Patents by Inventor Eiichi Miyake

Eiichi Miyake has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6659152
    Abstract: A laminator comprises a pair of pressure rolls 2 having a substrate 1 and a film 55 sandwiched therebetween and bearings 3 adapted to rotatably support opposite end portions of the pressure rolls. One end of a lever 7 is attached to a housing of each bearing. The other end of the lever 7 extends in an axial direction of the pressure roll 2 and is located inward of the bearing 3. A pressure-applying apparatus 14 applies force to the other end of the lever 7, and applies pressure through the bearing to the substrate 1 and the film 55 between the pair of pressure rolls 2. Further, the pressure-applying apparatus 14 generates bending moment which tends to cause the pressure rolls 2 to be projected toward each other. A shaft 16 is disposed in spaced parallel relation to the pressure roll 2. Extension arms 17 are formed in the housings of the bearings 3. The extension arms 17 are connected to the shaft 16, to thereby enable the shaft 16 to support the bearings 3.
    Type: Grant
    Filed: May 3, 2002
    Date of Patent: December 9, 2003
    Assignee: Sanei Giken Co., Ltd.
    Inventor: Eiichi Miyake
  • Publication number: 20020079276
    Abstract: A substrate positioning apparatus and an exposure apparatus includes a rotary circular eccentric cam mechanism as an X direction moving mechanism, in contact with one end of a support body holding a substrate, and rotary circular eccentric cam mechanisms as first and second Y direction moving mechanisms, offset in the X direction with each other, to be in contact with another side of the support body. As a result, a substrate positioning apparatus and an exposure apparatus having simple and inexpensive structure that provides satisfactory accuracy and reliability can be provided.
    Type: Application
    Filed: December 18, 2001
    Publication date: June 27, 2002
    Applicant: SANEI GIKEN CO., LTD.
    Inventor: Eiichi Miyake
  • Patent number: 6320659
    Abstract: A position of an image or shadow of a clearance measuring mark projected onto a plate with respect to a position of clearance measuring mark on a photomask is sensed as image data by a CCD camera and subjected to an image process by a processor. Based on a relative positional relationship between image or shadow of a clearance measuring mark and clearance measuring mark, the clearance between photomask and plate can be adjusted to a prescribed value by a clearance adjusting device. As a result, a clearance measuring device and method can be provided capable of accurately and inexpensively measuring the clearance between the plate and the photomask in the exposure apparatus.
    Type: Grant
    Filed: March 13, 2000
    Date of Patent: November 20, 2001
    Assignee: Sanei Giken Co., Ltd.
    Inventors: Eiichi Miyake, Ken Miyake
  • Publication number: 20010008442
    Abstract: Each positioning mark comprises a plurality of mark elements. The mark elements are adapted to be individually determined for their respective positions and configurations. A reference point of the positioning mark is located on the basis of data obtained by determining respective positions and configurations of the mark elements.
    Type: Application
    Filed: February 27, 2001
    Publication date: July 19, 2001
    Inventor: Eiichi Miyake
  • Patent number: 6160611
    Abstract: According to an exposing apparatus and an exposing method of the present invention, a photomask is provided with linear patterns having their linear portions to be transferred onto a plate reduced in length. By moving and stopping photomask in one direction of plate and directing light to photomask, the linear patterns are transferred onto plate. Thus, the exposing apparatus and method are provided capable of efficiently transferring the linear patterns onto the plate by exposure using a small photomask.
    Type: Grant
    Filed: November 20, 1998
    Date of Patent: December 12, 2000
    Assignee: Sanei Giken Co., Ltd.
    Inventor: Eiichi Miyake
  • Patent number: 5682228
    Abstract: An alignment apparatus includes holding devices for holding a photo-mask, a supporting device for supporting a substrate, a detecting device, and force-exerting devices. The photo-mask and the substrate have positioning marks, respectively. The detecting device detects positional errors between the positioning marks on the photo-mask and the positioning marks on the substrate. The force-exerting devices apply forces to a periphery of the photo-mask in accordance with the detected positional errors. When receiving forces, the photo-mask elastically deforms in its plane to move the positioning marks so that the positional errors can be corrected to predetermined values.
    Type: Grant
    Filed: April 10, 1996
    Date of Patent: October 28, 1997
    Assignee: Sanei Giken Co., Ltd.
    Inventor: Eiichi Miyake
  • Patent number: 5534969
    Abstract: An alignment apparatus includes holding devices for holding a photo-mask, a supporting device for supporting a substrate, a detecting device, and force-exerting devices. The photo-mask and the substrate have positioning marks, respectively. The detecting device detects positional errors between the positioning marks on the photo-mask and the positioning marks on the substrate. The force-exerting devices apply forces to a periphery of the photo-mask in accordance with the detected positional errors. When receiving forces, the photo-mask elastically deforms in its plane to move the positioning marks so that the positional errors can be corrected to predetermined values.
    Type: Grant
    Filed: June 2, 1994
    Date of Patent: July 9, 1996
    Assignee: Sanei Giken Co., Ltd.
    Inventor: Eiichi Miyake
  • Patent number: 4888488
    Abstract: An exposing apparatus arranged, while peripherally sealing a space between an original and a material to be exposed by a packing of elastic material, to evacuate the space to thereby ensure intimate contact between the original and the material to be exposed, the exposing apparatus being characterized in that the packing is hollow so as to make it possible to change its thickness by changing its internal pressure.
    Type: Grant
    Filed: November 22, 1988
    Date of Patent: December 19, 1989
    Inventor: Eiichi Miyake
  • Patent number: 4842412
    Abstract: An exposure apparatus for arranging an photomask having a plurality of alignment marks to face a surface to be exposed of a board having a plurality of corresponding alignment marks with the alignment marks of the photomask and the board being aligned to each other, to expose the board by radiating light through the photomask. The alignment marks of the board are different in size from the alignment marks of the photomask, whereby contours of the larger alignment marks encircle the smaller alignment marks when the board is overlapped with the photomask. In this state, the respective positions of the alignment marks of the board and the photomask are detected. The positions of the alignment marks thus detected are compared with each other to obtain displacement from desired positions, so that the photomask is moved in its surface direction to correct the displacement.
    Type: Grant
    Filed: January 21, 1987
    Date of Patent: June 27, 1989
    Inventor: Eiichi Miyake
  • Patent number: 4743325
    Abstract: A method of sticking film sheet on a panel surface is disclosed in which a continuous web of film is cut to proper length fitted to the size of the panel to make an individual film sheet during continuous sticking operation for producing a film laminated panel. The sticking operation is not interrupted by the cutting operation.A laminator constructed to achieve this film laminated panel manufacture includes block members which are movable toward and away from the tacking station where the leading end of the continuous web of film is tacked to the forward end of the panel, and a cutter mounted on the block members. The cutter severs across the film web as the block members moves toward the tacking station in the same direction and at the same speed as the film web during sticking operation.
    Type: Grant
    Filed: September 17, 1986
    Date of Patent: May 10, 1988
    Assignees: Hakuto Co., Ltd., Sanei Giken Co., Ltd.
    Inventor: Eiichi Miyake
  • Patent number: 4676069
    Abstract: A vapor phase processing apparatus of the type wherein an article is heated to a preselected temperature for vapor phase processing, comprises a vessel containing a liquid having a boiling point at least equal to the preselected temperature, into and out of which the article is transported, and a heating device for boiling the liquid in the vessel to produce vapor. The heating device is provided, as the sole source of heat, at a base wall of the vessel in such a manner that the heating device is not exposed to the liquid in the vessel.
    Type: Grant
    Filed: April 1, 1986
    Date of Patent: June 30, 1987
    Inventor: Eiichi Miyake
  • Patent number: 4659419
    Abstract: A method of sticking film sheet on a panel surface is disclosed in which a continuous web of film is cut to proper length fitted to the size of the panel to make an individual film sheet during a continuous sticking operation for producing a film laminated panel. The sticking operation is not interrupted by the cutting operation.A laminator constructed to achieve this film laminated panel includes block members which are movable toward and away from the tacking station where the leading end of the continuous web of film is tacked to the forward end of the panel, and a cutter mounted on the block members. The cutter severs across the film web as the block members move toward the tacking station in the same direction and at the same speed as the film web during the sticking operation.
    Type: Grant
    Filed: May 1, 1984
    Date of Patent: April 21, 1987
    Assignees: Hakuto Co., Ltd., Sanei Giken Co., Ltd.
    Inventor: Eiichi Miyake
  • Patent number: 4264397
    Abstract: Apparatus for sticking nonconductive tape including plating perforations to sheet metal comprises supply means for metal tape, feed means for nonconductive tape, punching means for perforating nonconductive tape to make plating perforations therein, a device for heating and pressure-sticking the metal tape and the perforated nonconductive tape together, cooling means for the tapes, and control means for monitoring the position of the plating perforations and controlling the running speed of the nonconductive tape.
    Type: Grant
    Filed: September 26, 1979
    Date of Patent: April 28, 1981
    Assignees: Hakuto Co., Ltd., Sanei Engineering Co., Ltd.
    Inventors: Shunichi Kawashima, Eiichi Miyake