Patents by Inventor Egbert Lenderink
Egbert Lenderink has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240004283Abstract: Membranes for EUV lithography are disclosed. In one arrangement, a membrane has a stack having layers in the following order: a first capping layer including an oxide of a first metal; a base layer including a compound having a second metal and an additional element selected from the group consisting of Si, B, C and N; and a second capping layer including an oxide of a third metal, wherein the first metal is different from the second metal and the third metal is the same as or different from the first metal.Type: ApplicationFiled: July 28, 2023Publication date: January 4, 2024Applicant: ASML NETHERLANDS B.V.Inventors: Maxim Aleksandrovich Nasalevich, Erik Achilles ABEGG, Nirupam BANERJEE, Michiel Alexander BLAUW, Derk Servatius Gertruda BROUNS, Paul JANSSEN, Matthias KRUIZINGA, Egbert LENDERINK, Nicolae MAXIM, Andrey NIKIPELOV, Arnoud Willem NOTENBOOM, Claudia PILIEGO, Mária PÉTER, Gijsbert RISPENS, Nadja SCHUH, Marcus Adrianus VAN DE KERKHOF, Willem Joan VAN DER ZANDE, Pieter-Jan VAN ZWOL, Antonius Willem VERBURG, Johannes Petrus Martinus Bernardus VERMEULEN, David Ferdinand VLES, Willem-Pieter VOORTHUIJZEN, Aleksandar Nikolov ZDRAVKOV
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Patent number: 11762281Abstract: Membranes for EUV lithography are disclosed. In one arrangement, a membrane has a stack having layers in the following order: a first capping layer including an oxide of a first metal; a base layer including a compound having a second metal and an additional element selected from the group consisting of Si, B, C and N; and a second capping layer including an oxide of a third metal, wherein the first metal is different from the second metal and the third metal is the same as or different from the first metal.Type: GrantFiled: December 22, 2020Date of Patent: September 19, 2023Assignee: ASML NETHERLANDS B.V.Inventors: Maxim Aleksandrovich Nasalevich, Erik Achilles Abegg, Nirupam Banerjee, Michiel Alexander Blauw, Derk Servatius Gertruda Brouns, Paul Janssen, Matthias Kruizinga, Egbert Lenderink, Nicolae Maxim, Andrey Nikipelov, Arnoud Willem Notenboom, Claudia Piliego, Mária Péter, Gijsbert Rispens, Nadja Schuh, Marcus Adrianus Van De Kerkhof, Willem Joan Van Der Zande, Pieter-Jan Van Zwol, Antonius Willem Verburg, Johannes Petrus Martinus Bernardus Vermeulen, David Ferdinand Vles, Willem-Pieter Voorthuijzen, Aleksandar Nikolov Zdravkov
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Patent number: 11561478Abstract: A method for determining a component of optical characteristic of a patterning process. The method includes obtaining (i) a plurality of desired features, (ii) a plurality of simulated features based on the plurality of desired features and an optical characteristic of a patterning apparatus, and (iii) a performance metric (e.g., EPE) related to a desired feature of the plurality of desired features and an associated simulated feature of the plurality of simulated features; determining a set of optical sensitivities of the patterning process by computing a change in value of the performance metric based on a change in value of the optical characteristic; and identifying, based on the set of optical sensitivities, a set of components (e.g., principal components) of the optical characteristic that include dominant contributors in changing the value of the performance metric.Type: GrantFiled: December 12, 2019Date of Patent: January 24, 2023Assignee: ASML Netherlands B.V.Inventors: Johannes Jacobus Matheus Baselmans, Paulus Jacobus Maria Van Adrichem, Egbert Lenderink
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Publication number: 20220082943Abstract: A method for determining a component of optical characteristic of a patterning process. The method includes obtaining (i) a plurality of desired features, (ii) a plurality of simulated features based on the plurality of desired features and an optical characteristic of a patterning apparatus, and (iii) a performance metric (e.g., EPE) related to a desired feature of the plurality of desired features and an associated simulated feature of the plurality of simulated features; determining a set of optical sensitivities of the patterning process by computing a change in value of the performance metric based on a change in value of the optical characteristic; and identifying, based on the set of optical sensitivities, a set of components (e.g., principal components) of the optical characteristic that include dominant contributors in changing the value of the performance metric.Type: ApplicationFiled: December 12, 2019Publication date: March 17, 2022Applicant: ASML NETHERLANDS B.V.Inventors: Johannes Jacobus Matheus BASELMANS, Paulus Jacobus Maria VAN ADRICHEM, Egbert LENDERINK
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Publication number: 20210109438Abstract: Membranes for EUV lithography are disclosed. In one arrangement, a membrane has a stack having layers in the following order: a first capping layer including an oxide of a first metal; a base layer including a compound having a second metal and an additional element selected from the group consisting of Si, B, C and N; and a second capping layer including an oxide of a third metal, wherein the first metal is different from the second metal and the third metal is the same as or different from the first metal.Type: ApplicationFiled: December 22, 2020Publication date: April 15, 2021Applicant: ASML NETHERLANDS B.V.Inventors: Maxim Aleksandrovich Nasalevich, Erik Achilles Abegg, Nirupam Banerjee, Michiel Alexander Blauw, Derk Servatius Gertruda Brouns, Paul Janssen, Matthias Kruizinga, Egbert Lenderink, Nicolae Maxim, Andrey Nikipelov, Arnoud Willem Notenboom, Claudia Piliego, Mária Péter, Gijsbert Rispens, Nadja Schuh, Marcus Adrianus Van De Kerkhof, Willem Joan Van Der Zande, Pieter-Jan Van Zwol, Antonius Willem Verburg, Johannes Petrus Martinus Bernardus Vermeulen, David Ferdinand Vles, Willem-Pieter Voorthuijzen, Aleksandar Nikolov Zdravkov
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Patent number: 10908496Abstract: Membranes for EUV lithography are disclosed. In one arrangement, a membrane has a stack having layers in the following order: a first capping layer including an oxide of a first metal; a base layer including a compound having a second metal and an additional element selected from the group consisting of Si, B, C and N; and a second capping layer including an oxide of a third metal, wherein the first metal is different from the second metal and the third metal is the same as or different from the first metal.Type: GrantFiled: April 12, 2017Date of Patent: February 2, 2021Assignee: ASML Netherlands B.V.Inventors: Maxim Aleksandrovich Nasalevich, Erik Achilles Abegg, Nirupam Banerjee, Michiel Alexander Blauw, Derk Servatius Gertruda Brouns, Paul Janssen, Matthias Kruizinga, Egbert Lenderink, Nicolae Maxim, Andrey Nikipelov, Arnoud Willem Notenboom, Claudia Piliego, Mária Péter, Gijsbert Rispens, Nadja Schuh, Marcus Adrianus Van De Kerkhof, Willem Joan Van Der Zande, Pieter-Jan Van Zwol, Antonius Willem Verburg, Johannes Petrus Martinus Bernardus Vermeulen, David Ferdinand Vles, Willem-Pieter Voorthuijzen, Aleksandar Nikolov Zdravkov
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Patent number: 10288227Abstract: A dimmable light emitting arrangement (100, 200, 300, 400) has a relatively low correlated color temperature in the dimmed state, and a relatively high and constant color rendering index. The dimmable light emitting arrangement (100, 200, 300, 400) comprises a first light source (10, 10a, 10b) adapted to emit light of a first wavelength range between 380 and 460 nm, a second light source (20, 20a, 20b) adapted to emit light of a second wavelength range between 570 and 610 nm, a first wavelength converting material (30), and a second wavelength converting material (40). The first wavelength converting material (30) receives light from the first light source (10, 10a, 10b) and converts light of the first wavelength range into light having an emission peak within a third wavelength range between 470 and 570 nm.Type: GrantFiled: February 27, 2014Date of Patent: May 14, 2019Assignee: SIGNIFY HOLDING B.V.Inventors: Gerardus Wilhelmus Gerbe Van Dreumel, Egbert Lenderink, Hicham Sabir, Bijan Vatan Khah
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Publication number: 20190129299Abstract: Membranes for EUV lithography are disclosed. In one arrangement, a membrane has a stack having layers in the following order: a first capping layer including an oxide of a first metal; a base layer including a compound having a second metal and an additional element selected from the group consisting of Si, B, C and N; and a second capping layer including an oxide of a third metal, wherein the first metal is different from the second metal and the third metal is the same as or different from the first metal.Type: ApplicationFiled: April 12, 2017Publication date: May 2, 2019Applicant: ASML NETHERLANDS B.V.Inventors: Maxim Aleksandrovich NASALEVICH, Erik Achilles ABEGG, Nirupam BANERJEE, Michiel Alexander BLAUW, Derk Servatius Gertruda BROUNS, Paul JANSSEN, Matthias KRUIZINGA, Egbert LENDERINK, Nicolae MAXIM, Andrey NIKIPELOV, Arnoud Willem NOTENBOOM, Claudia PILIEGO, Mária PÉTER, Gijsber RISPENS, Nadja SCHUH, Marcus Adrianus VAN DE KERKHOF, Willem Joan VAN DER ZANDE, Pieter-Jan VAN ZWOL, Antonius Willem VERBURG, Johannes Petrus Martinus Bernardus VERMEULEN, David Ferdinand VLES, Willem-Pieter VOORTHUIJZEN, Aleksandar Nikolov ZDRAVICOV
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Patent number: 9743521Abstract: A light-emitting module (3a-c; 23; 26; 33a-c) comprising a plurality of light-sources (12a-e; 27a-h) arranged in at least a first and a second column (18a-b; 28a-c) arranged side by side and extending along a first direction of extension (X1) of the light-emitting module (3a-c; 23; 26; 33a-c); and a plurality of connector terminal pairs (13a-b, 14a-b, 15a-b, 16a-b 17a-b), each being electrically connected to a corresponding one of the light-sources (3a-c; 23; 26; 33a-c) for enabling supply of electrical power thereto. Each connector terminal pair (13a-b, 14a-b, 15a-b, 16a-b 17a-b) comprises a first connector terminal (13a, 14a, 15a, 16a 17a) and a second connector terminal (13b, 14b, 15b, 16b 17b) being arranged at opposite sides of the light-emitting module (3a-c; 23; 26; 33a-c).Type: GrantFiled: September 10, 2010Date of Patent: August 22, 2017Assignee: PHILIPS LIGHTING HOLDING B.V.Inventors: Ralph Kurt, Cornelis Slob, Marc Andre De Samber, Michael Johan Ferdinand Marie Ter Laak, Gerard Kums, Egbert Lenderink, Marcellus Jacobus Johannes Van Der Lubbe, Mark Eduard Johan Sipkes
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Publication number: 20160018069Abstract: A dimmable light emitting arrangement (100, 200, 300, 400) has a relatively low correlated color temperature in the dimmed state, and a relatively high and constant color rendering index. The dimmable light emitting arrangement (100, 200, 300, 400) comprises a first light source (10, 10a, 10b) adapted to emit light of a first wavelength range between 380 and 460 nm, a second light source (20, 20a, 20b) adapted to emit light of a second wavelength range between 570 and 610 nm, a first wavelength converting material (30), and a second wavelength converting material (40). The first wavelength converting material (30) receives light from the first light source (10, 10a, 10b) and converts light of the first wavelength range into light having an emission peak within a third wavelength range between 470 and 570 nm.Type: ApplicationFiled: February 27, 2014Publication date: January 21, 2016Applicant: KONINKLIJKE PHILIPS N.V.Inventors: GERARDUS WILHELMUS GERBE VAN DREUMEL, EGBERT LENDERINK, HICHAM SABIR, BIJAN VATAN KHAH
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Patent number: 8922121Abstract: A system comprises a light source and an electrode device (20, 30, 60). The light source comprises a base (40) with a base surface (42) on which at least two contact elements are provided. The electrode device has at least two electrodes (23, 24, 34, 35), preferably of ferromagnetic or electromagnetic material and having a different polarity during operation. Adjacent electrodes are arranged at a predetermined electrode distance. Both electrodes are provided in one layer and are arranged in an interdigitated configuration. The light source has at least two, but preferably four contact elements (43, 53, 63) arranged at a mutual spacing which is essentially compatible with said electrode distance.Type: GrantFiled: February 6, 2009Date of Patent: December 30, 2014Assignee: Koninklijke Philips N.V.Inventors: Oscar Hendrikus Willemsen, Stefan Marcus Verbrugh, Mark Verhoeven, Cornelis Gerardus Maria De Haas, Menno Van Baardwijk, Siebe Tjerk De Zwart, Egbert Lenderink
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Patent number: 8531111Abstract: The invention relates to a light module for electrical and thermal attachment to an energy infrastructure having at least one power supply, each power supply comprising two electrodes, said light module comprising a light source to emit light, wherein the light source is a heat source when emitting light, two electrical contacts to contact the electrodes of the at least one power supply and thereby establishing the electrical attachment between the light module and the energy infrastructure, a control system arranged between the light source and the electrical contacts to control a power supplied to the light source, wherein the light module comprises a measurement system to measure a thermal resistance of the thermal attachment between the light module and the energy infrastructure when establishing the electrical attachment, and wherein the control system is configured to reduce the power supplied to the light source when the thermal resistance is above a predetermined value to protect the light module fromType: GrantFiled: May 5, 2010Date of Patent: September 10, 2013Assignee: Koninklijke Philips N.V.Inventors: Egbert Lenderink, Oscar Hendrikus Willemsen, Georges Marie Calon
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Patent number: 8465183Abstract: A lighting device (1) comprising an LED-unit (5), a collimator (2) and a housing (3), the LED-unit (5) is rigidly coupled to the collimator (2) only, so that no substantial forces can be applied to the LED-unit (5). A non-rigid heat transferring medium (10) is provided in a cavity (12) in the housing (3), to dissipate heat, generated by the LED-unit (5). The LED-unit (5) is therefore at least partly contained in the heat transferring medium (10).Type: GrantFiled: December 4, 2006Date of Patent: June 18, 2013Assignee: Koninklijke Philips Electronics N.V.Inventors: Gunnar Luettgens, Benno Spinger, Egbert Lenderink, Daniël Anton Benoy
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Patent number: 8414138Abstract: The invention relates to an illumination device (1), comprising: at least one LED (3) having an emission maximum in a first wavelength range; at least one LED (2) having an emission maximum in a second wavelength range; and a wavelength converting material (5) arranged to receive light of at least said first light wavelength range and having an emission maximum in a third wavelength range which is between said first wavelength range and said second wavelength range. The illumination device according to the invention may provide white light of acceptable overall color rendering while producing particularly high saturation of selected colors.Type: GrantFiled: November 3, 2009Date of Patent: April 9, 2013Assignee: Koninklijke Philipe Electronics N.V.Inventors: Egbert Lenderink, Marco Van As, Petrus J. M. Burgt
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Patent number: 8414141Abstract: A luminaire for illuminating a space underneath a ceiling or a canopy (1) to which the luminaire (2,3) is attached. The luminaire (2,3) comprises a plurality of LEDs (31) positioned in a straight array, and an elongated convergent lens (30) which extends parallel to the array of LEDs (30). The array of LEDs (30) is located at a distance (D) from the plane of symmetry (33) of the elongated lens (30).Type: GrantFiled: March 27, 2009Date of Patent: April 9, 2013Assignee: Koninklijke Philips Electronics N.V.Inventors: Egbert Lenderink, Marco Van As, Lucas Leo Desiree Van Der Poel, Denis Joseph Carel Van Oers
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Patent number: 8410500Abstract: Proposed is a light-emitting apparatus 200,300,400, comprising a semiconductor light emitting device 220,320,420 and a transparent ceramic body 230,330,430 comprising a wavelength converting material positioned in light receiving relationship to the semiconductor device. The light-emitting apparatus is characterized in that the side surfaces 233,333,433 of the ceramic body 230,330,430 are at an oblique angle 234,334,434 relative its bottom surface 231,331,431. This is especially advantageous to unlock the wave-guide modes inside the body 230,330,430. Consequently the total flux emitted from the light-emitting apparatus 200,300,400 can be enhanced considerably. Alternatively, the brightness of the top surface 232,332,432 of the ceramic body 230,330,430 can be enhanced considerably.Type: GrantFiled: December 14, 2007Date of Patent: April 2, 2013Assignee: Koninklijke Philips Electronics N.V.Inventors: Joseph Ludovicus Antonius Maria Sormani, Egbert Lenderink, Matthias Daniel Epmeier, Aldegonda Lucia Weijers
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Patent number: 8356902Abstract: A system comprises means (PL; MI) for projecting an image light beam (ILB) on a projection area (PA) for display of an image (PI) on the projection area (PA), and means (1) for generating an ambient light beam (ALB; ALB1, ALB2) and comprising: an ambient light source (LS; LS1, LS2) for generating ambient light, a collimator (CO) or a light-guide (LG1, LG2) for receiving the ambient light to supply the ambient light beam (ALB; ALB1, ALB2), and a reflector (RF; RF1, RF2) for reflecting the ambient light beam (ALB; ALB1, ALB2) towards the projection area (PA) to obtain an ambient lighting area (ALI) adjacent the image (PI).Type: GrantFiled: September 8, 2008Date of Patent: January 22, 2013Assignee: Koninklijke Philips Electronics N.V.Inventors: Elvira Johanna Maria Paulussen, Vlatko Milosevski, Egbert Lenderink, Lingli Wang, Joseph Ludovicus Antonius Maria Sormani
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Publication number: 20120169238Abstract: The present invention relates to a method for color control of a lighting system (10) comprising a first (1) and a second (2) light source configured to emit light of different primary colors. By means of the invention, it is possible to determine a color point (cp3) for mixed light emitted by the first (1) and the second (2) light sources having a minimal difference in perceived color output as compared to a target color point (cpr).Type: ApplicationFiled: September 16, 2010Publication date: July 5, 2012Applicant: KONINKLIJKE PHILIPS ELECTRONICS N.V.Inventor: Egbert Lenderink
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Publication number: 20120170265Abstract: A light-emitting module (3a-c; 23; 26; 33a-c) comprising a plurality of light-sources (12a-e; 27a-h) arranged in at least a first and a second column (18a-b; 28a-c) arranged side by side and extending along a first direction of extension (X1) of the light-emitting module (3a-c; 23; 26; 33a-c); and a plurality of connector terminal pairs (13a-b, 14a-b, 15a-b, 16a-b 17a-b), each being electrically connected to a corresponding one of the light-sources (3a-c; 23; 26; 33a-c) for enabling supply of electrical power thereto. Each connector terminal pair (13a-b, 14a-b, 15a-b, 16a-b 17a-b) comprises a first connector terminal (13a, 14a, 15a, 16a 17a) and a second connector terminal (13b, 14b, 15b, 16b 17b) being arranged at opposite sides of the light-emitting module (3a-c; 23; 26; 33a-c).Type: ApplicationFiled: September 10, 2010Publication date: July 5, 2012Applicant: KONINKLIJKE PHILIPS ELECTRONICS N.V.Inventors: Ralph Kurt, Cornelis Slob, Marc Andre De Samber, Michael Johan Ferdinand Marie Ter Laak, Gerard Kums, Egbert Lenderink, Marcellus Jacobus Johannes Van Der Lubbe, Mark Eduard Johan Sipkes
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Publication number: 20120087116Abstract: An illumination system (10) for spot illumination comprising a tubular reflector (2) with a reflective inner surface, the tubular reflector (2) having an entrance aperture (7) and an exit aperture (8) being larger than the entrance aperture (7); and a light-source array (1) comprising a plurality of light-sources (13a-c; 30a-d, 31a-d, 32a-d) arranged to emit light into the tubular reflector (2) at the entrance aperture (7) thereof. At least one of the tubular reflector (2) and the light-source array (1) is configured in such a way that each symmetry state of the light-source array (1) is different from any symmetry state of the tubular reflector (2). By avoiding coinciding symmetry states, the occurrence of preferred directions of the emitted light can be reduced, whereby the spatial homogeneity with respect to intensity and, where applicable, color of the emitted light can be improved.Type: ApplicationFiled: June 9, 2010Publication date: April 12, 2012Applicant: KONINKLIJKE PHILIPS ELECTRONICS N.V.Inventors: Teunis Willem Tukker, Egbert Lenderink, Ralph Kurt, Mark Eduard Johan Sipkes