Patents by Inventor Eiichi Maruyama

Eiichi Maruyama has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 4351856
    Abstract: A semiconductor device is disclosed wherein a polycrystalline film whose principal constituent is silicon is formed on an amorphous or polycrystalline substrate, the polycrystalline film having a carrier mobility of at least 1 cm.sup.2 /V.multidot.sec, and wherein at least one active device is formed by employing the polycrystalline film as its material. A large-area or elongate active device can be provided. The polycrystalline film for such semiconductor device is formed by a method wherein the amorphous or polycrystalline substrate is mounted in a vacuum chamber and wherein the polycrystalline film whose principal constituent is silicon is evaporated on the substrate under the conditions that the pressure during the evaporation is below 1.times.10.sup.-8 Torr and that the partial pressure of oxygen during the evaporation is below 1.times.10.sup.-9 Torr.
    Type: Grant
    Filed: July 18, 1980
    Date of Patent: September 28, 1982
    Assignee: Hitachi, Ltd.
    Inventors: Makoto Matsui, Yasuhiro Shiraki, Yoshifumi Katayama, Toshihisa Tsukada, Eiichi Maruyama
  • Patent number: 4331506
    Abstract: A method of manufacturing a target of an image pickup tube comprising the steps of: forming a plurality of groups of transparent conductive signal electrodes on a transparent insulating base plate; forming a first layer on at least a portion constituting an image area of the image pickup tube, said first layer being substantially insoluble in etching liquid used for etching an insulating layer to constitute an intermediate layer insulator in a double layered interconnection structure; forming, after formation of said first layer, an insulating layer to constitute said intermediate-layer insulator; removing a predetermined portion of said insulating layer, removing said first layer together with said insulating layer located thereon; forming bus bars; and forming a photoconductive layer on said plurality of groups of the transparent conductive signal electrodes.This invention provides an excellent method for mass production.
    Type: Grant
    Filed: December 2, 1980
    Date of Patent: May 25, 1982
    Assignees: Hitachi, Ltd., Hitachi Denshi Kabushiki Kaisha
    Inventors: Akira Sasano, Toshio Nakano, Ken Tsutsui, Chushiro Kusano, Tadaaki Hirai, Eiichi Maruyama
  • Patent number: 4323912
    Abstract: In a solid-state imaging device having a semiconductor integrated circuit in which a plurality of switching elements for addressing positions of picture elements and scanning circuitry for turning the switching elements "on" and "off" in time sequence are disposed on an identical substrate, a photoconductive film which is disposed on the integrated circuit and which is connected with the respective switching elements, and a light transmitting electrode which is disposed on the photoconductive film, a voltage being applied to the light transmitting electrode thereby to bias a region of the photoconductive film on a light entrance side either positively or negatively with respect to a region thereof on the opposite side; a solid-state imaging device characterized in that said each switching element is an element which uses carriers of a polarity opposite to that of carriers having a greater mobility in said photoconductive film.
    Type: Grant
    Filed: May 23, 1980
    Date of Patent: April 6, 1982
    Assignee: Hitachi, Ltd.
    Inventors: Norio Koike, Toshihisa Tsukada, Haruhisa Ando, Hideaki Yamamoto, Tadaaki Hirai, Masaharu Kubo, Eiichi Maruyama, Toru Baji, Yukio Takasaki, Shusaku Nagahara
  • Patent number: 4314014
    Abstract: Disclosed is an electrophotographic plate having a laminated structure comprising a first Se layer containing 3 to 10% by weight of As, a second Se layer containing 40 to 47% by weight of Te and 3 to 10% by weight of As and a fourth Se layer consisting solely of Se or comprising Se and up to 10% by weight of As or an organic semiconductor layer, wherein a substrate is arranged so that at least the face of the substrate which is contiguous to the face of one of said first Se layer and said fourth Se layer or organic semiconductor layer, that is located on the outer side of the laminated structure, is electrically conductive.It is preferred that the fourth Se layer be formed by vacuum evaporation deposition while maintaining the substrate temperature at 50.degree. to 80.degree. C. The residual potential of the electrophotographic plate can be reduced.
    Type: Grant
    Filed: June 11, 1980
    Date of Patent: February 2, 1982
    Assignee: Hitachi, Ltd.
    Inventors: Hideaki Yamamoto, Akio Taniguchi, Shinkichi Horigome, Susumu Saito, Yoshiaki Mori, Eiichi Maruyama
  • Patent number: 4307372
    Abstract: In a thin-film photosensor comprising a transparent electrode deposited on one surface of a thin layer of photoconductor, and a counter electrode deposited on the other surface thereof, a photosensor for use in a photosensor array of a facsimile transmitter or the like characterized in that part of the transparent electrode other than a window for incidence of a light signal is covered with an opaque thin film.
    Type: Grant
    Filed: December 31, 1979
    Date of Patent: December 22, 1981
    Assignee: Hitachi, Ltd.
    Inventors: Makoto Matsui, Hideaki Yamamoto, Eiichi Maruyama
  • Patent number: 4307319
    Abstract: A photoelectric device comprises a signal electrode, a layer of amorphous photoconductor containing 50 atomic percent or more of selenium and an N-type semiconductor layer made of a material selected from the group consisting of oxygen depletion type cerium oxide and oxygen depletion type lead oxide and disposed therebetween, which has a thickness greater than 8 nm and up to and including 500 nm and a Fermi level located within an energy range of 0.2 to 0.8 eV from the bottom of a conduction band.
    Type: Grant
    Filed: July 5, 1978
    Date of Patent: December 22, 1981
    Assignees: Hitachi, Ltd., Nippon Hoso Kyokai
    Inventors: Motoyasu Terao, Tadaaki Hirai, Eiichi Maruyama, Hideaki Yamamoto, Tsutomu Fujita, Naohiro Goto, Keiichi Shidara
  • Patent number: 4285007
    Abstract: A color solid-state imager comprises a semiconductor body over which are successively laminated a predetermined number of filter layers of any desired shape having predetermined spectral characteristics and, laminated on the filter layers, a predetermined number of layers composed of a transparent, organic high molecular material which is sensitive to radiation, the semiconductor substrate having at least a detector portion composed of an array of a plurality of optical detector elements. The method of making color solid-state imagers can be simplified by at least using the radiation-sensitive high molecular material for the intermediate layers or protection layers which are used for forming a laminate construction of color-decomposing filters.Further, in mounting the color-decomposing filters on the semiconductor substrate, it is particularly preferred to form beforehand a film of an organic high molecular material.
    Type: Grant
    Filed: February 20, 1980
    Date of Patent: August 18, 1981
    Assignee: Hitachi, Ltd.
    Inventors: Toshio Nakano, Tadao Kaneko, Michiaki Hashimoto, Yoshio Hatano, Haruo Matsumaru, Akira Sasano, Eiichi Maruyama
  • Patent number: 4273812
    Abstract: A method of producing material patterns in which at least one substrate is fixed together with a mask to a substrate holder, and an evaporated film of desired substances is formed on the surface of the substrate by means of evaporation sources provided to confront the substrate. The mask is fabricated to have a plurality of reinforcing bridges formed in the desired portions of the mask openings of desired shape formed in the mask. The mask is held spaced from the substrate by a small distance during the evaporation, so that the evaporation may be effected at least through two pattern openings defined at both sides of each bridge.
    Type: Grant
    Filed: February 1, 1979
    Date of Patent: June 16, 1981
    Assignees: Hitachi, Ltd., Hitachi Denshi Kabushiki Kaisha
    Inventors: Ken Tsutsui, Akira Sasano, Toshio Nakano, Haruo Matsumaru, Eiichi Maruyama
  • Patent number: 4255686
    Abstract: In a photosensor having at least a light-transmitting conductive layer which is arranged on the side of light incidence, and a photoconductive layer in which charges are stored in correspondence with the light incidence; a photosensor characterized in that at least a region of said photoconductive layer for storing the charges is made of an amorphous material which contains hydrogen and silicon as indispensable constituent elements thereof, in which the silicon amounts to at least 50 atomic % and the hydrogen amounts to at least 10 atomic % and at most 50 atomic %, and whose resistivity is not lower than 10.sup.10 .OMEGA..multidot.cm.
    Type: Grant
    Filed: May 16, 1979
    Date of Patent: March 10, 1981
    Assignee: Hitachi, Ltd.
    Inventors: Eiichi Maruyama, Yoshinori Imamura, Saburo Ataka, Kiyohisa Inao, Yukio Takasaki, Toshihisa Tsukada, Tadaaki Hirai
  • Patent number: 4249106
    Abstract: A radiation sensitive screen comprising a crystalline silicon substrate which is located on a side of incidence of radiation, and an amorphous silicon film which contains hydrogen and which is located on the opposite side of the substrate to the side of the incidence of the radiation. The radiation sensitive screen of this invention can be manufactured by a simple method, and can achieve a high resolution. It is useful for the target of an image pickup tube, the electron bombardment target of an X-ray fluorescence multiplier tube, etc.
    Type: Grant
    Filed: November 7, 1979
    Date of Patent: February 3, 1981
    Assignee: Hitachi, Ltd.
    Inventors: Eiichi Maruyama, Saburo Ataka, Kiyohisa Inao, Yoshinori Imamura, Toshihisa Tsukada, Yukio Takasaki, Tadaaki Hirai
  • Patent number: 4233506
    Abstract: A pboto-sensor wherein a bundle of optical fibers is disposed within a predetermined substrate, the optical fiber bundle extending from a first surface to a second surface of the substrate and being formed to be flat, an array of photosensitive elements which have photosensitive parts on an open end face of the optical fibers at the first surface of the substrate is disposed integrally with the substrate, and an end face of the optical fibers at the second surface of the substrate serves as an information reading surface.
    Type: Grant
    Filed: May 5, 1978
    Date of Patent: November 11, 1980
    Assignees: Nippon Telegraph and Telephone Public Corporation, Hitachi, Ltd.
    Inventors: Hideaki Yamamoto, Makoto Matsui, Toshihisa Tsukada, Yoshizumi Eto, Tadaaki Hirai, Eiichi Maruyama
  • Patent number: 4232219
    Abstract: A photosensor including a fiber substrate having a light receiving window formed in a surface thereof spaced from an information surface to be read, a bundle of optical fibers disposed in the fiber substrate and positioned in the light receiving window. A plurality of color filters of different characteristics are disposed on an end face of the bundle of optical fibers, and a plurality of arrays of photosensitive elements corresponding to the color filters are also provided. The arrays of photosensitive elements are integrally provided with the fiber substrate and disposed in the region of the end face of the bundle of the optical fibers farthest away from the information surface.
    Type: Grant
    Filed: February 27, 1979
    Date of Patent: November 4, 1980
    Assignees: Nippon Telegraph and Telephone Public Corporation, Hitachi, Ltd.
    Inventors: Hideaki Yamamoto, Toshihisa Tsukada, Eiichi Maruyama, Hiroya Inagaki
  • Patent number: 4227078
    Abstract: A photo-sensor wherein a bundle of optical fibers in the form of a sheet is disposed within a predetermined substrate, the optical fiber bundle extending from a first surface to a second surface of the substrate, an array of photosensitive elements is disposed integrally with the substrate in such a manner that at least one transparent insulating layer intervenes between the photoelectric elements and the optical fiber bundle on, at least, an end face of the optical fiber bundle on the first surface side of the substrate, and an end face of the optical fiber bundle open to the second surface of the substrate serves as an information reading face.
    Type: Grant
    Filed: June 22, 1978
    Date of Patent: October 7, 1980
    Assignees: Nippon Telegraph and Telephone Public Corporation, Hitachi, Ltd.
    Inventors: Hideaki Yamamoto, Haruo Matsumaru, Makoto Matsui, Toshihisa Tsukada, Tadaaki Hirai, Eiichi Maruyama
  • Patent number: 4199777
    Abstract: A semiconductor device includes at least two different elements having different functions. At least one of the elements is fixed within a recess provided in a substrate, and wirings are provided on an insulating film deposited commonly on the elements and the substrate, so that there is no step or clearance between the elements or between the element and the substrate, making it possible to easily form good interconnections.
    Type: Grant
    Filed: February 2, 1977
    Date of Patent: April 22, 1980
    Assignee: Hitachi, Ltd.
    Inventors: Eiichi Maruyama, Hideaki Yamamoto
  • Patent number: 4121537
    Abstract: An apparatus for vacuum deposition comprising a turn-table for holding substrates for deposition, and a plurality of evaporation boats arranged in opposition to a circumferential part of the turn-table, the turn-table being rotated at deposition whereby vapors from the respective boats can be cyclically accumulated and stuck onto the substrates, further comprises at least one film-thickness monitor which is fixed to the turn-table and which detects the quantity of a deposited substance of one layer stuck every time the substrates pass over each boat, and means to receive a signal from the film-thickness monitor and divide the signal time sequentially, thereby detecting at least one of the deposition rate and the total amount of the vapor from each boat, and to control the quantity of the vapor arriving to the substrates for deposition from each boat while comparing the detected value with a predetermined value.
    Type: Grant
    Filed: March 21, 1977
    Date of Patent: October 24, 1978
    Assignee: Hitachi, Ltd.
    Inventors: Eiichi Maruyama, Tadaaki Hirai, Sachio Ishioka, Hideaki Yamamoto, Kiyohisa Inao
  • Patent number: 4040985
    Abstract: A photoconductive film comprises a first region containing Se in which Te and an element capable of forming deep levels in Se are added at concentrations lower than 10 atomic % inclusive on average, respectively, a second region disposed on the first region and containing Se in which Te is added with a continuous distribution of concentration having a peak value greater than 15 atomic % inclusive, a third region disposed on the second region and containing Se in which an element capable of forming deep levels in Se is added with a continuous distribution of concentration having a peak value greater than 15 atomic % inclusive, and a fourth region disposed on the third region and containing Se in which Te and an element capable of forming deep levels in Se are added at concentrations lower than 10 atomic % inclusive on average, respectively.
    Type: Grant
    Filed: April 6, 1976
    Date of Patent: August 9, 1977
    Assignees: Hitachi, Ltd., Nippon Hoso Kyokai
    Inventors: Keiichi Shidara, Naohiro Goto, Eiichi Maruyama, Tadaaki Hirai, Tsutomu Fujita
  • Patent number: 3984722
    Abstract: An image pickup tube target wherein a rectifying contact which is formed at a boundary of a first layer of a material selected from the group consisting of tin oxide, indium oxide, titanium oxide, cadmium sulfide, zinc sulfide, cadmium selenide, zinc selenide, n-type germanium, n-type silicon and mixture thereof, and a second layer of a material mainly consisting of selenium and including halogen, is reversely biased and operated at a region where signal current is saturated with respect to applied voltage. The second layer of the material includes 50 atomic percent or more of selenium and 0.1 - 1000 atomic ppm of halogen. More preferably, the second layer comprises 3-20 atomic % of arsenic, 0.1-20 atomic ppm of iodine and balance mainly consisting of selenium.
    Type: Grant
    Filed: May 14, 1974
    Date of Patent: October 5, 1976
    Assignees: Hitachi, Ltd., Nippon Hoso Kyokai
    Inventors: Eiichi Maruyama, Hiroaki Hachino, Yasushi Saitoh, Tadaaki Hirai, Naohiro Goto, Yukinao Isozaki, Keiichi Shidara, Saiichi Koizumi