode arranged in an optical disk drive for scanning an optical disk, includes measuring an actual value of a parameter associated with a laser diode characteristic, obtaining a reference value of the parameter, comparing the actual value with the reference value for obtaining a comparison result, and determining the laser diode quality indicator from the comparison result. The laser diode quality indicator can at least take a warning level signaling a precursor for a defective state of the optical disk drive and an error level signaling a defective state of the optical disk drive. The laser diode characteristic may be a light-current or a voltage-current relationship.Type: GrantFiled: May 19, 2008Date of Patent: November 13, 2012Assignee: Lite-On It CorporationInventors: Johannes Leopoldus Bakx, Edwin Johannes Maria Janssen
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Patent number: 8085629Abstract: A method and system are provided for minimizing or optimising radial to vertical crosstalk (RVC) in an error signal in an optical record carrier reader is record carrier losed. Focus error offset values are applied to the reader. The radial to vertical crosstalk is determined after each focus error offset value is applied. The focus error offset value which minimizes or optimises the radial to vertical crosstalk is selected for use by the reader.Type: GrantFiled: December 15, 2005Date of Patent: December 27, 2011Assignee: Koninklijke Philips Electronics N.V.Inventors: Edwin Johannes Maria Janssen, Pieter Hoeven, Hendrikus Albertus Johanna Looijmans
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Publication number: 20100097902Abstract: The present invention relates to a method and apparatus for writing data on a record carrier (1) by using a radiation beam, wherein at least one of a writing power and an asymmetry of data written on the record carrier (1) is determined and a radial error offset, applied to the radiation beam with respect to a writing track of the record carrier (1), is controlled in response to at least one of the determined writing power and the determined asymmetry. Thereby, the radial error offset can be linked to at least one of the applied writing power and the obtained asymmetry of the written data, and can thus be altered before or during writing to maintain reasonable tracking in cases where writing is done on record carriers with variable radial error offset.Type: ApplicationFiled: June 26, 2006Publication date: April 22, 2010Applicant: KONINKLIJKE PHILIPS ELECTRONICS, N.V.Inventors: Gary Maul, Edwin Johannes Maria Janssen
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Publication number: 20090296548Abstract: A method and system are provided, for reducing the amount of radial to vertical crosstalk in an error signal in an optical record carrier reader. The method comprises the steps of: measuring error signals in a plurality of error signal control loops of the reader, comprising a focus error signal control loop; calculating power dissipation in each error signal control loop for determining the amount of radial to vertical crosstalk in the focus error signal control loop. Countermeasures may be applied to the error signal control loops to minimize or optimize the radial to vertical crosstalk.Type: ApplicationFiled: December 9, 2005Publication date: December 3, 2009Applicant: KONINKLIJKE PHILIPS ELECTRONICS, N.V.Inventor: Edwin Johannes Maria Janssen
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Publication number: 20090290457Abstract: A method and system are provided for minimizing or optimising radial to vertical crosstalk (RVC) in an error signal in an optical record carrier reader is record carrier losed. Focus error offset values are applied to the reader. The radial to vertical crosstalk is determined after each focus error offset value is applied. The focus error offset value which minimizes or optimises the radial to vertical crosstalk is selected for use by the reader.Type: ApplicationFiled: December 15, 2005Publication date: November 26, 2009Applicant: KONINKLIJKE PHILIPS ELECTRONICS, N.V.Inventors: Edwin Johannes Maria Janssen, Pieter Hoeven, Hendrikus Albertus Johanna Looijmans
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Publication number: 20090285072Abstract: The invention relates to a method for monitoring an optical disk drive performance quality by determining a laser diode quality indicator for a laser diode arranged in an optical disk drive for scanning an optical disk. The determining includes measuring (1000) an actual value (ITHACT) of a parameter (ITH) associated with a laser diode characteristic, obtaining (2000) a reference value (ITHR) of the parameter, comparing (3000) the actual value with the reference value for obtaining a comparison result (ICOM), and determining (4000) the laser diode quality indicator (Qual) from the comparison result. The laser diode quality indicator can at least take a warning level signaling a precursor for a defective state of the optical disk drive and an error level signaling a defective state of the optical disk drive. The laser diode characteristic can e.g. be a light-current relationship or a voltage-current relationship. The parameter can be associated with e.g.Type: ApplicationFiled: May 19, 2008Publication date: November 19, 2009Applicant: LITE-ON IT CORPORATIONInventors: Johannes Leopoldus BAKX, Edwin Johannes Maria Janssen
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Publication number: 20080205248Abstract: A spherical aberration correction mechanism is optimised early in the start-up process by measuring responses for various settings of the spherical aberration correction device that are removed from the initial settings of the spherical aberration correction by small amounts and comparing these responses with those anticipated for various of the multiple layers on the optical media. Signal measurements and calibrations can be performed prior to attempting to read data from the disc or concurrently with reading data from the disc. Comparing the responses with ideal, typical or anticipated curves for the various layers can derive the address of the current layer and the desired layer can be immediately accessed.Type: ApplicationFiled: June 27, 2006Publication date: August 28, 2008Applicant: KONINKLIJKE PHILIPS ELECTRONICS, N.V.Inventors: Edwin Johannes Maria Janssen, George Alois Leonie Leenknegt